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21.
公开(公告)号:PL2219996T3
公开(公告)日:2012-05-31
申请号:PL08854777
申请日:2008-10-24
Applicant: EVONIK DEGUSSA GMBH
Inventor: PANZ CHRISTIAN , MEIER KARL , TOTH JAMES J , ROMAINE MATTHEW , SCHOLZ MARIO , TITZ GUIDO
IPC: C01B33/143 , C01B33/12 , C01B33/18 , C01B33/187 , C01B33/193
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公开(公告)号:ZA201102325B
公开(公告)日:2011-12-28
申请号:ZA201102325
申请日:2011-03-29
Applicant: EVONIK DEGUSSA GMBH
Inventor: PANZ CHRISTIAN , TITZ GUIDO , RAULEDER HARTWIG , BEHNISCH JURGEN , RUF MARKUS , PAULAT FLORIAN , MULLER SVEN , PELTZER JENS
IPC: C01B20060101
Abstract: The invention relates to a novel method for producing high-purity SiO2 from silicate solutions, a novel high-purity SiO2 with a specific impurity profile and use thereof.
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公开(公告)号:CA2738561A1
公开(公告)日:2010-04-08
申请号:CA2738561
申请日:2009-09-28
Applicant: EVONIK DEGUSSA GMBH
Inventor: PANZ CHRISTIAN , RUF MARKUS , TITZ GUIDO , PAULAT FLORIAN , RAULEDER HARTWIG , MUELLER SVEN , BEHNISCH JUERGEN , PELTZER JENS
IPC: C01B33/193
Abstract: The invention relates to a novel method for producing high-purity SiO2 from silicate solutions, a novel high-purity SiO2 with a specific impurity profile and use thereof.
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24.HERSTELLUNGSVERFAHREN EINES HOCHREINEN SILICIUMDIOXIDGRANULATS FÜR QUARZGLASANWENDUNGEN 有权
Title translation: HERSTELLUNGSVERFAHREN EINES HOCHREINEN SILICIUMDIOXIDGRANULATSFÜRQUARZGLASANWENDUNGEN公开(公告)号:EP2678280B1
公开(公告)日:2017-05-03
申请号:EP12704510
申请日:2012-02-10
Applicant: EVONIK DEGUSSA GMBH
Inventor: PANZ CHRISTIAN , TITZ GUIDO , MÜLLER SVEN , RUF MARKUS , FRINGS BODO , RAULEDER HARTWIG , BEHNISCH JÜRGEN
IPC: C03B19/10 , C01B33/193
CPC classification number: C01B33/193 , C01B33/124 , C01B33/126 , C01B33/128 , C01P2004/60 , C01P2006/14 , C01P2006/17 , C01P2006/80 , C03B19/1065 , C03B19/1095 , C03C1/022 , C03C14/008 , Y10T428/2982
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