Methods and apparatus for improving device functionality during long blocking UICC operations
    23.
    发明授权
    Methods and apparatus for improving device functionality during long blocking UICC operations 有权
    在长时间阻止UICC操作期间改进设备功能的方法和设备

    公开(公告)号:US09325835B2

    公开(公告)日:2016-04-26

    申请号:US14293946

    申请日:2014-06-02

    Abstract: Methods and apparatuses are presented herein for improved operation of a Universal Integrated Circuit Card (UICC) of one or more user equipment (UE). For example, an example method of wireless communications is presented, which may include monitoring, by a UE, one or more items received from a UICC of the UE during a UICC operation. In addition, the example method may also include determining that at least one of (a) a number of the one or more items having a first item type exceeds a threshold number, or (b) an elapsed time since the UICC operation started exceeds a threshold time. Moreover, the example method may include providing, based on the determining, a notification to a user interface associated with the UE indicating that the UICC operation is ongoing.

    Abstract translation: 本文中给出了用于改进一个或多个用户设备(UE)的通用集成电路卡(UICC)的操作的方法和装置。 例如,呈现无线通信的示例方法,其可以包括由UE监视在UICC操作期间从UE的UICC接收的一个或多个项目。 此外,示例性方法还可以包括确定(a)具有第一项目类型的一个或多个项目的数量中的至少一个超过阈值数,或(b)自UICC操作开始以来的经过时间超过 阈值时间 此外,示例性方法可以包括:基于确定向与UE指示的用户界面的通知,指示UICC操作正在进行。

    Semiconductor device and manufactruing method therefor
    25.
    发明申请
    Semiconductor device and manufactruing method therefor 有权
    半导体器件及其制造方法

    公开(公告)号:US20030071317A1

    公开(公告)日:2003-04-17

    申请号:US10101162

    申请日:2002-03-20

    Abstract: An N-channel MOS field-effect transistor on an SOI substrate including a source electrode, drain and gate electrodes both disposed via a field oxide film, a gate oxide film, a high concentration P-type layer, a high concentration N-type layer contacting the source electrode and the gate oxide film, a high concentration N-type layer contacting the drain electrode, a p-body layer contacting the high concentration P-type and N-type layers and the gate oxide film. In this transistor, an N-type layer with a concentration higher than that of a drain region contacting the p-body layer constitutes a region covering at most 95% of the source-drain distance. Further, an N-type region having a concentration from 3null1016/cm3 to 1null1022/cm3 is provided near a buried oxide film under the drain electrode.

    Abstract translation: 在SOI衬底上的N沟道MOS场效应晶体管,其包括经由场氧化膜设置的源电极,漏极和栅电极,栅极氧化膜,高浓度P型层,高浓度N型层 与源电极和栅极氧化膜接触,接触漏电极的高浓度N型层,与高浓度P型和N型层接触的p体层和栅氧化膜。 在该晶体管中,具有高于与p体层接触的漏极区域的浓度的N型层构成覆盖源极 - 漏极距离的至多95%的区域。 此外,在漏电极下方的埋置氧化膜附近设置浓度为3×10 16 / cm 3至1×10 22 / cm 3的N型区域。

    Lateral fingerprint recognition apparatus for electronic device

    公开(公告)号:US11856122B2

    公开(公告)日:2023-12-26

    申请号:US17608160

    申请日:2020-05-09

    CPC classification number: H04M1/236 G06V40/1329 H04M1/0277 H04M2201/06

    Abstract: An electronic device is provided. A lateral fingerprint recognition apparatus is in contact with a function button. An accommodating structure is arranged in the lateral fingerprint recognition apparatus. A stopping assembly is arranged on a side of a fingerprint hole close to the function button. Inserting a partial area of the stopping assembly into the accommodating structure enables the lateral fingerprint recognition apparatus, when pressed, to move in movement space of the accommodating structure on the side of the fingerprint hole close to the function button, so as to limit a displacement amount of the lateral fingerprint recognition apparatus within a specific range, implementing the functions of the lateral fingerprint recognition apparatus and of the function button, and preventing the lateral fingerprint recognition apparatus from being displaced from the originally designed position.

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