公开(公告)号：US20240186227A1

公开(公告)日：2024-06-06

申请号：US18061181

申请日：2022-12-02

Applicant: Intel Corporation

Inventor： Haobo Chen ,  Bohan Shan ,  Kyle J. Arrington ,  Kristof Darmawikarta ,  Gang Duan ,  Jeremy D. Ecton ,  Hongxia Feng ,  Xiaoying Guo ,  Ziyin Lin ,  Brandon Christian Marin ,  Srinivas V. Pietambaram ,  Dingying Xu

IPC: H01L23/498 ,  H01L21/48 ,  H01L23/00 ,  H01L23/538 ,  H01L23/64 ,  H01L25/065 ,  H05K1/02 ,  H05K1/03 ,  H05K1/11 ,  H05K1/18 ,  H05K3/46

CPC classification number: H01L23/49822 ,  H01L21/4857 ,  H01L21/486 ,  H01L23/49816 ,  H01L23/49838 ,  H01L23/5381 ,  H01L23/5383 ,  H01L23/5386 ,  H01L23/642 ,  H01L24/16 ,  H01L24/32 ,  H01L24/73 ,  H01L25/0655 ,  H05K1/0271 ,  H05K1/0306 ,  H05K1/113 ,  H05K1/181 ,  H05K3/4605 ,  H01L2224/16235 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2924/15174 ,  H01L2924/157 ,  H01L2924/15788 ,  H05K2201/0195

Abstract: In one embodiment, an integrated circuit package substrate includes a core layer comprising a plurality of metal vias electrically coupling a first side of the core layer and a second side of the core layer opposite the first side. The package substrate further includes a build-up layer on the first side of the core layer, the build-up layer comprising metal vias within a dielectric material and electrically connected to the metal vias of the core layer. The dielectric material includes Silicon, Oxygen, and at least one of Boron or Phosphorus.

公开(公告)号：US20240074046A1

公开(公告)日：2024-02-29

申请号：US17899336

申请日：2022-08-30

Applicant: Intel Corporation

Inventor： Ziyin Lin ,  Karumbu Nathan Meyyappan ,  Dingying Xu

IPC: H05K1/11 ,  H05K1/18 ,  H05K3/46

CPC classification number: H05K1/11 ,  H05K1/181 ,  H05K3/46 ,  H05K2201/0302 ,  H05K2201/10378

Abstract: Technologies for integrated circuit components with liquid metal interconnects are disclosed. In the illustrative embodiment, a bed of nails socket can mate with an integrated circuit component with liquid metal interconnects. The nails pierce a foam cap layer that seals the liquid metal interconnects, electrically coupling the nails to the liquid metal interconnects. A fabric layer adjacent to the foam cap layer helps secure the foam cap layer, preventing small pieces of the foam cap layer that may be dislodged during repeated insertion into a bed of nails socket from becoming separated from the foam cap layer. The fabric layer can provide additional benefits, such as removing more of the liquid metal from the nails when the integrated circuit component is removed from the bed of nails socket.

公开(公告)号：US11749585B2

公开(公告)日：2023-09-05

申请号：US16805392

申请日：2020-02-28

Applicant: Intel Corporation

Inventor： Yiqun Bai ,  Vipul Mehta ,  John Decker ,  Ziyin Lin

IPC: H01L23/31 ,  H01L23/433 ,  H01L21/56 ,  H01L25/00 ,  H01L25/065

CPC classification number: H01L23/4334 ,  H01L21/56 ,  H01L23/3185 ,  H01L25/0655 ,  H01L25/50

Abstract: An integrated circuit assembly may be formed comprising an electronic substrate, at least one integrated circuit device electrically attached to the electronic substrate, a mold material layer abutting electronic substrate and substantially surrounding the at least one integrated circuit, and at least one structure within the mold material layer, wherein the at least one structure comprises a material having a modulus of greater than about 20 gigapascals and a thermal conductivity of greater than about 10 watts per meter-Kelvin.

