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    Lithography method to form structures with slanted angle
    2.
    发明授权
    Lithography method to form structures with slanted angle 有权

    公开(公告)号：US11754919B2

    公开(公告)日：2023-09-12

    申请号：US17534128

    申请日：2021-11-23

    Applicant: Applied Materials, Inc.

    Inventor： Yongan Xu ,  Jinxin Fu ,  Jhenghan Yang ,  Ludovic Godet

    IPC: G03F7/00 ,  H01L21/3065 ,  G02B6/122 ,  G02B6/136

    CPC classification number: G03F7/0007 ,  G02B6/122 ,  G02B6/136

    Abstract: The present disclosure generally relates to methods of forming optical devices comprising nanostructures disposed on transparent substrates. A first process of forming the nanostructures comprises depositing a first layer of a first material on a glass substrate, forming one or more trenches in the first layer, and depositing a second layer of a second material in the one or more holes to trenches a first alternating layer of alternating first portions of the first material and second portions of the second material. The first process is repeated one or more times to form additional alternating layers over the first alternating layer. Each first portion of each alternating layer is disposed in contact with and offset a distance from an adjacent first portion in adjacent alternating layers. A second process comprises removing either the first or the second portions from each alternating layer to form the plurality of nanostructures.

    INTERFERENCE IN-SENSITIVE LITTROW SYSTEM FOR OPTICAL DEVICE STRUCTURE MEASUREMENT
    3.
    发明申请
    INTERFERENCE IN-SENSITIVE LITTROW SYSTEM FOR OPTICAL DEVICE STRUCTURE MEASUREMENT 有权

    公开(公告)号：US20220214163A1

    公开(公告)日：2022-07-07

    申请号：US17645200

    申请日：2021-12-20

    Applicant: Applied Materials, Inc.

    Inventor： Yangyang SUN ,  Jinxin Fu ,  Ludovic Godet

    IPC: G01B11/26

    Abstract: Embodiments described herein provide for devices and methods of measuring a pitch P of optical device structures and an orientation angle ϕ of the optical device structures. One embodiment of the system includes an optical arm coupled to an arm actuator. The optical arm includes a light source. The light source emits a light path operable to be diffracted to the stage. The optical arm further includes a first beam splitter and a second beam splitter positioned in the light path. The first beam splitter directs the light path through a first lens and the second beam splitter directs the light path through a first dove prism and a second lens. The optical arm further includes a first detector operable to detect the light path from the first lens and second detector operable to detect the light path from the second lens.

    GAP FILL OF IMPRINTED STRUCTURE WITH SPIN COATED HIGH REFRACTIVE INDEX MATERIAL FOR OPTICAL COMPONENTS
    4.
    发明申请
    GAP FILL OF IMPRINTED STRUCTURE WITH SPIN COATED HIGH REFRACTIVE INDEX MATERIAL FOR OPTICAL COMPONENTS 审中-公开

    公开(公告)号：US20200284953A1

    公开(公告)日：2020-09-10

    申请号：US16884117

    申请日：2020-05-27

    Applicant: Applied Materials, Inc.

    Inventor： Jinxin Fu ,  Ludovic Godet ,  Wayne McMillan

    IPC: G02B5/18 ,  G03F7/00 ,  B29D11/00

    Abstract: Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device. In one embodiment, the method includes forming a first layer on a substrate, and the first layer has a first refractive index. The method further includes pressing a stamp having a pattern onto the first layer, and the pattern of the stamp is transferred to the first layer to form a patterned first layer. The method further includes forming a second layer on the patterned first layer by spin coating, and the second layer has a second refractive index greater than the first refractive index. The second layer having the high refractive index is formed by spin coating, leading to improved nanoparticle uniformity in the second layer.

    Method to determine line angle and rotation of multiple patterning
    5.
    发明授权
    Method to determine line angle and rotation of multiple patterning 有权

    公开(公告)号：US12085475B2

    公开(公告)日：2024-09-10

    申请号：US17771557

    申请日：2020-12-14

    Applicant: Applied Materials, Inc.

