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    Lithographic apparatus and device manufacturing method
    21.
    发明公开
    Lithographic apparatus and device manufacturing method 有权
    石版画家和法国赫尔斯特朗·埃纳弗·弗里里

    公开(公告)号：EP1522892A1

    公开(公告)日：2005-04-13

    申请号：EP03078191.8

    申请日：2003-10-09

    Applicant: ASML Netherlands B.V.

    Inventor： Franken, Dominicus J. P. A.

    IPC: G03F7/20 ,  H01L21/027 ,  G21K1/06 ,  G02B7/00

    CPC classification number: G03F7/70891 ,  G21K1/06 ,  G21K2201/065

    Abstract: A lithographic apparatus comprises a substrate table for holding a substrate; a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a projection system for projecting the patterned beam onto a target portion of a substrate. The projection system and/or radiation system comprise a reflector assembly (100) having a reflector substrate (112) with a reflective surface (111) for reflecting at least a part of inciting radiation and a thermal system (120) capable of transferring heat from at least a part of the reflector substrate (112). The thermal system (120) comprises at least one thermal element (121) present in a recess (113) of the reflector substrate (112) at a side of the reflector substrate (112) opposite to the reflective surface.

    Abstract translation: 光刻设备包括用于保持衬底的衬底台; 用于提供投影射线束的辐射系统; 用于支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对投影光束进行图案化; 用于将图案化的光束投影到基板的目标部分上的投影系统。 投影系统和/或辐射系统包括具有反射器基板（112）的反射器组件（100），反射器基板（112）具有用于反射煽动辐射的至少一部分的反射表面（111）和能够传递热量的热系统 至少一部分反射器基板（112）。 热系统（120）包括在反射器基板（112）的与反射表面相对的一侧处存在于反射器基板（112）的凹部（113）中的至少一个热元件（121）。

    METHOD AND DEVICE FOR SPLITTING A HIGH-POWER LIGHT BEAM TO PROVIDE SIMULTANEOUS SUB-BEAMS TO PHOTOLITHOGRAPHY SCANNERS
    23.
    发明申请
    METHOD AND DEVICE FOR SPLITTING A HIGH-POWER LIGHT BEAM TO PROVIDE SIMULTANEOUS SUB-BEAMS TO PHOTOLITHOGRAPHY SCANNERS 有权
    用于分割高功率光束以提供同时分光子到光刻机扫描仪的方法和装置

    公开(公告)号：US20160259251A1

    公开(公告)日：2016-09-08

    申请号：US14637459

    申请日：2015-03-04

    Applicant: GLOBALFOUNDRIES Inc.

    Inventor： Erik Robert HOSLER

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  G03F7/70008 ,  G03F7/70208 ,  G03F7/70991 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  H05G2/008

    Abstract: Methods for receiving a high-energy EUV beam and distributing EUV sub-beams to photolithography scanners and the resulting device are disclosed. Embodiments include receiving a high-energy primary EUV beam at a primary splitting optical assembly; splitting the primary EUV beam into primary EUV sub-beams; reflecting the primary EUV sub-beams to beam-splitting optical arrays; splitting the primary EUV sub-beams into secondary EUV sub-beams; reflecting the secondary EUV sub-beams to EUV distribution optical arrays; and distributing simultaneously the secondary EUV sub-beams to scanners.

    Abstract translation: 公开了用于接收高能EUV光束并将EUV子光束分布到光刻扫描仪和所得到的装置的方法。 实施例包括在主分裂光学组件处接收高能量的初级EUV光束; 将主EUV波束分为主EUV子波束; 将主要EUV子光束反射到分束光学阵列; 将主EUV子光束分成次级EUV子光束; 将次级EUV子光束反射到EUV分配光学阵列; 并且将次级EUV子光束同时分配到扫描仪。

    Cooling systems and methods for grazing incidence EUV lightography collectors
    25.
    发明授权
    Cooling systems and methods for grazing incidence EUV lightography collectors 有权
    用于放牧入射EUV光刻收集器的冷却系统和方法

    公开(公告)号：US08153994B2

    公开(公告)日：2012-04-10

    申请号：US12592736

    申请日：2009-12-02

    Applicant: Marco Pedrali ,  Riccardo Ghislanzoni

    Inventor： Marco Pedrali ,  Riccardo Ghislanzoni

    IPC: G21K5/00

    CPC classification number: G21K1/06 ,  C25D1/02 ,  C25D1/22 ,  C25D5/02 ,  C25D5/14 ,  G02B7/1815 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70175 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  Y10T29/4935

    Abstract: A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines (30) arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface. Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

