公开(公告)号：EP0543326A2

公开(公告)日：1993-05-26

申请号：EP92119607.7

申请日：1992-11-17

Applicant: KAWASAKI STEEL CORPORATION

Inventor： Marui, Tomohiro ,  Arai, Kazuo

IPC: G01N21/47 ,  G01J5/60 ,  G01B11/30

CPC classification number: G01J5/60 ,  G01J2005/0074

Abstract: Radiated light with a specified wavelength from a material (21, P, 201) is detected and a first parameter corresponding to the emissivity ratio is obtained from the detection signal. Since the emissivity takes on different values according to the condition of the surface of the material, the first parameter changes depending on the surface condition of the material. There is a correlation between a physical value indicating a condition of the material surface and the first parameter. The correlation remains equivalent even if a second parameter corresponding to the physical value is used instead of the physical value itself (for example, an optical physical value such as reflectivity and absorptivity, the thickness of a film formed on the material surface, the surface roughness, and the degree of galvannealing). As an example of the parameter corresponding to the physical value, there is the logarithmic ratio between emissivities (ln ε a /ln ε b ) corresponding to the temperature in the vicinity of the surface. Therefore, a second parameter can be obtained on the basis of the correlation and a physical value can be obtained. When the emissivity or logarithmic emissivity ratio is used as the second parameter, the temperature in the vicinity of the material surface can be obtained from the second parameter and the detection signal.

Abstract translation: 从材料（21，P，201）检测出具有指定波长的辐射光，并从检测信号获得与发射率相对应的第一参数。 由于发射率根据材料表面的状况而具有不同的值，所以第一参数根据材料的表面状况而变化。 指示材料表面的状态的物理值与第一参数之间存在相关性。 即使使用与物理值对应的第二参数代替物理值本身，例如反射率和吸收率等光学物理值，材料表面上形成的膜的厚度，表面粗糙度 ，以及合金化退火的程度）。 作为对应于物理值的参数的示例，存在对应于表面附近的温度的发射率（lnεa / lnεb）之间的对数比。 因此，可以基于相关性获得第二参数并且可以获得物理值。 当使用发射率或对数发射率作为第二参数时，材料表面附近的温度可以从第二参数和检测信号获得。

公开(公告)号：EP0476611A3

公开(公告)日：1992-09-30

申请号：EP91115833.5

申请日：1991-09-18

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LIMITED

Inventor： Miki, Atsushi, c/o Yokohama Works of Sumitomo ,  Nishiguchi, Masanori, c/o Yokohama Works of Sumit.

IPC: G01J5/00

CPC classification number: G01J5/0003 ,  G01J5/0007 ,  G01J2005/0048 ,  G01J2005/0074 ,  G01J2005/0077

Abstract: A method for measuring temperature based on infrared light which measures the temperature of a semiconductor element, the surface layer of which is formed with two kinds of materials having different emissivities and optical reflectances, based on the amount of infrared emission incident on an image taking means according to the invention, comprises the steps of taking an image by diffusing and letting the incident be the reflected light of a beam of light incident on the surface of the above semiconductor element on the light receiving face of the image taking means, followed by determining the area ratio at which each of the above two kinds of materials occupies the surface of the above semiconductor element by comparing the average brightness value of the above image with the brightness value of an image for the case that each of the above two kinds of materials independently forms the surface layer of the above semiconductor element, and obtaining the weighted average of the emissivities of the above two kinds of materials with the area ratio at which each of the above two kinds of materials occupies the surface of the above semiconductor element, followed by calculating the temperature of the above semiconductor element based on the weighted average and the actual amount of infrared emission.

