公开(公告)号：JP2010237310A

公开(公告)日：2010-10-21

申请号：JP2009083187

申请日：2009-03-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  MARUYAMA TAKUYUKI

IPC: G03F7/023 ,  G02B1/04 ,  G03F7/004 ,  G03F7/40 ,  H01L51/50 ,  H05B33/10 ,  H05B33/12 ,  H05B33/22

Abstract: PROBLEM TO BE SOLVED: To provide a radiosensitive resin composition which has sufficient resolution, high resistance to a resist stripper or the like, excellent radiation sensitivity, and high light-shielding performance during heating. SOLUTION: The radiosensitive resin composition for forming partitions and insulating films includes: [A] an alkali-soluble resin of a copolymer obtained by copolymerization of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride and (a2) a monomer containing a compound selected from a group of phenol skeleton-containing unsaturated compounds, bisphenol skeleton-containing compounds, and naphthalene skeleton-containing compounds; [B] a 1, 2-quinonediazide compound; and [C] a heat sensitive dye. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种对抗蚀剂剥离剂等具有足够的分辨率，高抗性的放射敏感性树脂组合物，在加热期间具有优异的辐射敏感性和高的遮光性能。 解决方案：用于形成隔板和绝缘膜的放射敏感性树脂组合物包括：[A]通过（a1）不饱和羧酸和/或不饱和羧酸酐共聚而获得的共聚物的碱溶性树脂和（a2 ）含有选自含苯酚骨架的不饱和化合物，含双酚骨架化合物和含萘骨架化合物的化合物的化合物的单体; [B] 1,2-二叠氮化合物; 和[C]热敏染料。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010174082A

公开(公告)日：2010-08-12

申请号：JP2009016114

申请日：2009-01-28

Applicant: Dic Corp ,  Dic株式会社 ,  Jsr Corp ,  Jsr株式会社

Inventor： NAGAYA KATSUYA ,  HANAMURA MASAAKI ,  UEDA JIRO ,  MATSUEDA HIRONAO ,  TAKANO SATOSHI ,  KOISO TERUHIRO

IPC: C08L63/00 ,  C08K5/09 ,  C08K5/15 ,  C08K5/5435 ,  C08L101/02 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a resin composition for forming a protective film capable of forming the protective film, having high surface evenness and excellent in characteristics such as transparency and heat resistance, on a substrate with an uneven surface, even when a slit coating method is employed as a coating method. SOLUTION: This resin composition for forming the protective film includes (A) a polymer having a repeating unit derived from a polymerizable unsaturated compound with an epoxy group, (B) at least one compound selected from the group consisting of polycarboxylic anhydride and polycarboxylic acid, (C) a specific polymer having a silicone chain, (D) a compound having at least two cationically polymerizable groups, and (E) an alkoxysilane compound having an epoxy group. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 待解决的问题：为了提供一种用于形成能够形成保护膜的保护膜的树脂组合物，具有高表面均匀性和特性如透明性和耐热性优异的表面，在具有不平坦表面的基材上，即使 采用狭缝涂布法作为涂布方法。 该保护膜形成用树脂组合物包含（A）具有来自具有环氧基的聚合性不饱和化合物的重复单元的聚合物，（B）至少一种选自多元羧酸酐和 多羧酸，（C）具有硅酮链的特定聚合物，（D）具有至少两个阳离子聚合性基团的化合物，（E）具有环氧基的烷氧基硅烷化合物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010008603A

公开(公告)日：2010-01-14

申请号：JP2008166500

申请日：2008-06-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  KINOSHITA YOSHINORI