    Abstract translation: 公开了一种用于具有至少一个具有后表面（22）的外壳（20）的极紫外（EUV）掠入射收集器（GIC）反射镜组件（240）的冷却系统（10）。 冷却系统具有多个间隔开的圆形配置的冷却管线（30），它们布置在垂直于壳体中心轴线（AC）并且与背面表面热交换并且在其周围流动的平行平面（PL）中。 输入和输出二次冷却流体歧管（44,46）分别流体地连接到多个冷却管线，以将冷却流体从输入的二次冷却流体歧管流到输出冷却次要流体歧管两个半圆的路径，以进行每个冷却 线。 分离冷却液输入和输出位置可减少热梯度，从而导致壳体局部表面变形，从而导致聚焦性能降低。

    Cooling systems and methods for grazing incidence EUV lightography collectors
    27.
    发明申请
    Cooling systems and methods for grazing incidence EUV lightography collectors 有权
    用于放牧入射EUV光刻收集器的冷却系统和方法

    公开(公告)号：US20110128513A1

    公开(公告)日：2011-06-02

    申请号：US12592736

    申请日：2009-12-02

    Applicant: Marco Pedrali ,  Ricardo Ghislanzoni

    Inventor： Marco Pedrali ,  Ricardo Ghislanzoni

    IPC: G03B27/52 ,  F28D15/00 ,  F28F9/02 ,  B21D53/02

    CPC classification number: G21K1/06 ,  C25D1/02 ,  C25D1/22 ,  C25D5/02 ,  C25D5/14 ,  G02B7/1815 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70175 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  Y10T29/4935

    Abstract: A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines (30) arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface.Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

    Abstract translation: 公开了一种用于具有至少一个具有后表面（22）的外壳（20）的极紫外（EUV）掠入射收集器（GIC）反射镜组件（240）的冷却系统（10）。 冷却系统具有多个间隔开的圆形配置的冷却管线（30），它们布置在垂直于壳体中心轴线（AC）并且与背面表面热交换并且在其周围流动的平行平面（PL）中。 输入和输出二次冷却流体歧管（44,46）分别流体地连接到多个冷却管线，以将冷却流体从输入的二次冷却流体歧管流到输出冷却次要流体歧管两个半圆的路径，以进行每个冷却 线。 分离冷却液输入和输出位置可减少热梯度，从而导致壳体局部表面变形，从而导致聚焦性能降低。

    Collector mirror for plasma-based, short-wavelength radiation sources
    30.
    发明申请
    Collector mirror for plasma-based, short-wavelength radiation sources 有权
    用于等离子体，短波长辐射源的集光镜

    公开(公告)号：US20060227826A1

    公开(公告)日：2006-10-12

    申请号：US11402391

    申请日：2006-04-11

    Applicant: Istvan Balogh ,  Kai Gaebel

    Inventor： Istvan Balogh ,  Kai Gaebel

    IPC: H01S3/04

    CPC classification number: G03F7/70175 ,  B82Y10/00 ,  G03F7/70166 ,  G21K1/062 ,  G21K2201/065

    Abstract: The invention is directed to a collector mirror for short-wavelength radiation based on a plasma. It is the object of the invention to find a novel possibility for managing the temperature of a collector mirror for focusing short-wavelength radiation generated from a plasma which allows an efficient thermal connection to be produced between the optically active mirror surface and a thermostat system without the disadvantages relating to space requirements or high-precision manufacture of the collector mirror. This object is met, according to the invention, in that the collector mirror has a solid, rotationally symmetric substrate which comprises a material with high thermal conductivity of more than 50 W/mK and in which channels for cooling and temperature management are incorporated in the substrate so that a heat transport medium can flow through directly and for rapidly stabilizing the temperature of the optically active mirror surface. Heat of transient temperature spikes which occur in pulsed operation for plasma generation at the mirror surface and which temporarily exceed the temperature average by a multiple is quickly dissipated.

    Abstract translation: 本发明涉及一种基于等离子体的短波长辐射的集光镜。 本发明的目的是找到一种用于管理用于聚焦由等离子体产生的短波长辐射的聚光镜的温度的新型可能性，其允许在光学活性反射镜表面和恒温器系统之间产生有效的热连接而无需 与空间要求有关的缺点或收集镜的高精度制造。 根据本发明，满足本发明的目的在于，收集器反射镜具有固体，旋转对称的基板，其包括具有大于50W / mK的高热导率的材料，并且其中用于冷却和温度管理的通道被并入 衬底，使得传热介质可以直接流过并快速稳定光学镜面的温度。 在脉冲操作中发生的瞬态温度峰值的热量，其在镜面处等离子体产生并且临时超过温度平均值的倍数被快速消散。

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