公开(公告)号：US20240118139A1

公开(公告)日：2024-04-11

申请号：US18265806

申请日：2021-12-08

Applicant: ArcelorMittal

Inventor： Noëlle MICQUE ,  Gwenaël LE NOC ,  Morgan FERTE

IPC: G01J5/00 ,  G01J5/10 ,  G01J5/52 ,  G01J5/80

CPC classification number: G01J5/0003 ,  G01J5/0022 ,  G01J5/10 ,  G01J5/52 ,  G01J5/802 ,  G01J2005/0029 ,  G01J2005/0074

Abstract: A method for estimating the temperature of a steel product including a calibration step wherein the intensities at 5 wavelengths ranging from 0.9 to 2.1 μm are recorded for several measurement condition and spectral attenuation coefficients are computed, a measurement step wherein the intensities at said 5 wavelengths are recorded and spectral attenuation coefficients are computed for several temperatures and a comparison step wherein a probability test is performed to estimate the steel product temperature.

公开(公告)号：US20190137341A1

公开(公告)日：2019-05-09

申请号：US15802836

申请日：2017-11-03

Applicant: International Business Machines Corporation

Inventor： Ali Afzali-Ardakani ,  Abram L. Falk ,  Damon B. Farmer ,  Shu-Jen Han ,  George S. Tulevski

IPC: G01J5/00 ,  G01J5/02 ,  G01J5/20

CPC classification number: G01J5/0018 ,  G01J5/023 ,  G01J5/046 ,  G01J5/0862 ,  G01J5/20 ,  G01J5/602 ,  G01J2005/0051 ,  G01J2005/0074 ,  G01J2005/0077

Abstract: A computer-eimplemented method and thermal imaging device includes a layer of plasmonic material and a processor. The layer of plasmonic material receive electromagnetic radiation from an object and generates radiance measurements of the electromagnetic radiation at a plurality of wavelengths. The processor determines an emissivity and temperature of the object from the radiance measurements and forms a thermal-based electronic image of the object from the determined emissivity and temperature.

公开(公告)号：US20190003897A1

公开(公告)日：2019-01-03

申请号：US16105786

申请日：2018-08-20

Applicant: Exergen Corporation

Inventor： Jason N. Jarboe

IPC: G01K7/00 ,  G01J5/06 ,  G01J5/00

CPC classification number: G01K7/003 ,  G01J5/0003 ,  G01J5/061 ,  G01J2005/0051 ,  G01J2005/0074

Abstract: Devices and corresponding methods can be provided to measure temperature and/or emissivity of a target. Emissivity of the target need not be known or assumed, and any temperature difference between a sensor and the target need not be zeroed or minimized. No particular bandpass filter is required. Devices can include one or two sensors viewing the same target as the target views different respective viewed temperatures. The respective viewed temperatures can be sensor temperatures, and a single sensor can be set to each of the respective viewed temperatures at different times. An analyzer can determine the temperature and/or emissivity of the target based on the respective viewed temperatures and on plural net heat fluxes detected by the sensors and corresponding to the respective viewed temperatures.

公开(公告)号：US08050884B2

公开(公告)日：2011-11-01

申请号：US11951698

申请日：2007-12-06

Applicant: Ronald N. Murata

Inventor： Ronald N. Murata

IPC: G01K11/30 ,  G01K17/00 ,  G01J5/48

CPC classification number: G01J5/602 ,  G01J5/0003 ,  G01J2005/0048 ,  G01J2005/0051 ,  G01J2005/0074 ,  G01J2005/0081 ,  G01J2005/0092

Abstract: Methods and apparatus are provided to determine the emissivity, temperature and area of an object. The methods and apparatus are designed such that the emissivity and area of the object may be separately determined as functions dependent upon the temperature of the object derived from a three or more band infrared measurement sensor. As such, the methods and apparatus may only require a regression analysis of the temperature of the object without any regression analysis of the emissivity and area of the object.