IPC: G03F7/075 ,  C08G77/14 ,  G02F1/1368 ,  G03F7/004 ,  G03F7/40 ,  G09F9/00 ,  G09F9/30 ,  H01L51/50

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition for forming wiring partitions having sufficient resolution, wide exposure margin, and excellent flattening performance, maintaining high transparency even when being passed through a high temperature heating process and hardly secularly deteriorating metal wiring.
SOLUTION: The radiation sensitive resin composition contains (A) polysiloxane obtained by poly-condensing (a-1) 50-99 wt.% of an alkoxy silane compound having an aryl group, (a-2) 1-45 wt.% of a silane compound having an alkyl group, and (a-3) 0-5 wt.% of the other alkoxy silane compound, and (B) a compound generating acid by receiving irradiation of radiation.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于形成具有足够的分辨率，宽的曝光裕度和优异的平坦化性能的布线隔板的辐射敏感性树脂组合物，即使当通过高温加热工艺并且几乎不会劣化金属时也保持高透明度 接线。 解决方案：辐射敏感性树脂组合物含有（A）通过聚缩合（a-1）50-99重量％的具有芳基的烷氧基硅烷化合物（a-2）1-45重量％ ％的具有烷基的硅烷化合物和（a-3）0-5重量％的其它烷氧基硅烷化合物，和（B）通过接收辐射辐射产生酸的化合物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008310044A

公开(公告)日：2008-12-25

申请号：JP2007157845

申请日：2007-06-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  YOSHIDA SHIN ,  IIJIMA TAKAHIRO

IPC: G03F7/075 ,  C08G59/20 ,  C08G77/14 ,  G02B1/04 ,  G02B3/00 ,  G03F7/023 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which, when used to form an interlayer insulation film under a baking condition of SOLUTION: The radiation-sensitive resin composition comprises [A] a polysiloxane having at least one group selected from the group consisting of an oxiranyl group and an oxetanyl group, and a functional group capable of addition reaction to an oxiranyl group or an oxetanyl group, and [B] a 1,2-quinonediazide compound. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种辐射敏感性树脂组合物，当其在<250℃的烘烤条件下用于形成层间绝缘膜时，可以形成具有高耐热性，高耐溶剂性的层间绝缘膜 ，高透射率和低介电常数，并且当用于形成微透镜时，可以形成具有高透射率和良好熔体形状的微透镜。 解决方案：辐射敏感性树脂组合物包含[A]具有至少一个选自环氧乙烷基和氧杂环丁烷基的基团的聚硅氧烷，以及能够与环氧乙烷基进行加成反应的官能团或 氧杂环丁烷基和[B] 1,2-醌二叠氮化合物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008216491A

公开(公告)日：2008-09-18

申请号：JP2007051870

申请日：2007-03-01

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HAMADA KENICHI ,  HANAMURA MASAAKI ,  IIJIMA TAKAHIRO

IPC: G03F7/023 ,  C08K5/28 ,  C08L33/08 ,  C08L33/10 ,  C08L63/00 ,  G02B3/00 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition that has high radiation-sensitivity, has a developing margin capable of forming a superior pattern shape, even if exceeding the optimum developing time in a developing process and that can easily form a patterned thin film that is superior in adhesiveness. SOLUTION: The radiation-sensitive resin composition contains unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride, an unsaturated compound containing at least one from among an epoxy group or an oxetanyl group, (meth)acrylmorpholine, a compolymer of other unsaturated compounds and 1,2-quinonedizide compound. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高辐射敏感性的辐射敏感性树脂组合物，具有能够形成优异图案形状的显影边缘，即使在显影过程中超过最佳显影时间并且可以容易地 形成粘合性优异的图案化薄膜。 解决方案：辐射敏感性树脂组合物含有不饱和羧酸和/或不饱和羧酸酐，包含环氧基或氧杂环丁烷基中的至少一种的不饱和化合物，（甲基）丙烯基吗啉，其它不饱和羧酸的共聚物 化合物和1,2-醌化合物。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008176037A

