公开(公告)号：US20200316570A1

公开(公告)日：2020-10-08

申请号：US16956668

申请日：2018-12-20

Applicant: BASF SE

Inventor： Sabine SCHUSTER ,  Ekkehard SCHWAB ,  Stefan ALTWASSER ,  Harry KAISER ,  Stephan A. SCHUNK ,  Manuela GAAB

IPC: B01J29/46 ,  C07C43/04 ,  C07C41/01 ,  B01J8/06

Abstract: The invention relates to a catalyst system and process for preparing dimethyl ether from synthesis gas as well as the use of the catalyst system in this process.

公开(公告)号：US20190337970A1

公开(公告)日：2019-11-07

申请号：US16475167

申请日：2018-01-09

Applicant: BASF SE ,  Ghent University

Inventor： Maximilian HEMGESBERG ,  Carlos LIZANDARA ,  Jan BENNEWITZ ,  Armin MEYER ,  Stephan A. SCHUNK ,  Timo EMMERT ,  Isabel van DRIESSCHE ,  Katrien DE KEUKELEERE ,  Hannes RIJCKAERT ,  Glen POLLEFEYT ,  Jonathan DE ROO

IPC: C07F7/28 ,  C09D11/52 ,  C09D11/38 ,  C09D11/322 ,  C09D11/037

Abstract: The present invention is in the field of processes for the production of nanoparticles. It relates to a process for the preparation of nanoparticles comprising heating a water-free solution containing (a) a metal-organic compound containing an alkaline earth metal and a group 4 metal, and (b) a stabilizer to at least 150° C. for at least 30 minutes.

公开(公告)号：US20170128916A1

公开(公告)日：2017-05-11

申请号：US15348217

申请日：2016-11-10

Applicant: BASF SE

Inventor： Michael LEJKOWSKI ,  Yong LIU ,  Marco HARTMANN ,  Till Christian BRUEGGEMANN ,  Lukas SCHULZ ,  Johannes LIEBERKNECHT ,  Armin LANGE DE OLIVEIRA ,  Stephan A. SCHUNK ,  Andrei-Nicolae PARVULESCU ,  Martin DIETERLE ,  Nicolai Tonio WOERZ ,  Rolf TOMPERS ,  Robert MUELLER

IPC: B01J27/199 ,  C07C51/353 ,  B01J37/08 ,  B01J35/00 ,  B01J37/02

CPC classification number: B01J27/199 ,  B01J23/007 ,  B01J23/14 ,  B01J23/22 ,  B01J23/30 ,  B01J35/0006 ,  B01J37/0205 ,  B01J37/0236 ,  B01J37/024 ,  B01J37/086 ,  B01J37/088 ,  C07C51/353 ,  C07C57/04

Abstract: An oxidic composition comprising vanadium, tungsten, phosphorus, oxygen and optionally tin, where the molar ratio of phosphorus to the sum total of vanadium, tungsten and any tin in the oxidic composition is in the range from 1.4:1 to 2.4:1.