公开(公告)号：AU7929982A

公开(公告)日：1982-07-22

申请号：AU7929982

申请日：1982-01-08

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL

IPC: G03C1/72 ,  C07C67/00 ,  C07C301/00 ,  C07C309/76 ,  G03C1/56 ,  G03C1/60 ,  G03F7/022 ,  G03F7/26 ,  H05K3/00 ,  C07C161/06 ,  G03F7/08

Abstract: A light-sensitive mixture comprising a light-sensitive naphthoquinone-diazide-sulfonic acid ester corresponding to the formula: I wherein D represents a 1,2-naphthoquinone-2-diazide-5-sulfonyl or -4-sulfonyl radical; R1, R2, R3, R1', R2' and R3' each represent hydrogen, halogen, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO and n represents an integer from 2 to 18; not more than three DO radicals in total being present on one benzene ring. The mixture is useful for preparing printing plates or photoresists.

公开(公告)号：FI822257A0

公开(公告)日：1982-06-23

申请号：FI822257

申请日：1982-06-23

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL

IPC: G03C1/72 ,  G03C1/52 ,  G03C1/56 ,  G03F7/022 ,  G03F7/26 ,  H01L21/027 ,  G03C

Abstract: A light-sensitive mixture is described, which is specially intended for the production of planographic printing plates and which contains, as the light-sensitive compound, a naphthoquinonediazide sulfonic acid ester of the general formula I in which D is the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical or the 1,2-naphthoquinone-2-diazide-4-sulfonyl radical, preferably the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R and R' are hydrogen atoms, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO, and n denotes an integer from 6 to 18, preferably from 8 to 14. The new compounds are distinguished by good solubility and produce layers which have a high resistance to alkaline developer solutions and to damping solution containing alcohol.

公开(公告)号：AU7768181A

公开(公告)日：1982-05-27

申请号：AU7768181

申请日：1981-11-20

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL

IPC: G03C1/72 ,  G03C1/56 ,  G03C5/18 ,  G03F1/00 ,  G03F7/00 ,  G03F7/022 ,  C07C161/06 ,  G03F7/08

Abstract: A light-sensitive composition, especially suitable for preparation of planographic printing plates, comprising a water-insoluble resinous binder which is soluble or swellable in aqueous alkaline solutions, and a naphthoquinonediazide sulfonic acid ester of the general formula I (I) wherein D represents a 1,2-naphthoquinone-2-diazide-4-sulfonyl or 1,2-naphthoquinone-2-diazide-5-sulfonyl radical and R represents an alkyl or aryl radical. Printing plates produced with such compositions exhibit good resistance to aqueous alkaline developers, alcohol-containing moistening liquids and gasoline hydrocarbons.

公开(公告)号：CA1113107A

公开(公告)日：1981-11-24

申请号：CA311705

申请日：1978-09-20

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL ,  ERDMANN FRITZ

IPC: C08K5/00 ,  C08K5/22 ,  C08L61/00 ,  C08L61/04 ,  C09B53/00 ,  G03C1/72 ,  G03F7/022 ,  H01L21/027 ,  H05K3/00 ,  C07C143/68 ,  G03C1/10

Abstract: This invention relates to a photosensitive copying composition comprising a solvent and a naphthoquinone-(1,2)-diazide-sulfonic acid ester as the photosensitive compound, said naphthoquinone diazide sulfonic acid ester having the general formula I wherein: X is a single bond or one of the groups -CO- , -CH2-, -S-, -SO2-, or , R1, R1' and R1" are the same or different and are H or D, R2 and R2' are the same or different and are H or halogen, R3 is halogen or D, and D is a naphthoquinone-(1,2)-diazide-sulfonyloxy group.

