PHOTOSENSITIVE CERAMIC COMPOSITION
    21.
    发明专利

    公开(公告)号:JPH10265270A

    公开(公告)日:1998-10-06

    申请号:JP33094496

    申请日:1996-12-11

    Abstract: PROBLEM TO BE SOLVED: To obtain a ceramic compsn. capable of forming a via hole having a high aspect ratio and high precision by using inorg. powder and a photosensitive org. component as essential components and specifying the difference between the average refractive index of the org. component and that of the inorg. powder. SOLUTION: This photosensitive ceramic compsn. contains inorg. powder and a photosensitive org. component as essential components. The average refractive index (N1) of the org. component and the average refractive index (N2) of the inorg. powder satisfy the formula -0.05 =80 number % sphericity and an average refractive index of 1.51.8. The org. component is a photosensitive compd. having an average refractive index of 1.45-1.7 selected from among a photosensitive monomer such as methyl acrylate, styrene or a methacrylate having an arom. ring, a photosensitive oligomer and a photosensitive polymer.

    PLASMA DISPLAY AND ITS MANUFACTURE
    22.
    发明专利

    公开(公告)号:JPH10214560A

    公开(公告)日:1998-08-11

    申请号:JP1861497

    申请日:1997-01-31

    Abstract: PROBLEM TO BE SOLVED: To eliminate meandering even in the case of a partitioning wall, having a large height and a narrow width to improve the yield of phosphor application, and prevent brightness nonconformity, by repeating applying, exposing, and developing two or more times through using photosensitive paste containing an inorganic fine particle and a photosensitive organic component to form a two-layer partitioning wall in the center and outer side parts. SOLUTION: The height H1 and width L1 of a center part baking partitioning wall layer, formed by printing, exposing, and developing photosensitive paste, are made 40-150μm and 55μm or less respectively. An outer side part baking partitioning wall is formed so as to have a height H2 of 100-250μm and a width L2 of 15-60μm, by repeating this process, preferably after heat-drying. This strengthens a center part baking partitioning wall to prevent snaking and the fluctuation of the size of line width due to the development. This ratio of the height and width of both the baking partitioning walls is preferably to have a range of 0.2

    PHOTOSENSITIVE GLASS PASTE
    23.
    发明专利

    公开(公告)号:JPH10182185A

    公开(公告)日:1998-07-07

    申请号:JP30567697

    申请日:1997-11-07

    Abstract: PROBLEM TO BE SOLVED: To enable easy and simple formation of the black screen for plasma displays by specifying the refractive index of the glass powder or the content proportion of the metals or their oxides in the glass powder. SOLUTION: Metals or metal oxides are added to the glass powder in the photosensitive glass paste or applied or coated on the surface of the glass powder thereby forming a black screen pattern. As the metal, are cited Ru, Cr, Fe, Co, Mn, Cu or Ni of which the oxides are black and one or more kinds of metals are preferably employed. The content is 0.5-20wt.% in the glass powder. The refractive index of the glass powder is preferably in the range from 1.5 to 2, because the pattern can be readily formed. When it is used as the screen for plasma display, more than 60wt.% of the inorganic powder is glass powder.

    PHOTOSENSITIVE GLASS PASTE
    24.
    发明专利

    公开(公告)号:JPH10167758A

    公开(公告)日:1998-06-23

    申请号:JP33095096

    申请日:1996-12-11

    Abstract: PROBLEM TO BE SOLVED: To obtain a photosensitive glass paste comprising inorganic powder containing glass powder having a repose angle in a specific range and an organic component containing a photosensitive compound, used on the formation of bulkheads for plasma displays, plasma address liquid crystal displays, etc., and capable of forming the highly precise bulkheads. SOLUTION: Glass powder having a repose angle of 60-70 or a degree of dispersion of 20-40% is used in the photosensitive glass paste to form good patterns. The refractive index of the glass powder is 1.5-1.8 so as to match to the refractive index of the organic component. The refractive index is measured with light having wavelengths 350-650nm and used for exposure by the photosensitive glass paste method or further with (i) ray or (g) ray. The inorganic powder has a volume-average particle diameter (D50 ) of >=1.5μm and a specific surface area of 0.2-3m /g, and >=60wt.% of the inorganic powder comprises the glass powder. The glass powder comprises 3-60wt.% of silicon oxide, 5-50wt.% of boron oxide and

    COMPOSITION FOR SUBSTRATE SINTERED AT LOW TEMPERATURE

    公开(公告)号:JPH10167757A

    公开(公告)日:1998-06-23

    申请号:JP33094796

    申请日:1996-12-11

    Abstract: PROBLEM TO BE SOLVED: To obtain a composition used for substrates sintered at a low temperature, comprising an organic component containing a photosensitive compound and inorganic particles comprising inorganic filler powder and glass particles having a specific composition, capable of being sintered at the low temperature, and capable of forming highly precise via-holes having a high aspect ratio. SOLUTION: The inorganic particles are glass particles or metal particles (e.g. gold, platinum or copper particles) used as electronic materials, especially glass ceramic particles having a spherical shape rate of >=80 particle %. The inorganic particles comprise >=30wt.% of glass particles and

