公开(公告)号：US20130056905A1

公开(公告)日：2013-03-07

申请号：US13603575

申请日：2012-09-05

Applicant: Zenichi Hamaya ,  Noriyasu Hasegawa ,  Setsuo Yoshida ,  Yoshihiro Shiode

Inventor： Zenichi Hamaya ,  Noriyasu Hasegawa ,  Setsuo Yoshida ,  Yoshihiro Shiode

IPC: B29C59/02

CPC classification number: G03F7/70 ,  B29C59/002 ,  B29C59/022 ,  B29C2059/023 ,  B29K2909/08 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Abstract translation: 压印装置在基材上模塑未固化的树脂，并固化树脂以在基材上形成固化树脂的图案。 该装置包括保持模具的模具保持单元，保持基板的基板保持单元，使由模具保持单元保持的模具朝向基板变形为凸形的变形单元，改变姿势的驱动单元 模具或基板在模具变形为凸形的释放操作期间从树脂释放，从而使模具与可移动的树脂接触的接触区域的位置，获取 指示接触区域的状态的图像信息;以及控制单元，被配置为基于图像信息来控制驱动单元的操作。

公开(公告)号：US07221434B2

公开(公告)日：2007-05-22

申请号：US11365045

申请日：2006-02-28

Applicant: Yoshihiro Shiode ,  Seiya Miura

Inventor： Yoshihiro Shiode ,  Seiya Miura

IPC: G03B27/62 ,  G03B27/52 ,  G03B27/32

CPC classification number: G03B27/62 ,  G03F7/70516 ,  G03F7/70641

Abstract: An exposure method for an exposure apparatus that exposes a mask pattern onto a plate using a projection optical system includes the steps of obtaining information about flatness of a first mask, condition of an image plane when projecting a pattern of the first mask by using the projection optical system, information about a driving amount of a driving system, which can change an imaging condition on the plate based on the condition of the image plane, and information about flatness of a second mask, changing information about the driving amount by using information about flatness of the first and second masks, and driving the driving system based on changed information about the driving amount of the driving system to project a pattern of the second mask onto the plate using the projection optical system.

Abstract translation: 用于使用投影光学系统将掩模图案曝光在平板上的曝光装置的曝光方法包括以下步骤：获得关于第一掩模的平坦度的信息，通过使用投影来投影第一掩模的图案时的图像平面的状态 光学系统，关于驱动系统的驱动量的信息，其可以基于图像平面的状况改变印版上的成像条件，以及关于第二掩模的平坦度的信息，通过使用关于驱动量的信息来改变关于驾驶量的信息 第一和第二掩模的平坦度，并且基于关于驱动系统的驱动量的改变的信息来驱动驱动系统，以使用投影光学系统将第二掩模的图案投影到板上。

公开(公告)号：US06982786B2

公开(公告)日：2006-01-03

申请号：US10307945

申请日：2002-12-03

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01J1/00 ,  G01B11/00

CPC classification number: G03F7/706 ,  G03F7/70275

Abstract: In an optical characteristic measuring method for measuring an optical characteristic of a projection optical system (10a), a reticle (9) having a plurality of patterns (TP) is supplied, and scattered light from an aperture is directed to the plurality of patterns (TP), whereby light beams are projected onto the plurality of patterns in mutually different directions, by which images of the plurality of patterns are formed through the projection optical system (10a). Positions of images of the plurality of patterns, respectively, are detected and, by use of the result of detection, the optical characteristic of the projection optical system is detected. This accomplishes an optical characteristic measuring method and a reticle to be used therefor, which are suitable for measuring an optical characteristic of an optical system such as wavefront aberration, for example, at high precision.

Abstract translation: 在用于测量投影光学系统（10a）的光学特性的光学特性测量方法中，提供具有多个图案（TP）的掩模版（9），并且来自孔径的散射光被引导到多个图案 （TP），由此光束沿相互不同的方向投影到多个图案上，通过该方向通过投影光学系统（10a）形成多个图案的图像。 检测多个图案的图像的位置，并且通过使用检测结果检测投影光学系统的光学特性。 这就实现了用于测量光学系统的光学特性如波前像差的光学特性测量方法和掩模版，例如高精度地测量。

公开(公告)号：US09400426B2

公开(公告)日：2016-07-26

申请号：US13603575

申请日：2012-09-05

Applicant: Zenichi Hamaya ,  Noriyasu Hasegawa ,  Setsuo Yoshida ,  Yoshihiro Shiode

