Abstract:
Provided are a process monitoring apparatus and method. The process monitoring apparatus includes a process chamber in which a process is performed, a probe assembly disposed on the process chamber, and comprising a probe electrode, a plasma generator generating plasma around the probe assembly, and a drive processor applying an alternating current (AC) voltage having at least 2 fundamental frequencies to the probe assembly, and extracting process monitoring parameters.
Abstract:
Provided is a biosensor for detecting biomolecules. The biosensor includes a sensor portion for making contact with biomolecules to be detected, an electrode for supplying an electric current to the sensor portion and a connector portion for electrically interconnecting the sensor portion and the electrode. The sensor portion is made from a pyrolyzed photo-sensitive sensor portion precursor obtained through a lithography process.
Abstract:
A slim mouse for mobile appliances includes a lower polymer film having a metal layer on an upper surface of the lower polymer film, an upper polymer film having a metal layer on a lower surface of the upper polymer film, a donut force sensor array including multiple force sensors, a weight-bumper spacer including a donut sensor portion and a click-detection sensor portion, a pad including a donut sensor portion and a click-detection sensor portion, and a click-detection force sensor.
Abstract:
Provided is an acoustic sensor for measuring a sound wave propagating through a gas such as air or a fluid such as water and an elastic wave propagating through a solid medium, and more particularly, an acoustic sensor with a piezo-arrangement film capable of detecting frequencies in a broad band or amplifying a signal at a specific frequency by comparting a waveguide into an upper waveguide and a lower waveguide by means of a compartment diaphragm and arranging piezoelectric sensors on the compartment diaphragm in several forms. The acoustic sensor can be utilized as a resonant acoustic sensor in which the piezoelectric sensors are arranged on the compartment diaphragm in the same form so that a signal at a specific frequency overlaps for high sensibility or a broadband acoustic sensor in which the piezoelectric sensors are arranged in a different form to detect frequencies in a broad band. The sensor for measuring an acoustic wave includes a waveguide including a vibrating membrane for receiving the acoustic wave, an emitting membrane for emitting the acoustic wave, and a propagation medium filled therein for propagating the acoustic wave received by the vibrating membrane; a compartment diaphragm for comparting the waveguide into an upper waveguide and a lower waveguide; an omni-directional endpoint processing unit formed at an end of the waveguide for absorbing the acoustic wave received by the vibrating membrane; and a plurality of piezoelectric sensors formed on the compartment diaphragm for detecting the acoustic wave.
Abstract:
The present invention relates to a method for fabricating a scanning probe microscope (SPM) nanoneedle probe using ion beam which is preferably focused ion beam and a nanoneedle probe thereby. More particularly, the present invention relates to a method for fabricating a SPM nanoneedle probe capable of being easily adjusted with an intended pointing direction of a nanoneedle attached on a tip of the SPM nanoneedle probe and of being easily straightened with the nanoneedle attached on the tip of the SPM nanoneedle probe along the intended pointing direction, and to a SPM nanoneedle probe thereby. Also, the present invention relates to a method for fabricating a critical dimension SPM(CD-SPM) nanoneedle probe capable of precisely scanning the sidewall of an sample object in nanoscale using ion beam which is preferably focused ion beam, and to a CD-SPM nanoneedle probe thereby. More particularly, the present invention relates to a method for fabricating a CD-SPM nanoneedle probe capable of precisely scanning the sidewall of the sample object in nanoscale by bending a portion of an end of the nanoneedle attached on the tip of the SPM nanoneedle probe in a specific angle toward a diretion other than an original direction in which the nanoneedle attached on the tip of the SPM nanoneedle probe extends out, and to a CD-SPM nanoneedle probe thereby. A method of fabricating scanning probe microscope (SPM) nanoneedle probe using ion beam, comprises: positioning the probe so that a tip of the probe on which the nanoneedle is attached faces toward a direction in which the ion beam is irradiated; and aligning the nanoneedle attached on the tip of the probe with the ion beam in parallel by irradiating the ion beam toward the tip of the probe on which the nanoneedle is attached. A method of fabricating a critical dimension scanning probe microscope (CD-SPM) nanoneedle probe using ion beam, comprises: screening a certain portion of the nanoneedle attached on a tip of the probe using a mask; and bending a part of the nanoneedle exposed out of the mask to align the part of the nanoneedle by irradiating the ion beam on the part of the nanoneedle exposed out of the mask, along the direction of the irradiated ion beam.
Abstract:
A dual-helmet magnetoencephalography measuring apparatus includes: an internal container storing a liquid refrigerant; an external container disposed to surround the internal container and including a first external helmet and a second external helmet disposed to be spaced apart from each other; a first sensor-mounted helmet disposed to surround the first external helmet between the external container and the internal container; a second sensor-mounted helmet disposed to surround the second external helmet between the externa container and the internal container; a plurality of first SQUID sensor module disposed on the first sensor-mounted helmet; and a plurality of second SQUID sensor module disposed on the second sensor-mounted helmet.
Abstract:
Disclosed herein are an apparatus, method, and system for measuring the uniformity of a main magnetic field in a magnetic resonance imaging system and a recording medium thereof and, more particularly, to a method of obtaining quantitative information using measurement equipment that may be implemented in response to automatic and semi-automatic type user-selective movements so as to measure a magnetic field within a three-dimensional (3D) space using a gauss meter and a flux meter and of automatically inputting and displaying the obtained quantitative information through software in order to measure the uniformity of a main magnetic field in a magnetic resonance imaging system which greatly influences the picture quality of a magnetic resonance medical image, thereby enabling efficient performance tests, follow-up management, and establishment of a measurement standard for a magnetic resonance imaging system.
Abstract:
The present invention relates to a shield apparatus and a shield method for measuring a subtle magnetic field. More specifically, the present invention relates to a shield apparatus having a precise magnetic sensor therein, for shielding an external magnetic field in a subtle magnetic field measurement apparatus including a magnetic field generation apparatus for exciting a sample, the shield apparatus for measuring a subtle magnetic field, including: a shield wall provided with a high-conductivity metal layer of high conductivity being partitioned into a plurality of segments and having a high-frequency shield property and a closed high-permeability soft magnetic layer spaced apart from the high-conductivity metal layer by a predetermined distance, so as to seal a measurement space.
Abstract:
Provided is a method of determining a surface orientation of a single crystal wafer. The method of determining a surface orientation of a single crystal wafer using high resolution X-ray rocking curve measurement may determine a surface angle of the wafer and a direction of the surface angle using rocking curve measurement of a high resolution X-ray diffraction method and measuring a misalignment angle formed by a rotation axis of a measuring apparatus and a surface normal of the wafer and an orientation of the misalignment angle.
Abstract:
The present invention is effective in that automatically corrected temperature can be measured using one light source and one optical detector.