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公开(公告)号：US10930474B2
公开(公告)日：2021-02-23
申请号：US15646017
申请日：2017-07-10
Applicant: MKS Instruments, Inc.
Inventor： Chaolin Hu , Xing Chen
Abstract: An assembly for adjusting gas flow patterns and gas-plasma interactions including a toroidal plasma chamber. The toroidal plasma chamber has an injection member, an output member, a first side member and a second side member that are all connected. The first side member has a first inner cross-sectional area in at least a portion of the first side member and a second inner cross-sectional area in at least another portion of the first side member, where the first inner cross-sectional area and the second inner-cross-sectional area being different. The second side member has a third inner cross-sectional area in at least a portion of the second side member and a fourth inner cross-sectional area in at least another portion of the second side member, where the third inner cross-sectional area and the fourth inner-cross-sectional area being different.
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Patent Agency Ranking
公开(公告)号：US20180233333A1
公开(公告)日：2018-08-16
申请号：US15952168
申请日：2018-04-12
Applicant: MKS Instruments, Inc.
Inventor： Xing Chen , Ilya Pokidov , Feng Tian , Ken Tran , David Lam , Kevin W. Wenzel
CPC classification number: H01J37/32449 , B01D53/323 , B01D53/76 , B01D2257/2064 , H01J37/32339 , H01J37/32357 , H01J37/32458 , H01J37/32651 , H01J37/32669 , H01J37/32844 , H01J37/32935 , H01J2237/3321 , H01J2237/334 , H05H1/46 , H05H2001/4667 , H05H2245/121 , Y02C20/30
Abstract: An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated.
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公开(公告)号：US09991098B2
公开(公告)日：2018-06-05
申请号：US15484072
申请日：2017-04-10
Applicant: MKS Instruments, Inc.
Inventor： Xing Chen , Ilya Pokidov , Feng Tian , Ken Tran , David Lam , Kevin W. Wenzel
CPC classification number: H01J37/32449 , B01D53/323 , B01D53/76 , B01D2257/2064 , H01J37/32339 , H01J37/32357 , H01J37/32458 , H01J37/32651 , H01J37/32669 , H01J37/32844 , H01J37/32935 , H01J2237/3321 , H01J2237/334 , H05H1/46 , H05H2001/4667 , H05H2245/121 , Y02C20/30
Abstract: An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated.
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公开(公告)号：US09630142B2
公开(公告)日：2017-04-25
申请号：US14212398
申请日：2014-03-14
Applicant: MKS Instruments, Inc.
Inventor： Xing Chen , Ilya Pokidov , Feng Tian , Ken Tran , David Lam , Kevin W. Wenzel
CPC classification number: H01J37/32449 , B01D53/323 , B01D53/76 , B01D2257/2064 , H01J37/32339 , H01J37/32357 , H01J37/32458 , H01J37/32651 , H01J37/32669 , H01J37/32844 , H01J37/32935 , H01J2237/3321 , H01J2237/334 , H05H1/46 , H05H2001/4667 , H05H2245/121 , Y02C20/30
Abstract: An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated.
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公开(公告)号：US20150318148A1
公开(公告)日：2015-11-05
申请号：US14645837
申请日：2015-03-12
Applicant: MKS Instruments, Inc.
Inventor： Xing Chen , Chengxiang Ji , Erin Madden , IIya Pokidov , Kevin W. Wenzel
IPC: H01J37/32
CPC classification number: H01J37/32229 , H01J37/32201 , H01J37/32311 , H01J37/32522 , H05H1/46 , H05H2001/4622
Abstract: An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube.
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26.发明申请公开(公告)号：US20150279626A1
公开(公告)日：2015-10-01
申请号：US14226994
申请日：2014-03-27
Applicant: MKS Instruments, Inc.
Inventor： Xing Chen , Chengxiang Ji , Erin Madden , Ilya Pokidov , Kevin W. Wenzel
IPC: H01J37/32
CPC classification number: H01J37/32229 , H01J37/32192 , H01J37/3222 , H01J37/32522
Abstract: An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube.
Abstract translation: 用于产生等离子体的装置包括等离子体放电管和螺旋缠绕在等离子体放电管的外表面上的导电线圈。 波导耦合到围绕等离子体放电管的微波腔，以将微波能量引导到等离子体放电管中，使得等离子体在等离子体放电管中产生。 波导被定位成使得微波能量的电场相对于等离子体放电管的纵向轴线定向成预定角度。 导电线圈中产生的感应电流影响等离子体放电管中的功率吸收，该预定角度是可选择的，使得等离子体放电管中的功率吸收相对于等离子体放电管的纵向轴线具有预定的轮廓。
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