公开(公告)号：AU3038489A

公开(公告)日：1989-08-11

申请号：AU3038489

申请日：1989-01-11

Applicant: SOUTHWALL TECHNOLOGIES INC

Inventor： VINCENT STEVE M ,  BEHLING GERALD R ,  HOOD THOMAS G ,  GOMM WILLIAM E

IPC: C03C27/00 ,  C03C27/06 ,  E04C2/54 ,  E06B3/24 ,  E06B3/26 ,  E06B3/28 ,  E06B3/64 ,  E06B3/66 ,  E06B3/67 ,  E06B7/12

Abstract: Curved, insulated glazing structures and their preparation are disclosed. The glazing structures comprise two rigid outer surfaces (generally glass) and a suspended inner film surface parallel to the outer surfaces. The inner film is adhered to the outer surfaces only on its curved edges-its straight edges being unattached. The inner film is generally heat shrunk in the direction parallel to the straight edges and preferably carries a heat reflective coating.

公开(公告)号：WO2006113400A3

公开(公告)日：2008-09-12

申请号：PCT/US2006013993

申请日：2006-04-14

Applicant: SOUTHWALL TECHNOLOGIES INC ,  HOOD THOMAS G ,  WESTRA SICCO W T

Inventor： HOOD THOMAS G ,  WESTRA SICCO W T

IPC: C25D1/12 ,  B05D1/02 ,  B05D5/12 ,  C25D13/00 ,  H05K9/00

CPC classification number: B32B17/10018 ,  B32B17/10174

Abstract: Conductive micro traces (64) are formed on a coated or uncoated substrate (28) in order to achieve a combination of target optical properties and target electrical capabilities. For the coated substrate, the coating (100) may be formed before or after the conductive micro traces. Thecoating may be designed for providing IR filtering or reductions in reflected light and color shift, while the conductive micro traces may be used for EMI shielding or to provide current-carrying capability, such as when used as heaters. In another embodiment, the conductive micro traces are formed on an uncoated flexible transparent substrate and have a width of less than 25 microns, such that the conductive micro traces are capable of achieving their intended purpose while maintaining a high visible light transmissivity. The conductive micro traces may be formed using various approaches, such as the use of electroplating techniques or the use of inkjet printing techniques.

Abstract translation: 导电微迹线（64）形成在涂覆或未涂覆的基底（28）上，以实现目标光学特性和目标电气能力的组合。 对于涂覆的基材，涂层（100）可以在导电微迹之前或之后形成。 涂层可以设计用于提供IR滤波或减少反射光和色移，而导电微迹线可用于EMI屏蔽或提供载流能力，例如用作加热器时。 在另一个实施例中，导电微迹线形成在未涂覆的柔性透明衬底上并且具有小于25微米的宽度，使得导电微迹线能够实现其预期目的，同时保持高可见光透射率。 导电微迹线可以使用各种方法形成，例如使用电镀技术或使用喷墨印刷技术。

公开(公告)号：EP0574543A4

公开(公告)日：1995-08-09

申请号：EP92909081

申请日：1992-02-27

Applicant: SOUTHWALL TECHNOLOGIES INC

Inventor： TENNANT R ALEXANDER ,  HOOD THOMAS G

IPC: G02B5/08 ,  C08K5/3437 ,  C08L101/00 ,  C09K3/00 ,  F21V7/22 ,  G02B1/04 ,  G02B5/20 ,  G02B5/22

CPC classification number: G02B5/223 ,  F21V7/22 ,  G02B5/208 ,  Y10T428/31681 ,  Y10T428/31699

公开(公告)号：EP0644969A4

公开(公告)日：1996-11-06

申请号：EP93916438

申请日：1993-06-08

Applicant: SOUTHWALL TECHNOLOGIES INC

Inventor： HOOD THOMAS G ,  ILES ROGER F ,  MILLAR PETER J

IPC: C03C27/06 ,  E04C2/54 ,  E06B3/66 ,  E06B3/663 ,  E06B3/67 ,  E04B1/90 ,  E06B3/24

CPC classification number: E06B3/6715 ,  E04C2/54 ,  E06B3/66323 ,  E06B3/66366 ,  E06B2003/6638

Abstract: Multipane, insulating glazing structures having exceptional thermal insulation performance are provided. The multipane structures comprise two substantially parallel rigid glazing sheets (12, 18) spaced apart by an interior spacer (20) which includes a physically stable body (22) of low thermal conductivity, closed cell, foamed polymer.