Abstract:
PROBLEM TO BE SOLVED: To provide a switching device that has almost no loss in a signal transmission circuit, enables to easily take impedance matching while allowing isolation during cut-off to be sufficiently obtained, and is capable of reducing manufacturing costs; and to provide a signal transmission circuit device using the switch device, and a switching method for the signal transmission circuit device. SOLUTION: The switching device is provided with a movable member 7 that allows a contact electrode 9 as a conductive member to be brought into contact with wiring sets 10, 11 or allows the contact electrode to be separated from the wiring sets while being deformed with thermal energy of light by receiving the light emitted from a light source 5. Accordingly, it is possible to switch in a state that a switch control circuit and the wiring sets or the like electrically connected to a signal line as a signal transmission circuit are completely, spatially, and electrically separated from each other. By this, it prevents a high-frequency signal component from leaking to the switch control circuit side while allowing isolation during switching to be sufficiently obtained. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor light emitting device using a uniform ridge having a forward taper-type ridge and highly symmetric property. SOLUTION: A mask pattern 11 is formed on a substrate 10 and an isotropic wet etching which does not have dependency is performed on the face orientation of crystal including at least a {111} B face. Then, the selective etching which is selectively carried out is performed on the face orientation including at least the {111} B face. Therefore, the substrate 10 having a ridge 10a where both sides are constituted of the {111} B faces is manufactured by those two types of etchings. Thus, an SDH structure is formed on the substrate 10, and a semiconductor light emitting device is manufactured. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a heat transfer device capable of reducing a manufacturing cost, electronic equipment loading the heat transfer device, and a manufacturing method for the heat transfer device. SOLUTION: The heat transfer device 10 is constituted by laminating a central plate material 3, spacers 2 and 4, side plate materials 1 and 5, and a clad material 6 configuring a heat absorber and the clad material 7 configuring a heat dissipator. Openings 2a and 4a formed to the spacers 2 and 4 respectively are used as flow paths for a working fluid. Accordingly, since the heat transfer device can be formed without depending upon a fine working technique such as a photolithography as seen in conventional devices, the manufacturing cost can be held down. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a cooling device of high cooling performance and high flexibility, an electronic equipment, an acoustic device, and a method of manufacturing the cooling device. SOLUTION: The cooling device 1 is provided with an evaporator 2 for cooling a cooled object, and a condenser 3 for radiating heat generated in cooling with the evaporator 2, to the outside. A gas phase passage 4 and a liquid phase passage 5 which are pipes formed of fluorocarbon resin to allow an operating fluid to flow through, are connected between the evaporator 2 and the condenser 3 to circulate the operating fluid. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a cooling device which is reduced in size and thickness and superior in temperature controlling performance, an electronic equipment, and a display device, and to provide a method of manufacturing cooling device. SOLUTION: The cooling device 1 is provided with a flow conduit board 10 and an intermediate board 30 which are both rectangular and formed of polydimethyl siloxane resin, and a capacitor board 20 and an evaporator board 40 which are both rectangular and formed of metal, such as nickel or the like having high thermal conductivity, equipped with grooves on their surfaces 10a and 20a respectively, and fitted in holes 31 and 32 bored in the intermediate board 30 and fixed by thermocompression bonding. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a structural substrate with proper planarity of the surface which comprises a ridge part, formed partially on the surface to project from the surface of the substrate, and to provide a manufacturing method of a semiconductor device using the structural substrate. SOLUTION: A GaAs-group substrate 10, after forming a ridge part 10a, is subjected to at least two of the following treatments in the order of treatment with an organic solvent, plasma treatment and surface reduction treatment. In the treatment with an organic solvent, for example, the substrate 10 is immersed in acetone, followed by rinsing with water and them drying. Ultrasonic cleaning may be added to the acetone treatment and the water rinsing. As the plasma treatment, the substrate is subjected to surface oxidation with an oxygen plasma and then to reduction treatment of immersing the substrate in 1 hydrogen 2 ammonium difluoride, as the surface reduction treatment. As a result, roughness of the substrate 10 can be alleviated.
Abstract:
PROBLEM TO BE SOLVED: To manufacture a semiconductor light emitting device which is restrained from varying in properties such as an operation voltage and the like when it is manufactured, capable of operating on a low voltage, long in service life, and high in yield. SOLUTION: An semiconductor laser of SCH structure(separate confinement hetero-structure) is composed of a ZnCoSe active layer, a ZnSSe optical wave- guide layer, and a ZnMgSSe clad layer, all P-type ZnTe quantum well layers 12a constituting a P-type ZnSe/ZnTeMQW(multi-quantum well) layer 12 of P-type contact layer are set nearly in the same thickness, and P-type ZnSe barrier layers 12v are set all in the same thickness. The P-type ZnTe quantum well layers 12a and the P-type ZnSe barrier layers 12b constituting the P-type ZnSe/ZnTeMQW layer 12 are grown in a desired thickness in a growing time almost an integer times as long as a rotation period of the substrate.
Abstract:
PROBLEM TO BE SOLVED: To provide a method of growing crystal, whereby the flatness is enhanced and film thickness and compsn. ratio are controlled with high accuracy. SOLUTION: A II and VI elements are fed to grow a crystal layer of a II-VI compd. semiconductor by the MBE method, comprising a step 1 of feeding a II element and then a VI element with an interruption time and allowing another interruption time to grow a crystal layer of 0.5ML or less, and a step 2 of feeding the II element and then the IV element with an interruption time and allowing another interruption time to grow a crystal layer of 0.5ML or more, thereby forming a crystal layer of 1ML, together with the step 1. Thus a crystal is grown two-dimensionally.
Abstract:
PURPOSE: To realize a semiconductor light emitting element of low threshold current density and long service life whose clad layer is formed of ZnMgSSe compound semiconductor. CONSTITUTION: An N-type Zn1-p Mgp Sq Se1-q clad layer 3, an N-type ZnSu Se1-u optical waveguide layer 4, an active layer 5, a P-type ZnSu Se1-u optical guide layer 6, and a P-type Zn1-p Mgp Sq Se1-q clad layer 7 are laminated on an N-type GaAs substrate 1 for the formation of a semiconductor laser, wherein the composition ratio p of Mg in the N-type Zn1-p Mgp Sq Se1-q clad layer 3 is so set as to satisfy a formula, 0.10
Abstract:
PURPOSE: To make a short-wavelength light emission possible at room temperatures and to contrive the stabilization of the performance characteristics, such as current-voltage characteristic and current-light output characteristic, and the prolongation of the life of the device in the II-VI compound semiconductor light-emitting device. CONSTITUTION: A semiconductor light-emitting device constituted of at least a first conductivity type first clad layer 2, an active layer 3 and a second conductivity type second clad layer 4 are provided on a substrate 1, at least the layer 3 consists of a II-VI compound semiconductor and this layer 3 is doped with either of an N-type dopant and a P-type dopant or both of the N-type and P-type dopants.