公开(公告)号：US11676876B2

公开(公告)日：2023-06-13

申请号：US16557891

申请日：2019-08-30

Applicant: Intel Corporation

Inventor： Ziyin Lin ,  Elizabeth Nofen ,  Vipul Mehta ,  Taylor Gaines

IPC: H01L23/31 ,  H01L21/56 ,  H01L23/367 ,  H01L23/373 ,  H01L21/67

CPC classification number: H01L23/3178 ,  H01L21/565 ,  H01L21/67288 ,  H01L23/367 ,  H01L23/373

Abstract: A device is disclosed. The device includes a first die, a plurality of chiplets above the first die, a first underfill material beneath the chiplets, and a gap fill material between the chiplets. The gap fill material is different from the first underfill material. An interface region is formed between the first underfill material and the gap fill material.

公开(公告)号：US20240222345A1

公开(公告)日：2024-07-04

申请号：US18090707

申请日：2022-12-29

Applicant: Intel Corporation

Inventor： Bohan Shan ,  Haobo Chen ,  Bai Nie ,  Srinivas Pietambaram ,  Gang Duan ,  Kyle Arrington ,  Ziyin Lin ,  Hongxia Feng ,  Yiqun Bai ,  Xiaoying Guo ,  Dingying Xu ,  Kristof Darmawikarta

IPC: H01L25/18 ,  H01L21/48 ,  H01L21/56 ,  H01L23/00 ,  H01L23/15 ,  H01L23/31 ,  H01L23/538 ,  H01L25/00

CPC classification number: H01L25/18 ,  H01L21/4853 ,  H01L21/4857 ,  H01L21/56 ,  H01L23/15 ,  H01L23/3121 ,  H01L23/5383 ,  H01L24/05 ,  H01L24/08 ,  H01L24/80 ,  H01L25/50 ,  H01L2224/05647 ,  H01L2224/08225 ,  H01L2224/80447 ,  H01L2224/80895

Abstract: An apparatus is provided which comprises: a plurality of interconnect layers within a substrate, a layer of organic dielectric material over the plurality of interconnect layers, copper pads within the layer of organic dielectric material, a first integrated circuit device copper-to-copper bonded with the copper pads, inorganic dielectric material over the layer of organic dielectric material, the inorganic dielectric material embedding the first integrated circuit device, and the inorganic dielectric material extending across a width of the substrate, and a second integrated circuit device coupled with a substrate surface above the inorganic dielectric material. Other embodiments are also disclosed and claimed.

公开(公告)号：US20240222301A1

公开(公告)日：2024-07-04

申请号：US18147497

申请日：2022-12-28

Applicant: Intel Corporation

Inventor： Bohan Shan ,  Hongxia Feng ,  Haobo Chen ,  Srinivas Pietambaram ,  Bai Nie ,  Gang Duan ,  Kyle Arrington ,  Ziyin Lin ,  Yiqun Bai ,  Xiaoying Guo ,  Dingying Xu ,  Sairam Agraharam ,  Ashay Dani ,  Eric J. M. Moret ,  Tarek Ibrahim

IPC: H01L23/00

CPC classification number: H01L24/11 ,  H01L2224/10122 ,  H01L2224/11011 ,  H01L2924/143 ,  H01L2924/186

Abstract: Methods and apparatus for optical thermal treatment in semiconductor packages are disclosed. A disclosed example integrated circuit (IC) package includes a dielectric substrate, an interconnect associated with the dielectric substrate, and light absorption material proximate or surrounding the interconnect, the light absorption material to increase in temperature in response to being exposed to a pulsed light for thermal treatment corresponding to the IC package.