    Inventor： Yongan Xu ,  Chan Juan Xing ,  Jinxin Fu ,  Ludovic Godet

    IPC: G01M11/00

    CPC classification number: G01M11/30

    Abstract: A method and apparatus for determining a line angle and a line angle rotation of a grating or line feature is disclosed. An aspect of the present disclosure involves, measuring coordinate points of a first line feature using a measurement tool, determining a first slope of the first line feature from the coordinate points, and determining a first line angle from the slope of the first line feature. This process can be repeated to find a second slope of a second line feature that is adjacent to the first line feature. The slope of the first and second line features can be compared to find a line angle rotation. The line angle rotation is compared to a design specification and a stitch quality is determined.

    Imaging system and method of creating composite images
    7.
    发明授权
    Imaging system and method of creating composite images 有权

    公开(公告)号：US11610925B2

    公开(公告)日：2023-03-21

    申请号：US16859708

    申请日：2020-04-27

    Applicant: Applied Materials, Inc.

    Inventor： Jinxin Fu ,  Yongan Xu ,  Ludovic Godet ,  Naamah Argaman ,  Robert Jan Visser

    IPC: H01L27/146 ,  G02B1/00 ,  G02B27/00 ,  H04N5/374

    Abstract: An imaging system and a method of creating composite images are provided. The imaging system includes one or more lens assemblies coupled to a sensor. When reflected light from an object enters the imaging system, incident light on the metalens filter systems creates filtered light, which is turned into composite images by the corresponding sensors. Each metalens filter system focuses the light into a specific wavelength, creating the metalens images. The metalens images are sent to the processor, wherein the processor combines the metalens images into one or more composite images. The metalens images are combined into a composite image, and the composite image has reduced chromatic aberrations.

    Measurement system and a method of diffracting light
    9.
    发明授权
    Measurement system and a method of diffracting light 有权

    公开(公告)号：US10801890B1

    公开(公告)日：2020-10-13

    申请号：US16539930

    申请日：2019-08-13

    Applicant: Applied Materials, Inc.

    Inventor： Jinxin Fu ,  Yifei Wang ,  Ian Matthew McMackin ,  Rutger Meyer Timmerman Thijssen ,  Ludovic Godet

    IPC: G01J3/30 ,  G01J3/18 ,  G02B7/04 ,  G01J3/02 ,  G01J3/42

    Abstract: Embodiments of the present disclosure relate to measurement systems and methods for diffracting light. The measurement system includes a stage, an optical arm, and one or more detector arms. The method of diffracting light includes a method of diffracting light is provided, including projecting light beams having wavelength λlaser to a first zone of a first substrate at the fixed beam angle θ0 and the maximum orientation angle ϕmax, obtaining a displacement angle Δθ, determining a target maximum beam angle θt-max, wherein θt-max=θ0+Δθ, and determining a test grating pitch Pt-grating by a modified grating pitch equation Pt-grating=λlaser/(sin θt-max+sin θ0). The measurement system and method allow for measurement of nonuniform properties of regions of an optical device, such as grating pitches and grating orientations.

    Optical device improvement
    10.
    发明授权
    Optical device improvement 有权

    公开(公告)号：US12249489B2

    公开(公告)日：2025-03-11

    申请号：US18131997

    申请日：2023-04-07

    Applicant: Applied Materials, Inc.

    Inventor： Yue Chen ,  Jinyu Lu ,  Yongmei Chen ,  Jinxin Fu ,  Zihao Yang ,  Mingwei Zhu ,  Takashi Kuratomi ,  Rami Hourani ,  Ludovic Godet ,  Qun Jing ,  Jingyi Yang ,  David Masayuki Ishikawa

    IPC: H01J37/32 ,  H01J7/02

    Abstract: A method of processing an optical device is provided, including: positioning an optical device on a substrate support in an interior volume of a process chamber, the optical device including an optical device substrate and a plurality of optical device structures formed over the optical device substrate, each optical device structure including a bulk region formed of silicon carbide and one or more surface regions formed of silicon oxycarbide. The method further includes providing one or more process gases to the interior volume of the process chamber, and generating a plasma of the one or more process gases in the interior volume for a first time period when the optical device is on the substrate support, and stopping the plasma after the first time period. A carbon content of the one or more surface regions of each optical device structure is reduced by at least 50% by the plasma.

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