Inventor： Zenichi Hamaya ,  Noriyasu Hasegawa ,  Setsuo Yoshida ,  Yoshihiro Shiode

IPC: G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  B29C59/02

CPC classification number: G03F7/70 ,  B29C59/002 ,  B29C59/022 ,  B29C2059/023 ,  B29K2909/08 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Abstract translation: 压印装置在基材上模塑未固化的树脂，并固化树脂以在基材上形成固化树脂的图案。 该装置包括保持模具的模具保持单元，保持基板的基板保持单元，使由模具保持单元保持的模具朝向基板变形为凸形的变形单元，改变姿势的驱动单元 模具或基板在模具变形为凸形的释放操作期间从树脂释放，从而使模具与可移动的树脂接触的接触区域的位置，获取 指示接触区域的状态的图像信息;以及控制单元，被配置为基于图像信息来控制驱动单元的操作。

公开(公告)号：US09285675B2

公开(公告)日：2016-03-15

申请号：US13603523

申请日：2012-09-05

Applicant: Zenichi Hamaya ,  Noriyasu Hasegawa ,  Setsuo Yoshida ,  Yoshihiro Shiode

Inventor： Zenichi Hamaya ,  Noriyasu Hasegawa ,  Setsuo Yoshida ,  Yoshihiro Shiode

IPC: G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B29C59/022 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00

Abstract: An imprint apparatus includes a deforming unit configured to deform the mold held by the mold holding unit into a convex shape toward the substrate; a driving unit configured to change an attitude of the mold or the substrate during a pressing in which the mold deformed is pressed against the uncured resin to thereby make a position of a contact region at which the mold is brought into contact with the uncured resin movable; a control unit configured to calculate a plane coordinates of a centroid of the contact region based on an image information of the contact region acquired by a measuring unit and to control an operation of the driving unit such that the plane coordinates position of the centroid is directed toward the plane coordinates position of the centroid of a pattern-forming region on the substrate, which has been calculated or has been acquired in advance.

Abstract translation: 压印装置包括变形单元，其被构造成将由模具保持单元保持的模具变形成朝向基板的凸形状; 驱动单元，其构造成在压模中改变模具或基板的姿态，其中模具变形压在未固化树脂上，从而形成与未固化树脂可移动接触的接触区域的位置 ; 控制单元，被配置为基于由测量单元获取的接触区域的图像信息来计算接触区域的质心的平面坐标，并且控制驱动单元的操作，使得质心的平面坐标位置被定向 朝向已经计算或已经被预先获取的基板上的图案形成区域的质心的平面坐标位置。

公开(公告)号：US20060268255A1

公开(公告)日：2006-11-30

申请号：US11365045

申请日：2006-02-28

Applicant: Yoshihiro Shiode ,  Seiya Miura

Inventor： Yoshihiro Shiode ,  Seiya Miura

IPC: G03B27/62

CPC classification number: G03B27/62 ,  G03F7/70516 ,  G03F7/70641

Abstract: An exposure method for an exposure apparatus that exposes a mask pattern onto a plate using a projection optical system includes the steps of obtaining information about flatness of a first mask, condition of an image plane when projecting a pattern of the first mask by using the projection optical system, information about a driving amount of a driving system, which can change an imaging condition on the plate based on the condition of the image plane, and information about flatness of a second mask, changing information about the driving amount by using information about flatness of the first and second masks, and driving the driving system based on changed information about the driving amount of the driving system to project a pattern of the second mask onto the plate using the projection optical system.

Abstract translation: 用于使用投影光学系统将掩模图案曝光在平板上的曝光装置的曝光方法包括以下步骤：获得关于第一掩模的平坦度的信息，通过使用投影来投影第一掩模的图案时的图像平面的状态 光学系统，关于驱动系统的驱动量的信息，其可以基于图像平面的状况改变印版上的成像条件，以及关于第二掩模的平坦度的信息，通过使用关于驱动量的信息来改变关于驾驶量的信息 第一和第二掩模的平坦度，并且基于关于驱动系统的驱动量的改变的信息来驱动驱动系统，以使用投影光学系统将第二掩模的图案投影到板上。

公开(公告)号：US20060055915A1

公开(公告)日：2006-03-16

申请号：US11226815

申请日：2005-09-13

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01B9/00

CPC classification number: G03F7/706

Abstract: A measuring apparatus for measuring optical characteristic of a target optical system includes plural patterns for reducing diffracted lights except for a predetermined order diffracted light, a collimating part for producing collimated or substantially collimating light, and a condensing part for condensing the collimated or substantially collimated light so that lights having different angles are incident upon the plural patterns, wherein the predetermined order diffracted lights emitted from the plural patterns enter pupil surface in the target optical system at different positions.

