公开(公告)号：JP2012216682A

公开(公告)日：2012-11-08

申请号：JP2011080859

申请日：2011-03-31

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OKAMOTO TADASHI ,  OGATA YOICHI ,  MOTONARI MASAYUKI

IPC: H01L21/027 ,  B29C59/02 ,  C08F2/46 ,  C08F220/10 ,  C08F220/20 ,  C08F220/22

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for nanoimprint and a pattern formation method using it, excellent in mold packing property, in pattern formation by a nanoimprint method.SOLUTION: The radiation-sensitive composition for nanoimprint contains aromatic ring and fluorine atom in the molecule which is identical or different, with a mol ratio of the aromatic ring against the fluorine atom being 6.0 or less. The radiation-sensitive composition for nanoimprint is preferred [A] to contain a polymerizable compound represented with a following formula (1), and further preferred [B] to further contain at least one kind of polymerizable compound selected from a group containing acrylate of alcohol having a specific structure including fluorination alkyl group.

Abstract translation: 解决的问题：提供一种纳米压印用的辐射敏感性组合物和使用它的图案形成方法，通过纳米压印法在图案形成中具有优异的模塑包装性能。 解决方案：纳米压印用辐射敏感性组合物在分子中含有芳香环和氟原子相同或不同，芳环与氟原子的摩尔比为6.0以下。 用于纳米压印的辐射敏感性组合物优选含有由下式（1）表示的可聚合化合物，进一步优选[B]还含有选自含有丙烯酸酯的醇的至少一种聚合性化合物 具有包括氟化烷基的特定结构。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2010258026A

公开(公告)日：2010-11-11

申请号：JP2009102972

申请日：2009-04-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  OKAMOTO TADASHI ,  YAMAGUCHI KEIICHI

IPC: H01L21/027 ,  B29C59/02 ,  B29K27/12 ,  C08F2/46 ,  C08F220/22

Abstract: PROBLEM TO BE SOLVED: To solve such a problem that a resist film is peeled, in an imprinting method of transferring and forming a fine pattern to a transferred layer using a stamper. SOLUTION: A photo-curing composition for nanoimprint lithography contains (A) a compound that has at least one reactive group, and contains a fluorine atom, (B) a compound that has at least one reactive group, and does not contain a fluorine atom, and (C) a compound that activates the reactive group of the compound (A) and/or the reactive group of the compound (B). COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题为了解决使用压模将转印和精细图案转印并形成转印层的印刷方法中解决抗蚀剂膜剥离的问题。 解决方案：用于纳米压印光刻的光固化组合物包含（A）具有至少一个反应性基团并且含有氟原子的化合物，（B）具有至少一个反应性基团的化合物，并且不含 氟原子，（C）活化化合物（A）的反应性基团和/或化合物（B）的反应性基团的化合物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010102128A

公开(公告)日：2010-05-06

申请号：JP2008273599

申请日：2008-10-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OKAMOTO TADASHI ,  KONNO KEIJI ,  SUGIE NORIHIKO ,  TOYOKAWA IKUHIRO ,  ASANO YUSUKE ,  ABE SHIGERU

IPC: G03F7/11

Abstract: PROBLEM TO BE SOLVED: To provide a composition for an overlay antireflection film which is excellent in coating performance and can form an antireflection film having a sufficient effect of preventing standing waves and sufficiently suppressing the occurrence of stripe defects in an outer circumference of a wafer, and to provide an overlay antireflection film. SOLUTION: The composition for forming an overlay antireflection film contains: a polymer (A) containing a (meth)acrylate unit (1) having a tertiary carbon-containing group having an OH group in a side chain and a (meth)acrylate unit (2) having a sulfonic acid group in a side chain; a polymer (B) containing the (meth)acrylate unit (2) having the sulfonic acid group in the side chain (meth)acrylate unit (3) having a perfluoroalkyl group in a side chain; and (C) water. The content of the polymer (B) is 100 to 300 parts by mass with respect to 100 parts by mass of the polymer (A). COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种涂覆性能优异的覆盖抗反射膜用组合物，并且可以形成具有足够的防止驻波效果并充分抑制条纹缺陷在外周的发生的抗反射膜 晶片，并提供覆盖抗反射膜。 ＆lt; P＆gt;解决方案：用于形成覆盖抗反射膜的组合物包含：含有侧链具有OH基的含叔碳原子的（甲基）丙烯酸酯单元（1）的聚合物（A）和（甲基） 丙烯酸酯单元（2）在侧链中具有磺酸基; 在侧链具有全氟烷基的侧链（甲基）丙烯酸酯单元（3）中含有具有磺酸基的（甲基）丙烯酸酯单元（2）的聚合物（B） 和（C）水。 相对于聚合物（A）100质量份，聚合物（B）的含量为100〜300质量份。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008225014A

