Abstract:
Die Erfindung betrifft ein optoelektronisches Bauteil (101, 301, 501), umfassend ein Substrat (103, 303, 503), auf welchem eine Halbleiterschichtenfolge (105, 305, 505) aufgebracht ist, wobei die Halbleiterschichtenfolge (105, 305, 505) zumindest einen Identifikator (115, 315) zum Identifizieren des Bauteils (101, 301, 501) aufweist. Die Erfindung betrifft ferner ein Verfahren zur Herstellung eines optoelektronischen Bauteils (101, 301, 501).
Abstract:
Es wird ein optoelektronischer Halbleiterchip mit einer Halbleiterschichtenfolge (1) mit einem aktiven Bereich (2) auf einem Substrat (5) und mit einer Spiegelschicht (3) angegeben, die vollständig in einer Schicht (4) mit einem transparenten leitenden Oxid eingebettet ist. Weiterhin wird ein Verfahren zur Herstellung eines optoelektronischen Halbleiterchips angegeben.
Abstract:
A method for manufacturing a semiconductor device, particularly an optoelectronic device, proposes to provide a growth substrate (10); to deposit an n-doped first layer (20) and an active region (30) on the n-doped first layer (20); then a second layer (50) is deposited onto the active region (30); the second layer is doped with Mg in the second layer (50); Subsequently to depositing Mg, Zn is deposited in the second layer (50) such that a concentration of Zn in the second layer is decreasing from a first value to a second value in a first area of the second layer adjacent to the active region, said first area in the range of 5 nm to 200 nm, in particularly less than 50nm.
Abstract:
An optoelectronic semiconductor chip (10) is provided which has a semiconductor layer stack (3) and a mirror (2). The semiconductor layer stack (3) has an active layer (3a) for producing electromagnetic radiation. The mirror (2) is arranged on an underside of the semiconductor layer stack (3). The mirror (2) has a first region (2a) and a second region (2b), wherein the first region (2a) contains silver and the second region (2b) contains gold. In addition, a method for fabricating such a semiconductor chip (10) is specified.
Abstract:
A method of treating a semiconductor wafer (10) comprising a set of Aluminum Gallium Indium Phosphide light emitting diodes or AlGaInP-LEDs to increase the light generating efficiency of the AlGaInP-LEDs, wherein each ALGaInP-LED includes a core active layer for light generation sandwiched between two outer layers, the core active layer having a central light generating area (20) and a peripheral edge (22) surrounding the central light generating area, the method comprising the step of treating the peripheral edge (22) of the core active layer of each AlGaInP-LED with a laser beam (L), thus increasing the minimum band gap in each peripheral edge (22) to such an extent that, during later operation of the AlGaInP-LED, the electron-hole recombination is essentially confined to the central light generating area.