Abstract translation: 用于测量目标光学系统的光学特性的测量装置包括用于减少除了预定次级衍射光之外的衍射光的多个图案，用于产生准直或基本上准直的光的准直部分，以及用于聚焦准直或基本准直的光 使得具有不同角度的光入射到多个图案上，其中从多个图案发射的预定次数的衍射光在目标光学系统中的不同位置处进入光瞳表面。

公开(公告)号：US07826044B2

公开(公告)日：2010-11-02

申请号：US11466848

申请日：2006-08-24

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01B9/00

CPC classification number: G03F7/70141 ,  G01M11/0264 ,  G03F7/706

Abstract: A measurement method for measuring an optical characteristic of a target optical system includes the steps of introducing a light from each of plural patterns that reduce diffracted lights other than a predetermined order, to a different position on a pupil plane of the target optical system, the introducing step including the step of scanning the light in a radial direction in the pupil plane of the target optical system, detecting a imaging position of the light introduced by the introducing step, on an image plane of the target optical system, and obtaining the optical characteristic of the target optical system based on a detection result of the detecting step.

Abstract translation: 用于测量目标光学系统的光学特性的测量方法包括以下步骤：将来自减少不同于预定次数的衍射光的多个图案中的每一个导入到目标光学系统的光瞳平面上的不同位置， 引导步骤，包括在目标光学系统的光瞳平面中沿径向扫描光的步骤，检测由引入步骤引入的光的成像位置在目标光学系统的像平面上，并获得光学 基于检测步骤的检测结果的目标光学系统的特性。

公开(公告)号：US07423740B2

公开(公告)日：2008-09-09

申请号：US11123139

申请日：2005-05-06

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01B9/00

CPC classification number: G01M11/0264 ,  G03F1/44 ,  G03F7/70591 ,  G03F7/706

Abstract: A reticle having a test pattern for measurement of an optical characteristic of a projection optical system has a pattern adapted so that a high frequency component of a spectrum at a pupil plane of the projection optical system is reduced or suppressed. Illumination light is projected to the test pattern of the reticle in one direction or plural directions, and positions of images of the test pattern, formed by the projections in the plural directions, are detected and, based thereon, the optical characteristic of the projection optical system is measured.

Abstract translation: 具有用于测量投影光学系统的光学特性的测试图案的掩模版具有适于降低或抑制投影光学系统的光瞳面处的光谱的高频分量的图案。 照明光在一个方向或多个方向上投影到标线的测试图案，并且检测由多个方向上的突起形成的测试图案的图像的位置，并且基于该投影光学的光学特性 系统测量。

公开(公告)号：US07375805B2

公开(公告)日：2008-05-20

申请号：US11614207

申请日：2006-12-21

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01B9/00

CPC classification number: G01M11/0264 ,  G03F1/44 ,  G03F7/70591 ,  G03F7/706

Abstract: A wavefront aberration measuring method for measuring wavefront aberration of a projection optical system. The method includes providing a reticle having lines and spaces in which, with respect to a repetition direction thereof and from a center to a periphery, a pitch of the spaces is substantially constant while widths of the spaces gradually decrease and in which adjacent lines are not resolvable by the projection optical system, projecting light fluxes to the lines and spaces from different directions, whereby plural images of the lines and spaces are formed through the projection optical system, and detecting respective positions of the plural images and detecting, by use of the result of the detection, the wavefront aberration of the projection optical system.

Abstract translation: 一种用于测量投影光学系统的波前像差的波前像差测量方法。 该方法包括提供具有线和间隔的掩模版，其中相对于其重复方向和从中心到周边，间隔的间距基本上恒定，而空间的宽度逐渐减小，并且相邻的线不相邻 通过投影光学系统可分辨的方式，将光束从不同方向投射到线和间隔，由此通过投影光学系统形成线和间隔的多个图像，并且检测多个图像的各个位置，并且通过使用 检测结果，投影光学系统的波前像差。