公开(公告)日：2008-09-25

申请号：JP2007062694

申请日：2007-03-12

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YAMAMURA TETSUYA ,  OKAMOTO TADASHI

IPC: G02B5/30 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a polarizing plate allowed to be manufactured in a short time by a simple manufacturing process and excellent in chip cut resistance, humidity/heat resistance, an adhesive property between a protection film and a polarizer, and so on. SOLUTION: The polarizing plate 1 is constituted by laminating protection films 5, 6 composed of cyclic olefin resin films on both the sides of a polyvinyl alcohol polarizing film 2 through adhesive layers 3, 4. Each of the adhesive layers 3, 4 is composed of a cure object of a radiation curing composition containing an alicyclic epoxy compound (A), a compound (B) expressed by a formula: HO-(R 1 -O-CO-O) m -(R 2 -O-CO-O) n -R 3 -OH whose number average molecular weight is ≥500, and a photoacid generator (C). (In the formula, R 1 and R 2 respectively independently express a divalent hydrocarbon radical of carbon number 2-12, R 3 expresses the same structure as either one of the R 1 and the R 2 , m is 2-150, n is 0-150, and m + n is 2-200). COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：通过简单的制造工艺提供允许在短时间内制造的偏光板，并且具有优异的耐切削性，耐湿度/耐热性，保护膜和偏振片之间的粘合性，以及 所以。 解决方案：通过粘合层3,4将偏光板1层叠在聚乙烯醇偏振膜2的两侧上的由环状烯烃树脂膜构成的保护膜5,6构成。粘合剂层3,4 由包含脂环族环氧化合物（A）的辐射固化组合物的固化物，由下式表示的化合物（B）组成：HO-（R-SP 1 -O-CO-O） SB> m - （R 2 SP 2 -O-CO-O）其中数均分子量 ≥500，光产酸剂（C）。 （式中，R 1 和R 2 分别独立地表示碳原子数2-12的二价烃基，R“3”表示相同 结构为R 1 和R 2 中的任一个，m为2-150，n为0-150，m + n为2-200）。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2012216655A

公开(公告)日：2012-11-08

申请号：JP2011080457

申请日：2011-03-31

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OGATA YOICHI ,  OKAMOTO TADASHI ,  MOTONARI MASAYUKI

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide: a radiation-sensitive composition for nanoimprint, sufficiently satisfying basic characteristics such as hardenability and excellent in etching resistance, in forming a pattern by means of a nanoimprint method; and a method for forming a pattern using the radiation-sensitive composition.SOLUTION: A radiation-sensitive composition for nanoimprint of the present invention contains: a polymerizable compound including a sulfur atom; and a radiation-sensitive polymerization initiator. The polymerizable compound including a sulfur atom is preferably a compound represented by the following formula (1).

Abstract translation: 要解决的问题：提供：通过纳米压印法形成图案的纳米压印用辐射敏感性组合物，充分满足淬透性，耐蚀刻性优异的基本特性; 以及使用该辐射敏感性组合物形成图案的方法。 解决方案：本发明的纳米压印用辐射敏感性组合物含有：含有硫原子的聚合性化合物; 和辐射敏感聚合引发剂。 含硫原子的聚合性化合物优选为下述式（1）表示的化合物。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2009197116A

公开(公告)日：2009-09-03

申请号：JP2008039604

申请日：2008-02-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KATSURA YUICHIRO ,  YAMAMURA TETSUYA ,  OKAMOTO TADASHI

