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    21.
    发明专利
    未知

    公开(公告)号：DE19523891C1

    公开(公告)日：1996-11-21

    申请号：DE19523891

    申请日：1995-06-30

    Applicant: HOECHST AG

    Inventor： BELLER MATTHIAS DR ,  TAFESH AHMED DR ,  FISCHER RICHARD WALTER DR ,  SCHARBERT BERND DR

    IPC: C07D255/02 ,  B01J31/18 ,  C07F13/00 ,  C07F9/6515 ,  B01J31/22

    Abstract: Chiral manganese-triazanonane complexes of formula ÄMnu(L)v(OR)w( mu O)x( mu OAc)yÜX2 (I) are new. u, v = 1 or 2; w, x, y = 0-3; z = 1-3 with the proviso that a) when u = 1, then v = 1, w = 1, 2 or 3 and z = 1, 2 or 3; b) when u = 2, then (i) v = 2, w = 0 or 1, x = 1, y = 2 and z = 1 or 2; (ii) v =2, w = 0 or 1, x = 1, y = 2 and z = 2 or 3; or (iii) v = 2, w = 0 or 1, x = 3, y = 0 and z = 1 or 2; R = 1-12C alkyl; X = PF6 , F , Cl , Br , I , (C6H5)B or ClO4 ; L = a chiral triazanonane ligand of formula (II); R1-R12 = H, R, 3-12C cycloalkyl, 1-12C (sic) alkenyl, OR, 1-12C acyloxy, Ar, heteroaryl, CH2Ar, COOH, COOR, COOAr, CN, halo, trihalomethyl, NH2, NHR, N(R)2, NHAr, NAr2, N-alkylaryl, SR, SOR, SO2R or P(R)2; R = independently 1-12C alkyl; Ar = aryl; R13-R15 = H, R, CH2Ar, Ar or heteroaryl.

    24.
    发明专利
    未知

    公开(公告)号：DE4217338C2

    公开(公告)日：1994-09-01

    申请号：DE4217338

    申请日：1992-05-26

    Applicant: HOECHST AG

    Inventor： SCHARBERT BERND DR ,  BABUSIAUX PIERRE DR

    IPC: C07C51/00 ,  C07C59/153 ,  C25B3/25 ,  C25B3/04

    Abstract: The present invention describes a process for preparing glyoxylic acid by electrochemical reduction of oxalic acid in aqueous solution in divided or undivided electrolytic cells, characterized in that the cathode comprises from 50 to 99.999% by weight of lead and the aqueous electrolysis solution in the undivided cells or in the cathode space of the divided cells additionally contains at least one salt of metals having a hydrogen overvoltage (overpotential) of at least 0.25 V, based on a current density of 2500 A/m , and at least one mineral acid or organic acid. The process of the invention has the advantage that a highly pure, expensive lead cathode is not necessary and industrially available lead-containing materials can be used, for example alloys which, besides lead, contain at least one of the metals V, Sb, Ca, Sn, Ag, Ni, As, Cd and Cu. Periodic rinsing with nitric acid is not necessary.

    Selective epoxidation of alkene(s) for use in e.g. glycol prodn.
    25.
    发明专利
    Selective epoxidation of alkene(s) for use in e.g. glycol prodn. 未知

    公开(公告)号：DE4447231A1

    公开(公告)日：1996-07-04

    申请号：DE4447231

    申请日：1994-12-30

    Applicant: HOECHST AG

    Inventor： SCHARBERT BERND DR ,  LOBMAIER GERHARD ,  HERRMANN WOLFGANG ANTON PROF D

    IPC: B01J31/16 ,  B01J31/18 ,  B01J31/22 ,  C07D301/06 ,  C07D303/04

    Abstract: A process for the selective epoxidation of alkenes of formula (i) with atmos. oxygen in the presence of a catalyst of formula MxOy(L)z (1) is new, where R -R = H, 1-20C alkyl, 1-12C alkoxy or 6-10C aryl; or R + R may form a 5-30C ring; M = Mo, Ru or V; L = donor ligand; x = 1-3; z = 2-2x; y = 1-(2x + 1), and y is selected so that the sum of x + z gives a metal oxidn. state of +6 (Mo or Ru) or +5 (V). Pref. olefin starting materials are opt. branched aliphatic 2-30C olefins and 5-12C alicyclic olefins. Pref. oxidising agent is pure oxygen and oxygen diluted with inert gas. The process may be carried out in pure olefin without solvent, or in a solvent selected from halogenated aromatics, opt. halogenated hydrocarbons, 1-12C alcohols or water. The reaction temp. is 30-300 deg C for oxidn. of 6-12C alkenes and 120-230 deg C for 2-5C alkenes, and the pressure is such that reaction proceeds in the liq. phase. An activator or radical starter may be added, pref. in stoichiometric amts. based on the catalyst. The selectivity of the reaction is more than 40% with Mo complexes and more than 30% with Ru and V complexes.

    26.
    发明专利
    未知

    公开(公告)号：AT134224T

    公开(公告)日：1996-02-15

    申请号：AT93108108

    申请日：1993-05-18

    Applicant: HOECHST AG

    Inventor： SCHARBERT BERND DR ,  BABUSIAUX PIERRE DR

    IPC: C07C51/00 ,  C07C59/153 ,  C25B3/25 ,  C25B3/04 ,  C25B11/04

    Abstract: The present invention describes a process for preparing glyoxylic acid by electrochemical reduction of oxalic acid in aqueous solution in divided or undivided electrolytic cells, characterized in that the cathode comprises from 50 to 99.999% by weight of lead and the aqueous electrolysis solution in the undivided cells or in the cathode space of the divided cells additionally contains at least one salt of metals having a hydrogen overvoltage (overpotential) of at least 0.25 V, based on a current density of 2500 A/m , and at least one mineral acid or organic acid. The process of the invention has the advantage that a highly pure, expensive lead cathode is not necessary and industrially available lead-containing materials can be used, for example alloys which, besides lead, contain at least one of the metals V, Sb, Ca, Sn, Ag, Ni, As, Cd and Cu. Periodic rinsing with nitric acid is not necessary.

    29.
    发明专利
    未知

    公开(公告)号：BR9302036A

    公开(公告)日：1993-11-30

    申请号：BR9302036

    申请日：1993-05-24

    Applicant: HOECHST AG

    Inventor： SCHARBERT BERND DR ,  BABUSIAUX PIERRE DR

    IPC: C07C51/00 ,  C07C59/153 ,  C25B3/25 ,  C25B3/04

    Abstract: The present invention describes a process for preparing glyoxylic acid by electrochemical reduction of oxalic acid in aqueous solution in divided or undivided electrolytic cells, characterized in that the cathode comprises from 50 to 99.999% by weight of lead and the aqueous electrolysis solution in the undivided cells or in the cathode space of the divided cells additionally contains at least one salt of metals having a hydrogen overvoltage (overpotential) of at least 0.25 V, based on a current density of 2500 A/m , and at least one mineral acid or organic acid. The process of the invention has the advantage that a highly pure, expensive lead cathode is not necessary and industrially available lead-containing materials can be used, for example alloys which, besides lead, contain at least one of the metals V, Sb, Ca, Sn, Ag, Ni, As, Cd and Cu. Periodic rinsing with nitric acid is not necessary.

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