公开(公告)日：2008-07-31

申请号：JP2007009145

申请日：2007-01-18

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  UCHIIKE KAZUHIRO ,  MITANI KOJI ,  IIJIMA TAKAHIRO

IPC: G03F7/022 ,  G02B1/04 ,  G02B3/00 ,  G03F7/038 ,  G03F7/075

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high radiation sensitivity, having such a development margin that even if developing time exceeds the optimum time in a development step, a good pattern profile can be formed, and capable of easily forming a patterned thin film excellent in adhesion. SOLUTION: The radiation-sensitive resin composition includes [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an unsaturated compound containing an epoxy group and/or an oxetanyl group and (a3) an unsaturated compound other than the components (a1) and (a2), [B] a 1,2-quinonediazide compound and [C] a siloxane oligomer containing a functional group which takes part in a crosslinking reaction with the component [A] under heat. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高辐射敏感性的辐射敏感性树脂组合物，具有这样的显影余量，即使在显影步骤中显影时间超过最佳时间，可以形成良好的图案轮廓，并且能够 容易地形成粘附性优异的图案化薄膜。 解决方案：辐射敏感性树脂组合物包含[a]（a1）不饱和羧酸和/或不饱和羧酸酐的共聚物，（a2）含有环氧基和/或氧杂环丁烷基的不饱和化合物 和（a3）不同于组分（a1）和（a2）的不饱和化合物，[B] 1,2-醌二叠氮化合物和[C]含有与组分交联反应的官能团的硅氧烷低聚物 [A]在热。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008156393A

公开(公告)日：2008-07-10

申请号：JP2006343833

申请日：2006-12-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAGAYA KATSUYA ,  HANAMURA MASAAKI ,  HAMADA KENICHI ,  IIJIMA TAKAHIRO

IPC: C08L33/14 ,  C08F220/26 ,  C08K5/28 ,  C08K5/3492 ,  C08L63/00 ,  G02F1/1337 ,  G03F7/004 ,  G03F7/022 ,  G03F7/033 ,  G03F7/038 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having sufficient process margin and good preservation stability and suitably used for forming protrusions of a perpendicularly oriented type liquid crystal display element, to provide the protrusions formed therefrom and to provide the liquid crystal display element having the protrusions. SOLUTION: The radiation-sensitive resin composition for forming the protrusions of the perpendicularly oriented type liquid crystal display element comprises [A] a copolymer obtained by copolymerizing (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride with (a2) a specific oxetanyl group-containing unsaturated compound and (a3) an olefinically unsaturated compound other than the (a1) and (a2) and [B] a 1,2-quinone diazide compound. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供具有足够的加工余量和良好的保存稳定性并适合用于形成垂直取向型液晶显示元件的突起的辐射敏感性树脂组合物，以提供由其形成的突起，并提供 具有突起的液晶显示元件。 解决方案：用于形成垂直取向型液晶显示元件的突起的辐射敏感性树脂组合物包括[A]通过使（a1）不饱和羧酸和/或不饱和羧酸酐与（ a2）具体的含氧杂环丁烷基的不饱和化合物和（a3）除（a1）和（a2）和[B] 1,2-醌二叠氮化合物以外的烯属不饱和化合物。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006048020A

公开(公告)日：2006-02-16

申请号：JP2005193533

申请日：2005-07-01

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI

IPC: G02B3/00 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition for forming microlens which can form a microlens which has an excellent film thickness, resolution, pattern shape, transparency, heat resistance, heat discoloring resistance and solvent resistance or the like and a favorable preservation stability. SOLUTION: A radiation sensitive resin composition for forming microlens includes (A) an alkali soluble copolymer consists of (a) 10 to 50 wt.% of polymerizable unsaturated compound having an acid functional group, (b) 20 to 60 wt.% of polymerizable unsaturated compound having an alicyclic hydrocarbon group and having no acid functional group, (c) 5 to 40 wt.% of other polymerizable unsaturated compound ((a)+(b)+(c)=100 wt.%); (B) a polymerizable unsaturated compound; (C) a photopolymerization initiator and (D) a thermal polymerizable compound. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于形成微透镜的辐射敏感性树脂组合物，其可以形成具有优异的膜厚度，分辨率，图案形状，透明度，耐热性，耐热变色性和耐溶剂性等的微透镜，以及 有利保存稳定。 解决方案：用于形成微透镜的辐射敏感性树脂组合物包括（A）碱溶性共聚物由（a）10至50重量％的具有酸官能团的可聚合不饱和化合物，（b）20至60重量％ （c）5〜40重量％的其他聚合性不饱和化合物（（a）+（b）+（c）= 100重量％），具有脂肪族烃基，不具有酸官能团的聚合性不饱和化合物的％ （B）可聚合不饱和化合物; （C）光聚合引发剂和（D）热聚合性化合物。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2003347254A