IPC: C09J163/00 ,  C09J7/02 ,  C09J11/06 ,  C09J169/00 ,  G02B5/30

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-curable composition for adhesive having excellent coating property and allowing manufacture of a polarizing plate having heat and humidity resistance, excellent in adhesive strength (peeling strength) or the like in a simple manufacturing step for a short time and the polarizing plate formed using the composition.
SOLUTION: The radiation-curable composition for adhesive contains (A) an alicyclic epoxy compound, (B) a compound having number-average molecular weight of ≥400 expressed in terms of polystyrene measured by gel permeation chromatography and having ≥2 hydroxy groups, (C) a compound having ≤10 mPa s viscosity at 25°C and having one hydroxy group and (D) a photo-acid-generating agent. The polarizing plate 1 is formed by laminating protective films 5, 6 across adhesive layers 3, 4 comprising a cured material of the radiation-curable composition for the adhesive on both surfaces of a polyvinyl alcohol-based polarizing film 2.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 解决方案：提供一种具有优异涂布性能的粘合剂用辐射固化组合物，并且在简单的制造步骤中可以制造具有耐热和耐湿性，粘合强度（剥离强度）等优异的偏振片 并且使用该组合物形成的偏振片。 解决方案：用于粘合剂的可辐射固化组合物含有（A）脂环族环氧化合物，（B）通过凝胶渗透色谱法测定的数均分子量为≥400的聚苯乙烯化合物，其具有≥2个羟基 （C）在25℃下具有≤10mPa·s粘度且具有一个羟基的化合物和（D）光酸产生剂。 偏光板1通过将保护膜5,6跨过粘合剂层3,4形成，粘合剂层3,4包含聚乙烯醇系偏振膜2的两个表面上的粘合剂的可辐射固化组合物的固化物。版权所有： （C）2009，JPO＆INPIT

公开(公告)号：JP2008241945A

公开(公告)日：2008-10-09

申请号：JP2007080422

申请日：2007-03-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YAMAMURA TETSUYA ,  OKAMOTO TADASHI

IPC: G02B5/30 ,  C09J11/06 ,  C09J163/00 ,  C09J169/00 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a polarizing plate that can be easily manufactured in a short time and is excellent in chip-cut resistance, heat and humidity resistance, adhesiveness between a protective film and an adhesive layer, and to provide a method for manufacturing the polarizing plate. SOLUTION: The polarizing plate 1 comprises a polyvinyl alcohol-based polarizing film 2, and protective films 5, 6 made of cyclic olefin resin films laminated via adhesive layers 3, 4 on both faces of the polarizing film 2. The adhesive layers 3, 4 comprise a compound (A) represented by formula (1). COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 解决的问题：提供一种可以在短时间内容易地制造并且抗切削性，耐热和耐湿性，保护膜和粘合剂层之间的粘合性优异的偏光板，并且提供 偏光板的制造方法。 解决方案：偏振板1包括聚偏乙烯基偏振膜2和由偏振膜2的两个表面上的粘合剂层3,4层压的环状烯烃树脂膜制成的保护膜5,6。 3,4代表由式（1）表示的化合物（A）。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008233874A

公开(公告)日：2008-10-02

申请号：JP2008018056

申请日：2008-01-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YAMAMURA TETSUYA ,  OKAMOTO TADASHI

IPC: G02B5/30 ,  G09F9/30

Abstract: PROBLEM TO BE SOLVED: To provide a polarizing plate which is manufactured in a short period of time with a simple process, and has excellent chip-cutting resistance, wet heat resistance and adhesiveness between a protective film and an adhesive layer, and also to provide its manufacturing method.
SOLUTION: The polarizing plate 1 is formed by layering protective films 5 and 6 composed of a norbornene based resin film on both surfaces of a polyvinyl alcohol based polarizing film 2 via adhesive layers 3 and 4. The adhesive layers 3 and 4 are composed of a cured product of a radiation curing composition including: (A) an alicyclic epoxy compound; (B) a compound having a number average molecular weight of ≥500, expressed in terms of polystyrene measured by gel permeation chromatography, and containing at least one hydroxyl group; and (C) a photoacid generator.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 解决的问题：为了提供以简单的工艺在短时间内制造的偏振片，并且具有优异的耐切削性，耐湿热性和保护膜与粘合剂层之间的粘合性，以及 也提供其制造方法。 解决方案：通过粘合层3和4，在聚乙烯醇系偏振膜2的两面上层叠由降冰片烯系树脂膜构成的保护膜5,6，形成起偏振片1。 由辐射固化组合物的固化产物组成，包括：（A）脂环族环氧化合物; （B）通过凝胶渗透色谱法测定的数均分子量≥500的化合物，以聚苯乙烯换算，含有至少一个羟基; 和（C）光致酸产生剂。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008233279A