Abstract translation: 提供方法和装置来确定物体的发射率，温度和面积。 方法和装置被设计成使得物体的发射率和面积可以单独地确定为取决于从三个或更多个带状红外测量传感器导出的物体的温度的函数。 因此，方法和装置可以仅需要物体的温度的回归分析，而不对物体的发射率和面积进行任何回归分析。

公开(公告)号：US5231595A

公开(公告)日：1993-07-27

申请号：US782750

申请日：1991-10-18

Applicant: Toshiro Makino ,  Hiroji Tsujimura ,  Jiro Arima

Inventor： Toshiro Makino ,  Hiroji Tsujimura ,  Jiro Arima

IPC: G01J5/00 ,  G01J5/60

CPC classification number: G01J5/60 ,  G01J2005/0074

Abstract: A pyrometer includes a light source capable of emitting light to at least two wavelengths to a target to be measured. A light measuring member measures the light source and provides output signals representative of those two wavelengths. A second light measuring member measures light reflected by the target and provides second signals corresponding to the two wavelengths. A third light measuring member measures the intensity of the light radiated by the target with respect to those two wavelengths to produce third signals. An emissivity is assumed for the target based on the predetermined wavelengths, and a temperature is calculated on the basis of the minimum value of the difference between the assumed radiation intensity calculated according to the assumed emissivity of the target and the measured radiation intensity in accordance with the third signals.

Abstract translation: 高温计包括能够将光发射到至少两个波长的光源到待测量的靶。 光测量部件测量光源并提供表示这两个波长的输出信号。 第二光测量部件测量由目标反射的光，并提供对应于两个波长的第二信号。 第三光测量部件测量目标相对于这两个波长辐射的光的强度，以产生第三信号。 基于预定波长对目标进行发射率，并且基于根据目标的假设发射率计算的假定辐射强度与所测量的辐射强度之间的差的最小值来计算温度， 第三个信号。

公开(公告)号：US5186541A

公开(公告)日：1993-02-16

申请号：US780716

申请日：1991-10-21

Applicant: Raymond C. Paulk

Inventor： Raymond C. Paulk

IPC: G01J5/00

CPC classification number: G01J5/0003 ,  G01J5/02 ,  G01J5/026 ,  G01J5/16 ,  G01J2005/0051 ,  G01J2005/0074 ,  G01J2005/068

Abstract: A non-contact infrared temperature sensing system for determining temperature values for a series of targets all having a similar emissivity value, which calculates an emissivity value for the targets based on the sensed total heat radiated from one target, an inputted temperature value for that target, and a temperature value for extraneous radiation from that target. The system then computes, for each subsequent target whose heat radiation is detected, a temperature value for each said target dependent upon the emitted component of radiation, and independent of the extraneous component of radiation from that target.

Abstract translation: 一种非接触式红外温度感测系统，用于确定一系列具有相似发射率值的一系列目标的温度值，该温度值基于从一个目标辐射的感测总热量计算目标的发射率值，该目标的输入温度值 ，以及来自该目标的外来辐射的温度值。 然后，该系统对于其被检测到热辐射的每个随后的目标计算取决于所发射的辐射分量的每个所述目标的温度值，并且独立于来自该目标的辐射的外来分量。

公开(公告)号：US5156461A

公开(公告)日：1992-10-20

申请号：US702646

申请日：1991-05-17

Applicant: Mehrdad M. Moslehi ,  Habib N. Najm

Inventor： Mehrdad M. Moslehi ,  Habib N. Najm

IPC: G01J5/00 ,  G01J5/08

CPC classification number: G01J5/0003 ,  G01J5/00 ,  G01J5/0007 ,  G01J5/08 ,  G01J5/0806 ,  G01J5/0821 ,  G01J5/0834 ,  G01J5/0862 ,  G01J5/0868 ,  G01J5/0896 ,  G01J2005/0051 ,  G01J2005/0074 ,  G01J5/061