公开(公告)日：2003-12-05

申请号：JP2002157060

申请日：2002-05-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： BESSHO NOBUO ,  HANAMURA MASAAKI ,  YOKOYAMA YASUAKI

IPC: B24B37/30 ,  C09J11/00 ,  C09J201/00 ,  H01L21/304 ,  H01L21/68 ,  H01L21/683 ,  B24B37/04

Abstract: PROBLEM TO BE SOLVED: To provide a wafer fixing composition containing a specific liquid crystal compound and an organic polymer and a semiconductor wafer processing method using the same, wherein a semiconductor wafer is brought into close contact with a base such as a hard plate, an elastic carrier (packing material), or a wafer and fixed so as to be held when the wafer is processed, the wafer as a work is easily separated, a fixing agent layer attached to the wafer is easily removed and/or cleaned, and the wafer as the work is kept free from contamination. SOLUTION: The wafer fixing composition contains a specific liquid crystal compound and an organic polymer. The wafer fixing composition can be provided in the form of liquid or a film. A thin film of the composition is formed on the wafer or the base. The wafer and the base, either of them is provided with the composition film on its surface, are brought into close contact with each other and fixed with each other. After the exposed surface of the wafer is subjected to processing, the wafer is separated from the base and cleaned, whereby the purpose can be achieved. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：为了提供含有特定液晶化合物和有机聚合物的晶片定影组合物和使用其的半导体晶片处理方法，其中半导体晶片与诸如硬的基底紧密接触 板，弹性载体（包装材料）或晶片，并且在晶片被加工时被固定以被保持，作为工件的晶片容易分离，附着到晶片的固定剂层容易地被去除和/或清洁 ，并且作为工件的晶片保持没有污染。 晶片固定组合物含有特定的液晶化合物和有机聚合物。 晶片定影组合物可以以液体或薄膜的形式提供。 该组合物的薄膜形成在晶片或基底上。 晶片和基板中的任一个在其表面上设置有组合物膜，彼此紧密接触并彼此固定。 在对晶片的暴露表面进行处理之后，将晶片与基板分离并清洁，从而可以实现目的。 版权所有（C）2004，JPO

公开(公告)号：JP2003332278A

公开(公告)日：2003-11-21

申请号：JP2002136995

申请日：2002-05-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： BESSHO NOBUO ,  HANAMURA MASAAKI ,  YOKOYAMA YASUAKI

IPC: B24B37/30 ,  H01L21/304 ,  B24B37/04

Abstract: PROBLEM TO BE SOLVED: To provide a wafer immobilizing agent, a composition for the wafer immobilizing agent and a method of working a wafer by using the same in which a semiconductor wafer is tightly immobilized and held on a substrate such as hard plate, elastic carrier (backing) or wafer when working the semiconductor wafer, the wafer of an object to be worked is easily released, further, a layer of the immobilizing agent stuck on the wafer is easily removed and irrigated and there is no danger of contamination with respect to the wafer of the object to be worked. SOLUTION: A liquid crystal compound is used as the immobilizing agent. Besides, the composition for immobilization contains the liquid crystal compound. By using them, a thin film of the liquid crystal compound is formed on a surface of the wafer or of the substrate and by using at least either one of the wafer or the substrate formed with the thin film on its surface, the both are tightly contacted and immobilized. Then, an exposed face of the wafer is worked and the wafer is separated from the substrate and irrigated to work the wafer. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供晶片固定剂，晶片固定剂组合物和使用其中半导体晶片紧密固定并保持在诸如硬板的基板上的晶片固定剂的方法 ，在加工半导体晶片时的弹性载体（背衬）或晶片，待加工物体的晶片容易释放，并且易于去除和灌溉固定在晶片上的固定剂层，并且没有污染的危险 相对于待加工物体的晶片。 解决方案：使用液晶化合物作为固定剂。 此外，用于固定的组合物含有液晶化合物。 通过使用它们，在晶片或基板的表面上形成液晶化合物的薄膜，并且通过使用在其表面上形成有薄膜的晶片或基板中的至少一个，两者都紧密 接触并固定。 然后，加工晶片的曝光面，并将晶片与基板分离并灌注以对晶片进行加工。 版权所有（C）2004，JPO