公开(公告)号：JP2012079865A

公开(公告)日：2012-04-19

申请号：JP2010222674

申请日：2010-09-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OGATA YOICHI ,  OKAMOTO TADASHI ,  NISHIMURA YUKIO ,  MOTONARI MASAYUKI

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a curable composition for nanoimprint exhibiting excellent mold releasability and causing no pattern collapse in a nanoimprint method, and to provide a nanoimprint method.SOLUTION: In the curable composition for nanoimprint, a composition containing (A) a polymerizable compound and (B) a radical generation agent is applied onto a glass substrate under nitrogen atmosphere and irradiated with UV-rays at 100 mJ/cmfor 3 seconds by using a metal halide ultraviolet irradiation device to obtain a hardened film having a thickness of 200 μm. Storage modulus E' of the hardened film at 20°C measured by dynamic thermomechanical analysis (DMTA) is 1.5 GPa or more.

Abstract translation: 待解决的问题：提供一种纳米压印固化组合物，其具有优异的脱模性，并且在纳米压印法中不产生图案塌陷，并提供纳米压印法。 解决方案：在纳米压印用固化性组合物中，在氮气氛下，将含有（A）可聚合化合物和（B）自由基产生剂的组合物施加到玻璃基板上，并以100mJ / cm 2的紫外线照射， SP POS =“POST”> 2 3秒钟，通过使用金属卤化物紫外线照射装置，得到厚度为200μm的硬化膜。 通过动态热力学分析（DMTA）测量的20℃下硬化膜的储能模量E'为1.5GPa以上。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011071299A

公开(公告)日：2011-04-07

申请号：JP2009220832

申请日：2009-09-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OKAMOTO TADASHI ,  NISHIMURA YUKIO

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method preventing variation in height of a resist pattern to be formed on a substrate.
SOLUTION: The pattern forming method includes steps of: (1) exposing a surface of a substrate to be processed to irradiation of ionizing rays to form an ionizing ray irradiated substrate having an ionizing ray irradiated surface; (2) forming a shape transferred layer made of a hardened composition hardened by an action of light or heat on the ionizing ray irradiated surface; (3) pressure-welding a stamper to the shape transferred layer; (4) exposing the shape transferred layer while the stamper is pressure-welded; and (5) peeling the stamper from the shape transferred layer, to obtain a substrate having the resist pattern formed.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种防止在基板上形成的抗蚀剂图案的高度变化的图案形成方法。 解决方案：图案形成方法包括以下步骤：（1）将待处理的基板的表面暴露于电离射线的照射，以形成具有电离射线照射表面的电离射线照射基板; （2）在电离射线照射面上形成由光或热作用硬化的硬化组合物形成的转印层; （3）将压模加压到形状转印层上; （4）在压模被压焊的同时露出形状转移层; 和（5）从成形转印层剥离压模，得到形成有抗蚀剂图案的基板。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010262980A

公开(公告)日：2010-11-18

申请号：JP2009110774

申请日：2009-04-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  OKAMOTO TADASHI ,  YAMAGUCHI KEIICHI

IPC: H01L21/027 ,  B29C59/02 ,  C08F20/34

CPC classification number: G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide a curable composition for nanoimprint lithography, capable of forming a shape transfer layer in which peeling of a resist film is rarely caused in a nanoimprint method. SOLUTION: The curable composition for nanoimprint lithography contains: a gas generator (A) generating gas by light or heat under a condition of 25°C and 1 atm; and a compound (B) having a second reactive group and stable against light and heat. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供能够形成在纳米压印法中很少引起抗蚀剂膜剥离的形状转印层的纳米压印光刻用固化性组合物。 解决方案：用于纳米压印光刻的可固化组合物包含：在25℃和1atm条件下通过光或热产生气体的气体发生器（A）; 和具有第二反应性基团且对光和热稳定的化合物（B）。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010128136A

公开(公告)日：2010-06-10

申请号：JP2008302124

申请日：2008-11-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OKAMOTO TADASHI ,  TOYOKAWA IKUHIRO ,  SUGIE NORIHIKO ,  NISHIMURA YUKIO

