NANOPARTICLE PROBES WITH RAMAN SPECTROSCOPIC FINGERPRINTS FOR ANALYTE DETECTION

    公开(公告)号:CA2483697A1

    公开(公告)日:2003-11-20

    申请号:CA2483697

    申请日:2003-05-07

    Abstract: The invention encompasses reagents comprising particles with at least one Raman dye and a specific binding members bound thereto and methods of using such reagents. The invention also encompasses reagents of a specific binding member and two or more different Raman dyes and methods for using such reagents. New types of particle probes having a specific binding member boun d thereto are described. These reagents are used in a novel detection strategy that utilizes the catalytic properties of the Au nanoparticles to generate a silver coating that can behave as a surface-enhanced Raman scattering (SERS) promoter for the dye-labeled particles that have been captured by target and an underlying chip in microarray format. The strategy provides the high sensitivity and high selectivity attributes of grey-scale scanometric detection but provides a route to multiplexing and ratioing capabilities sin ce a very large number of probes can be designed based upon the concept of usin g a Raman tag as a spectroscopic fingerprint in detection. These spectra are used as fingerprints to differentiate oligonucleotide or other targets in on e solution. This method has been used to distinguish six dissimilar DNA target s with six Raman labeled nanoparticle probes, and also two RNA targets with single nucleotide polymorphisms (SNPs).

    Etching and hole arrays
    27.
    发明专利

    公开(公告)号:AU2007345315A1

    公开(公告)日:2008-07-31

    申请号:AU2007345315

    申请日:2007-06-28

    Abstract: Lithographic and nanolithographic methods that involve patterning a first compound on a substrate surface, exposing non-patterned areas of the substrate surface to a second compound and removing the first compound while leaving the second compound intact. The resulting hole patterns can be used as templates for either chemical etching of the patterned area of the substrate or metal deposition on the patterned area of the substrate.

    28.
    发明专利
    未知

    公开(公告)号:AT386570T

    公开(公告)日:2008-03-15

    申请号:AT01939491

    申请日:2001-05-25

    Abstract: The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air. The method comprises coating an AFM tip with a hydrophobic compound, the hydrophobic compound being selected so that AFM imaging performed using the coated AFM tip is improved compared to AFM imaging performed using an uncoated AFM tip. Finally, the invention provides AFM tips coated with the hydrophobic compounds.

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