Abstract: A multi-point non-invasive, real-time pyrometry-based temperature sensor (200) for simultaneously sensing semiconductor wafer (22) temperature and compensating for wafer emissivity effects. The pyrometer (200) measures the radiant energy that a heated semiconductor wafer (22) emits and coherent beams of light (224) that the semiconductor wafer (22) reflects. As a result, the sensor (200) generates accurate, high-resolution multi-point measurements of semiconductor wafer (22) temperature during a device fabrication process. The pyrometer (200) includes an infrared laser source (202) that directs coherent light beam (203) into beam splitter (204). From the beam splitter (204), the coherent light beam (203) is split into numerous incident coherent beams (210). Beams (210) travel via optical fiber bundles (218) to the surface of semiconductor wafer (22) within the fabrication reactor (80). Each optical fiber bundle (218) collects reflected coherent light beam and radiant energy from wafer (22). Reflected coherent light beam (226) and radiant energy (222) is directed to a detector (240) for detecting signals and recording radiance, emissivity, and temperature values. Multiple optical fiber bundles (218) may be used in the sensor (200) for high spatial resolution multi-point measurements of wafer (22) temperature for precision real-time process control and uniformity optimizations.

Abstract translation: 一种用于同时感测半导体晶片（22）温度并补偿晶片辐射效应的多点非侵入式实时基于高温测量的温度传感器（200）。 高温计（200）测量加热的半导体晶片（22）发射的辐射能量和半导体晶片（22）反射的相干的光束（224）。 结果，传感器（200）在器件制造过程中产生半导体晶片（22）温度的准确的高分辨率多点测量。 高温计（200）包括将相干光束（203）引导到分束器（204）中的红外激光源（202）。 从分束器（204），相干光束（203）被分成许多入射相干光束（210）。 光束（210）通过光纤束（218）行进到制造反应器（80）内的半导体晶片（22）的表面。 每个光纤束（218）从晶片（22）收集反射的相干光束和辐射能。 反射相干光束（226）和辐射能（222）被引导到用于检测信号和记录辐射度，发射率和温度值的检测器（240）。 可以在传感器（200）中使用多个光纤束（218），用于晶片（22）温度的高空间分辨率多点测量，用于精确实时过程控制和均匀性优化。

公开(公告)号：US4924478A

公开(公告)日：1990-05-08

申请号：US620553

申请日：1984-06-14

Applicant: Volker Tank

Inventor： Volker Tank

IPC: G01J5/00 ,  G01J5/06

CPC classification number: G01J5/602 ,  G01J2005/0051 ,  G01J2005/0074 ,  G01J5/0871 ,  G01J5/522

Abstract: A method of and device for contactless measuring of temperature of an object independently of its emissivity in infrared and/or visible range, is based on finding, by means of Planck law of radiation a curve which is the sum of the radiance or radiant intensity of a radiator having temperature and emissivity of the object and the radiance or radiant intensity of a radiator having the temperature of environment, the latter radiation being reflected by the object with the reflectivity .rho.=1-.epsilon. where .epsilon. is the emissivity of the object. The actual temperature of the object is found from the curve which is most similar to the curve of at least two values of radiance or radiant intensity detected from the object, plotted against the wavelengths. The device for carrying out the method includes a spectrometer, a modulator rotating at constant speed and having at least two filtering segments for the radiation wavelengths, an analog/digital converter clocked by pulses derived from the modulator to produce at its output digital signals, a microprocessor for reiteratively processing the digital data according to the Planck law of radiation, and a display unit for reading out the computed emissivity, the temperature of the object and the temperature of the environment.

Abstract translation: 独立于红外和/或可见光范围内的物体的温度无接触式测量的方法和装置是基于通过辐射的普朗克定律找到的，该曲线是辐射度或辐射强度之和 散热器具有物体的温度和发射率以及具有环境温度的散热器的辐射强度或辐射强度，后者辐射被物体反射，反射率rho = 1-ε，其中ε是物体的发射率。 物体的实际温度是从与物体中检测到的至少两个辐射强度或辐射强度值的曲线最相似的曲线找到的，相对于波长绘制。 用于执行该方法的装置包括光谱仪，以恒定速度旋转并具有用于辐射波长的至少两个滤波段的调制器，由从调制器导出的脉冲计时的模拟/数字转换器，以在其输出的数字信号产生一个 用于根据辐射的普朗克定律重复地处理数字数据的微处理器，以及用于读出所计算的发射率，物体的温度和环境温度的显示单元。