    MANUFACTURE OF PLASMA DISPLAY
    26.
    发明专利

    公开(公告)号:JPH10125220A

    公开(公告)日:1998-05-15

    申请号:JP28236696

    申请日:1996-10-24

    Abstract: PROBLEM TO BE SOLVED: To form a high-accuracy pattern, a bulkhead layer in particular, having good surface flatness and suppressed in thickness dispersion, by applying a photosensitive paste made of glass fine grains and an organic component containing a photosensitive compound on a flexible base material, transferring it onto a glass substrate having an electrode layer formed, and forming a bulkhead by light irradiation, development and backing. SOLUTION: The photosensitive paste containing an organic component containing a photosensitive compound such as a photosensitive monomer such as methyl methacrylate, or its oligomer, or a polymer is applied on a flexible base material such as a polyester film. Glass fine grains of 50-95 pts.wt. and an organic component of 5-50 pts.wt. are contained in the photosensitive paste, and the glass fine grains having the average refraction factor in the range of 1.5-1.7 are selected. A glass substrate having a bulkhead layer obtained by coating, transfer, light irradiation exposure, development, and baking applied on the photosensitive paste can be used on the front face side or the back face side of a plasma display.

    PHOTOSENSITIVE PASTE AND PRODUCTION OF PLASMA DISPLAY USING THE SAME

    公开(公告)号:JPH10120432A

    公开(公告)日:1998-05-12

    申请号:JP27604196

    申请日:1996-10-18

    Abstract: PROBLEM TO BE SOLVED: To obtain a photosensitive paste capable of providing a high aspect ratio and pattern processing with a high accuracy. SOLUTION: This photosensitive paste consists essentially of glass fine particles containing 40-97wt.% low-melting glass fine particles having 350-500 deg.C glass transition point (Tg ) and 400-600 deg.C softening point (Ts ) and 3-60wt.% high-melting glass fine particles having 500-1,200 deg.C glass transition point (Tg ) and 550-1,200 deg.C softening point (Ts ) and a photosensitive organic component.

    PRODUCTION OF CERAMIC GREEN SHEET AND CERAMIC GREEN SHEET WITH FORMED PATTERN

    公开(公告)号:JPH09142940A

    公开(公告)日:1997-06-03

    申请号:JP30558195

    申请日:1995-11-24

    Abstract: PROBLEM TO BE SOLVED: To obtain a ceramic green sheet capable of satisfactory pattern formation and to form a fine pattern on the ceramic green sheet. SOLUTION: A sheet compsn. contg. ceramic powder and a photosensitive resin compsn. is applied to a substrate and dried to produce the objective ceramic green sheet. Biers are formed by exposure by irradiation with UV through a mask pattern and development. The surface of the sheet is coated with photosensitive electrically conductive paste contg. a powdery conductor and a photosensitive resin compsn., and the conductor is buried in the biers during the coating. A line pattern is then formed by exposure through a mask pattern and development.

    PHOTOSENSITIVE INSULATING GLASS PASTE

    公开(公告)号:JPH09110466A

    公开(公告)日:1997-04-28

    申请号:JP26452995

    申请日:1995-10-12

    Abstract: PROBLEM TO BE SOLVED: To obtain the paste capable of forming the high-definition and high- aspect-ratio partition wall and wall and the fine and uniform via holes of an insulating layer by mixing a glass powder, a photosensitive resin composition and a UV absorbent. SOLUTION: The glass powder is composed of 30-70wt.% Bi2 O3 , 3-30wt.% SiO2 , 2-25% B2 O3 , 5-25% BaO and 3-20% ZnO, expressed in terms of the oxides. The 50wt.% of the glass powder has 1-5μm average grain diameter, 0.5-5m /g specific surface and >=80% number sphericity. The amt. of the glass powder to be added is controlled to >=90wt.%. A light-insoluble photosensitive polymer is appropriately used as the binder polymer to be contained in a photosensitive resin composition. Especially, an acrylic copolymer having a carboxyl group and an ethylenic unsaturated group on the side chain is used. An org. dye (e.g. azo dye) is used as the UV absorbent, and the one with the integral value of the absorbance in 350-450nm wavelength controlled to 20-80 is preferably used.

    PHOTOSENSITIVE INSULATING GLASS PASTE

    公开(公告)号:JPH0850811A

    公开(公告)日:1996-02-20

    申请号:JP18720894

    申请日:1994-08-09

    Abstract: PURPOSE:To carry out highly fine and high density display by containing glass powder, acrylic copolymer having carboxyl group and ethylene-type unsaturated group in side chains and in the molecular terminals, a photoreactive compounds, and a photopolymerization initiator. CONSTITUTION:A glass powder having glass transition temperature 350-470 deg.C is preferable. An acrylic copolymer having carboxyl group and ethylene-type unsaturated group in the side chains and in the molecular terminals is used as a polymer binder component. The copolymer is produced by adding the ethylene-type unsaturated group to the side chains or molecular terminals of an acrylic copolymer produced by an unsaturated carboxylic acid and an ethylene-type unsaturated compound. As a photoreactive compound to be used, a compound containing photoreactive C-C unsaturated bonds is used. A photopolymerization initiator is preferably added in 0.15-50wt.% of the total of the acrylic copolymer and the photoreactive compound. As a result, a diaphragm can be formed easily and disorder of the width and peripheral parts can be prevented.

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