公开(公告)号：US20240222259A1

公开(公告)日：2024-07-04

申请号：US18147535

申请日：2022-12-28

Applicant: Intel Corporation

Inventor： Haobo Chen ,  Bohan Shan ,  Xiyu Hu ,  Rhonda Jack ,  Catherine Mau ,  Hongxia Feng ,  Xiao Liu ,  Wei Wei ,  Srinivas Pietambaram ,  Gang Duan ,  Xiaoying Guo ,  Dingying Xu ,  Kyle Arrington ,  Ziyin Lin ,  Hiroki Tanaka ,  Leonel Arana

IPC: H01L23/498 ,  H01L21/48 ,  H01L23/29 ,  H01L23/31

CPC classification number: H01L23/49894 ,  H01L21/481 ,  H01L23/291 ,  H01L23/3192 ,  H01L24/16

Abstract: Methods, systems, apparatus, and articles of manufacture to produce integrated circuit (IC) packages having silicon nitride adhesion promoters are disclosed. An example IC package disclosed herein includes a metal layer on a substrate, a layer on the metal layer, the layer including silicon and nitrogen, and solder resist on the layer.

公开(公告)号：US20240222136A1

公开(公告)日：2024-07-04

申请号：US18091188

申请日：2022-12-29

Applicant: Intel Corporation

Inventor： Bohan Shan ,  Haobo Chen ,  Srinivas Venkata Ramanuja Pietambaram ,  Hongxia Feng ,  Gang Duan ,  Xiaoying Guo ,  Ashay A. Dani ,  Yiqun Bai ,  Dingying Xu ,  Bai Nie ,  Kyle Jordan Arrington ,  Wei Wei ,  Ziyin Lin

IPC: H01L21/321 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/768

CPC classification number: H01L21/3212 ,  H01L21/3065 ,  H01L21/31116 ,  H01L21/76814 ,  H01L21/7684

Abstract: Mechanical or chemical processes can form roughened surfaces which can be used for coupling layers of electrical systems such as when forming dies, substrates, computer chips or the like that, when subjected to high stress, are robust enough to remain coupled together.

公开(公告)号：US20240219659A1

公开(公告)日：2024-07-04

申请号：US18089871

申请日：2022-12-28

Applicant: Intel Corporation

Inventor： Ziyin Lin ,  Yiqun Bai ,  Bohan Shan ,  Kyle Jordan Arrington ,  Haobo Chen ,  Dingying Xu ,  Robert Alan May ,  Gang Duan ,  Bai Nie ,  Srinivas Venkata Ramanuja Pietambaram

IPC: G02B6/42 ,  G02B5/10

CPC classification number: G02B6/4246 ,  G02B5/10 ,  G02B6/4239 ,  H01Q1/2283

Abstract: A semiconductor device and associated methods are disclosed. In one example, the electronic device includes a photonic die and a glass substrate. In selected examples, the semiconductor device includes one or more turning mirrors to direct an optical signal between the photonic die and the glass substrate. Configurations of turning mirrors are provided to improve signal integrity and manufacturability.

公开(公告)号：US12002727B2

公开(公告)日：2024-06-04

申请号：US16788186

申请日：2020-02-11

Applicant: INTEL CORPORATION

Inventor： Ziyin Lin ,  Vipul Mehta ,  Wei Li ,  Edvin Cetegen ,  Xavier Brun ,  Yang Guo ,  Soud Choudhury ,  Shan Zhong ,  Christopher Rumer ,  Nai-Yuan Liu ,  Ifeanyi Okafor ,  Hsin-Wei Wang

IPC: H01L23/31 ,  H01L23/00 ,  H01L23/367

CPC classification number: H01L23/3185 ,  H01L23/3675 ,  H01L23/562 ,  H01L24/16 ,  H01L2224/16227 ,  H01L2924/18161 ,  H01L2924/35121

Abstract: An integrated circuit assembly may be formed comprising an electronic substrate, a first and second integrated circuit device each having a first surface, a second surface, at least one side extending between the first and second surface, and an edge defined at an intersection of the second surface and the at least one side of each respective integrated circuit device, wherein the first surface of each integrated circuit device is electrically attached to the electronic substrate, an underfill material between the first surface of each integrated circuit device and the electronic substrate, and between the sides of the first and second integrated circuit devices, and at least one barrier structure adjacent at least one of the edge of first integrated circuit device and the edge of the second integrated circuit device, wherein the underfill material abuts the at least one barrier structure.