Process for the preparation of block copolymers

    公开(公告)号:DE3833651A1

    公开(公告)日:1990-04-05

    申请号:DE3833651

    申请日:1988-10-04

    Applicant: BASF AG

    Abstract: A process for the preparation of block copolymers by polymerising at least one further monomer (B) onto the reactive terminal groups (a2) of existing polymer chains (A), these groups having been produced by supply of energy, in which the reactive terminal groups (a2) are produced, by irradiation with actinic light having a wavelength lambda of from 230 to 450 nm, from terminal groups (a1) which represent photopolymerisation initiators bonded to the polymer chains (A).

    23.
    发明专利
    未知

    公开(公告)号:DE3736980A1

    公开(公告)日:1989-05-18

    申请号:DE3736980

    申请日:1987-10-31

    Applicant: BASF AG

    Abstract: Light-sensitive registration material comprising… A) a photopolymerisable relief-forming layer which, after imagewise exposure to actinic light, can be developed with a liquid developer,… B) a covering layer which adheres firmly to the photopolymerisable relief-forming layer (A), is soluble or swellable in the liquid developers and is composed of polymers forming rupture-resistant films, and… C) a covering sheet which can readily be peeled off the covering layer (B),… the covering layer (B) containing specific tertiary amines and/or amides and/or specific quaternary ammonium salts of the type according to the claims and defined in greater detail. … A process is also provided for producing photopolymerisable printing plates, relief plates or photoresists using this registration material.

    26.
    发明专利
    未知

    公开(公告)号:DE3851126D1

    公开(公告)日:1994-09-22

    申请号:DE3851126

    申请日:1988-10-25

    Applicant: BASF AG

    Abstract: Light-sensitive registration material comprising… A) a photopolymerisable relief-forming layer which, after imagewise exposure to actinic light, can be developed with a liquid developer,… B) a covering layer which adheres firmly to the photopolymerisable relief-forming layer (A), is soluble or swellable in the liquid developers and is composed of polymers forming rupture-resistant films, and… C) a covering sheet which can readily be peeled off the covering layer (B),… the covering layer (B) containing specific tertiary amines and/or amides and/or specific quaternary ammonium salts of the type according to the claims and defined in greater detail. … A process is also provided for producing photopolymerisable printing plates, relief plates or photoresists using this registration material.

    27.
    发明专利
    未知

    公开(公告)号:DE58902095D1

    公开(公告)日:1992-10-01

    申请号:DE58902095

    申请日:1989-01-28

    Applicant: BASF AG

    Abstract: A novel sheet-like light-sensitive recording material I with at least one photopolymerisable, relief-forming layer (A) which, relative to (A), contains a1) 20 to 99.499 % by weight of at least one polymeric binder from the group comprising random ethylene/propylene/alkadiene terpolymers of an ethylene content of from 40 to 80 % by weight and a double bond content of 2 to 20 olefinic double bonds per 1000 carbon atoms, a2) 0.001 to 10 % by weight of at least one photopolymerisation initiator, a3) 0.5 to 50 % by weight of at least one monomer which is compatible with the binder (a1) and contains at least one photopolymerisable olefinic double bond, and a4) 0 to 40 % by weight of at least one auxiliary, by means of which the property pattern is varied, and the production of novel relief plates, relief printing plates and photoresists from these novel recording materials I and novel flexographic printing plates which have been produced from the recording materials I.

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