IPC: G03F7/11 ,  B32B27/00 ,  C08F20/38 ,  C08F20/58 ,  C08K5/053 ,  C08K5/17 ,  C08K5/3435 ,  C08L33/14 ,  C08L33/26 ,  C08L41/00 ,  C08L71/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an upper antireflection film for extending the depth of a focus, a composition for forming an upper antireflection film, and a pattern forming method using the upper antireflection film.
SOLUTION: The composition for forming an upper antireflection film contains (A) a polymer having a structural unit represented by formula (1), wherein R
1 denotes H or methyl, R
2 denotes a direct bond, -CH
2 -, -COO-A- or -CONH-A-, and A denotes a 1-8C divalent hydrocarbon group, (B) a tertiary amine compound having a hydroxyl group, and (C) water.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于延长聚焦深度的上部抗反射膜，用于形成上部抗反射膜的组合物和使用上部抗反射膜的图案形成方法。 解决方案：用于形成上部抗反射膜的组合物含有（A）具有由式（1）表示的结构单元的聚合物，其中R 1表示H或甲基，R 2 表示直接键，-CH 2 SB-，-COO-A-或-CONH-A-，A表示1-8C的二价烃基，（B）叔胺 具有羟基的化合物和（C）水。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008239723A

公开(公告)日：2008-10-09

申请号：JP2007080421

申请日：2007-03-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YAMAMURA TETSUYA ,  OKAMOTO TADASHI

IPC: C09J163/00 ,  C09J11/06 ,  C09J169/00

Abstract: PROBLEM TO BE SOLVED: To provide a composition for a radiation-curable adhesive, which can easily bond a PVA resin molding and another adherend and forms a composite material (e.g., laminate film) excellent in e.g., the ability to be cut without adhesive layer chipping, wet-heat resistance, and interlaminar bond strength.
SOLUTION: The composition comprises (A) an alicyclic epoxy compound, (B) a compound having at least one hydroxy group and having a number-average molecular weight of 500 or higher, and (C) a photo acid generator. The composite material 1 is produced by laminating an adherend 3 on either surface of a PVA molding 2 through an adhesive layer 4 comprising a cured product of the composition for the radiation-curable adhesive.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种可辐射固化粘合剂的组合物，其可以容易地粘合PVA树脂模制品和另一个被粘物，并形成例如优异的切割能力的复合材料（例如，层压膜） 没有粘合剂层破碎，耐湿热性和层间粘合强度。 解决方案：组合物包含（A）脂环族环氧化合物，（B）具有至少一个羟基并且数均分子量为500以上的化合物，（C）光酸产生剂。 复合材料1是通过粘合剂层4在PVA成型体2的表面上层叠被粘物3而制造的，所述粘合层4包含可辐射固化型粘合剂用组合物的固化物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008231168A

公开(公告)日：2008-10-02

申请号：JP2007069666

申请日：2007-03-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YAMAMURA TETSUYA ,  OKAMOTO TADASHI

IPC: C09J4/00 ,  B32B27/30 ,  C08G59/62 ,  C09J163/00 ,  C09J169/00

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-curable adhesive composition capable of forming a composite body by easily adhering a molded body of a PVA based resin to the other article to be adhered, and capable of enhancing cutting-resistant property of the composite body after adhesion.
SOLUTION: The composition contains (A) a compound represented by formula (1); (in formula (1), R
13 , R
14 and R
15 each independently represent a monovalent organic group, at least two of R
13 -R
15 are -R
16 OCOCR
17 =CH
2 , R
16 is a divalent 2-8C organic group, and R
17 is a hydrogen atom or a methyl group), (B) an alicyclic epoxy compound, (C) a compound containing at least one hydroxyl group and having a number average molecular weight of 500 or higher, and (D) an optical acid generation agent.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够通过将PVA基树脂的成型体容易地粘附到另一个待粘合的物品上而形成复合体的放射线固化型粘合剂组合物，并且能够提高耐候性 复合体粘合后。 组合物含有（A）由式（1）表示的化合物; （式（1）中，R 13，R 14，R 14和R 15各自独立地表示一价有机基团，R 1， SP> 13 -R 15 是R 16 OCOCR 17 = CH 2 SP> 16 是二价2-8C有机基团，R 16是氢原子或甲基），（B）脂环族环氧化合物，（C）含有 至少一个羟基，数均分子量为500以上，（D）光学酸产生剂。 版权所有（C）2009，JPO＆INPIT