公开(公告)日：2008-10-02

申请号：JP2007069667

申请日：2007-03-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YAMAMURA TETSUYA ,  OKAMOTO TADASHI

IPC: G02B5/30 ,  C09J11/06 ,  C09J163/00 ,  C09J169/00 ,  C09J175/16 ,  C09J201/06

Abstract: PROBLEM TO BE SOLVED: To provide a polarizing plate having excellent chip-cutting resistance.
SOLUTION: The polarizing plate is formed by layering protective films 5 and 6 composed of a cyclic olefin based resin film on both surfaces of a polarizing film 2 via adhesive layers 3 and 4. The adhesive layers 3 and 4 are composed of a radiation curing composition including: (A) a compound represented by a formula (1); (B) an alicyclic epoxy compound: (C) a compound having at least one hydroxyl group and a number average molecular weight of ≥500; and (D) a photoacid generator.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供具有优异的抗切屑性的偏振片。 解决方案：通过粘合层3和4在偏振膜2的两个表面上层叠由环状烯烃类树脂膜构成的保护膜5和6，形成偏振片。粘合剂层3和4由 辐射固化组合物，包括：（A）由式（1）表示的化合物; （B）脂环式环氧化合物：（C）具有至少一个羟基，数均分子量≥500的化合物; 和（D）光致酸产生剂。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008137190A

公开(公告)日：2008-06-19

申请号：JP2006323619

申请日：2006-11-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YAMAMURA TETSUYA ,  URUSHIBARA EIICHIRO ,  SHIMOMURA HIROMI ,  OKAMOTO TADASHI

IPC: B32B27/00 ,  B32B27/30

Abstract: PROBLEM TO BE SOLVED: To provide an antistatic laminate having cured film layers excellent in antistatic properties, hardness, abrasion resistance, and transparency on the surfaces of various substrates. SOLUTION: The laminate has an antistatic layer and a low refractive index layer in turn on a substrate. The substrate is made of a cyclic polyolefin resin (S). The antistatic layer is a cured film layer which is made by curing a liquid curable composition containing phosphor-containing tin oxide particles (1A), a compound (1B) having at least two polymerizable unsaturated groups in a molecule, and a photopolymerization initiator (1C) having a molar light absorption coefficient at 313 nm of 5,000 L/mol cm or below. The low refractive index layer is a cured film layer which is made by curing a liquid curable resin composition containing a fluorine-containing polymer (2A) containing ethylenically unsaturated groups, a compound (2B) having at least two (meth)acryloyl groups, hollow particles (2C) containing silica as a main component, and an organic solvent (2D). COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有优异的各种基材表面的抗静电性，硬度，耐磨性和透明性的固化膜层的抗静电层压体。 解决方案：层压体依次在基材上具有抗静电层和低折射率层。 基材由环状聚烯烃树脂（S）制成。 抗静电层是通过固化含有含荧光体的氧化锡颗粒（1A），分子中具有至少两个可聚合不饱和基团的化合物（1B）和光聚合引发剂（1C）来制备的固化膜层 ）在313nm下的摩尔光吸收系数为5000L / mol·cm以下。 低折射率层是通过固化含有含有烯属不饱和基团的含氟聚合物（2A）的液体固化性树脂组合物，具有至少两个（甲基）丙烯酰基的化合物（2B），中空的 以二氧化硅为主要成分的颗粒（2C）和有机溶剂（2D）。 版权所有（C）2008，JPO＆INPIT