公开(公告)号：FI793431A

公开(公告)日：1980-05-05

申请号：FI793431

申请日：1979-11-01

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL

IPC: G03C1/72 ,  G03F7/023 ,  H01L21/027 ,  G03C

公开(公告)号：SE391404B

公开(公告)日：1977-02-14

申请号：SE7407871

申请日：1974-06-14

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL ,  BEUTEL RAINER

IPC: C08L27/00 ,  C08L1/00 ,  C08L33/00 ,  C08L33/02 ,  C08L61/00 ,  C08L61/04 ,  G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  G03F7/105 ,  G03C1/54 ,  G03F7/08

公开(公告)号：BR8803865A

公开(公告)日：1989-02-21

申请号：BR8803865

申请日：1988-08-04

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL ,  FRASS HANS WERNER

IPC: G03C1/00 ,  G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  G03C1/52 ,  G03F7/08 ,  G03F7/10

Abstract: The invention describes a photosensitive composition, a copying material prepared from this composition, and a process for the production of negative relief copies, in which a photosensitive composition or a photosensitive material, respectively, is used, that comprises a support and a photosensitive composition coated onto the suppoort and comprising a photosensitive 1,2-quinonediazide or a photosensitive mixture, a binder that is soluble in aqueous-alkaline solutions and an s-triazine of the general formula I (I) wherein R denotes akyl, allyl, alkoxy, alkoxycarbonyl, alkoxycarbonylakkenyl, each having from 1 to 4 carbon atoms in the alkyl or alkenyl group, aryloxy, halogen or a nitro group and n stands for 1 to 3. The material is exposed imagewise under a negative original, thereafter heated and, after cooling, exposed without an original or optionally under a positive original, then developed by means of an aqueous-alkaline developer and optionally baked. The copying material has a relatively large treatment range during the heating step and can be used for the production of negative and positive printing forms and in the photocomposing process.

公开(公告)号：CA1248401A

公开(公告)日：1989-01-10

申请号：CA457991

申请日：1984-07-03

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL

IPC: G03F7/038 ,  G03C1/52 ,  G03C5/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/26 ,  G03F7/38 ,  G03F7/08

Abstract: A process for producing negative relief copies is disclosed in which a light-sensitive material, comprising (1) a light-sensitive ester or amide of a 1, 2-quinone-diazide-sulfonic acid or of a 1,2-quinone-diazide-carboxylic acid and (2) a hexamethylol melamine ether is imagewise exposed, thereafter heated, and, after cooling, exposed again without an original, and subsequently developed by means of an aqueous-alkaline developer. The disclosed process permits the production of negative copies with the aid of a material which yields positive copies when it is processed in a conventional manner.

公开(公告)号：BR8705924A

公开(公告)日：1988-06-14

申请号：BR8705924

申请日：1987-11-04

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL

IPC: G03F7/004 ,  G03F7/095 ,  G03F7/02

公开(公告)号：AU570308B2

公开(公告)日：1988-03-10

申请号：AU4021585

申请日：1985-03-21

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL ,  SCHELL LONI

IPC: B41N3/08 ,  G03F7/26 ,  G03F7/40 ,  G03F7/02

Abstract: A gumming solution is disclosed for use in the burning-in of irradiated and developed offset-printing plates. The gumming solution contains (a) water, (b) at least one hydrophilic polymer, and (c) at least one component derived from an organic acid. Component (b) comprises, for example, N-polyvinyl-pyrrolidone-(2) or polyacrylic acid, and component (c) comprises a water-soluble organic carboxylic acid, sulfonic acid, or phosphonic acid which has at least two acid functions and which is selected from the group consisting of benzene carboxylic acids, benzene sulfonic acids, benzene phosphonic acids, and alkane phosphonic acids, or one of the salts thereof (for example, disodium-benzene-1,3-disulfonate, mellitic acid, or methane-diphosphonic acid.) A process for the production of an offset-printing plate, using the aforesaid gumming solution in the burning-in of the plate, is also disclosed. With application of this gumming solution, washing of the printing plate prior to printing is rendered unnecessary, since the printing plate runs clean very rapidly during the printing process.