公开(公告)号：US07499179B2

公开(公告)日：2009-03-03

申请号：US11694402

申请日：2007-03-30

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01B11/14

CPC classification number: G03F7/70258 ,  G03F7/70133 ,  G03F7/7025 ,  G03F7/70591

Abstract: A measurement method for measuring a position of an aperture stop in an optical system includes the steps of measuring a light intensity distribution of light that passes the aperture stop, at a position that is optically conjugate with a pupil position in the optical system, and determining a position of the aperture stop in the optical system based on a diffraction fringe of the light intensity distribution measured by the measuring step.

Abstract translation: 用于测量光学系统中的孔径光阑的位置的测量方法包括以下步骤：在与光学系统中的光瞳位置光学共轭的位置处测量通过孔径光阑的光的光强分布，以及确定 基于由测量步骤测量的光强度分布的衍射条纹，孔径光阑在光学系统中的位置。

公开(公告)号：US07468798B2

公开(公告)日：2008-12-23

申请号：US11627153

申请日：2007-01-25

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01B9/02 ,  G01B11/02

CPC classification number: G03F7/706 ,  G01J4/00 ,  G01J2009/0261 ,  G03F7/70566

Abstract: A method for irradiating onto a target optical system plural linearly polarized rays having different polarization directions, and for measuring a polarization characteristic of the target optical system including a birefringence amount R and a fast axis Φ includes the steps of irradiating linearly polarized ray having a polarization direction θ onto the target optical system and obtaining a centroid amount P of the ray that has transmitted through the target optical system, and obtaining the birefringence amount R and the fast axis Φ from P=−R·cos(2θ−Φ) or P=R·cos(2θ−Φ).

Abstract translation: 一种用于向目标光学系统照射多个具有不同偏振方向的线性偏振光，并且用于测量包括双折射量R和快轴Phi的目标光学系统的偏振特性的方法包括以下步骤：照射具有极化的线偏振光 方向θ到目标光学系统上，并获得透过目标光学系统的光线的重心量P，并从P = -R.cos（2theta-Phi）或P中获得双折射量R和快轴Phi = R.cos（2ta-Phi）。

公开(公告)号：US07193713B2

公开(公告)日：2007-03-20

申请号：US10692438

申请日：2003-10-22

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01B11/00

CPC classification number: G03F7/706 ,  G03F1/44

Abstract: Disclosed is a method and apparatus for measuring an optical characteristic of a projection optical system such as wavefront aberration, for example, very precisely. In an embodiment of the present invention, the method includes a first detecting step for causing each of plural light beams from a pattern to pass a predetermined position on a pupil plane of the optical system and subsequently imaging the light beams separately, and for detecting an imaging position of each light beam upon the pupil plane of the optical system, a second detecting step for detecting error information related to a passage position as each light beam passes through the pupil plane, and a third detecting step for detecting wavefront aberration of the optical system on the basis of the imaging position of each light beam upon the pupil plane and of the error information related to the passage position of each light beam on the pupil plane.

Abstract translation: 公开了例如非常精确地测量诸如波前像差的投影光学系统的光学特性的方法和装置。 在本发明的实施例中，该方法包括：第一检测步骤，用于使来自图案的多个光束中的每个光束通过光学系统的光瞳平面上的预定位置，并随后分别成像光束，并且用于检测 每个光束在光学系统的光瞳平面上的成像位置;第二检测步骤，用于在每个光束通过瞳孔平面时检测与通过位置有关的误差信息;以及第三检测步骤，用于检测光学系统的波前像差 基于每个光束在光瞳平面上的成像位置以及与光瞳平面上的每个光束的通过位置有关的误差信息。

公开(公告)号：US07190443B2

公开(公告)日：2007-03-13

申请号：US10307981

申请日：2002-12-03

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01B9/00

CPC classification number: G01M11/0264 ,  G03F1/44 ,  G03F7/70591 ,  G03F7/706

Abstract: A reticle having a test pattern for measurement of an optical characteristic of a projection optical system has a pattern adapted so that a high frequency component of a spectrum at a pupil plane of the projection optical system is reduced or suppressed. Illumination light is projected to the test pattern of the reticle in one direction or plural directions, and positions of images of the test pattern, formed by the projections in the plural directions, are detected and, based thereon, the optical characteristic of the projection optical system is measured.

Abstract translation: 具有用于测量投影光学系统的光学特性的测试图案的掩模版具有适于降低或抑制投影光学系统的光瞳面处的光谱的高频分量的图案。 照明光在一个方向或多个方向上投影到标线的测试图案，并且检测由多个方向上的突起形成的测试图案的图像的位置，并且基于该投影光学的光学特性 系统测量。

公开(公告)号：US20070046929A1

公开(公告)日：2007-03-01

申请号：US11466848

申请日：2006-08-24

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01B9/00

CPC classification number: G03F7/70141 ,  G01M11/0264 ,  G03F7/706

Abstract: A measurement method for measuring an optical characteristic of a target optical system includes the steps of introducing a light from each of plural patterns that reduce diffracted lights other than a predetermined order, to a different position on a pupil plane of the target optical system, the introducing step including the step of scanning the light in a radial direction in the pupil plane of the target optical system, detecting a imaging position of the light introduced by the introducing step, on an image plane of the target optical system, and obtaining the optical characteristic of the target optical system based on a detection result of the detecting step.

Abstract translation: 用于测量目标光学系统的光学特性的测量方法包括以下步骤：将来自减少不同于预定次数的衍射光的多个图案中的每一个导入到目标光学系统的光瞳平面上的不同位置， 引导步骤，包括在目标光学系统的光瞳平面中沿径向扫描光的步骤，检测由引入步骤引入的光的成像位置在目标光学系统的像平面上，并获得光学 基于检测步骤的检测结果的目标光学系统的特性。