公开(公告)号：US20180073993A1

公开(公告)日：2018-03-15

申请号：US15697386

申请日：2017-09-06

Applicant: KLA-Tencor Corporation

Inventor： Guoheng Zhao ,  Sheng Liu ,  Ben-ming Benjamin Tsai

IPC: G01N21/95 ,  G01N21/88 ,  G06T7/00

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N21/956 ,  G01N2021/8825 ,  G01N2021/8848 ,  G01N2201/0683 ,  G06T7/0004 ,  G06T7/001 ,  G06T2207/10152 ,  G06T2207/20212 ,  G06T2207/30148 ,  H04N5/2256 ,  H04N5/23229 ,  H04N5/2354

Abstract: Disclosed is apparatus for inspecting a sample. The apparatus includes illumination optics for simultaneously directing a plurality of incident beams at a plurality of azimuth angles towards a sample and collection optics for directing a plurality of field portions of output light from two or more of the plurality of angles towards two or more corresponding sensors. The two or more sensors are arranged for receiving the field portions corresponding to two or more angles and generating two or more corresponding images. The apparatus further comprises a processor for analyzing the two or more images to detect defects on the sample

公开(公告)号：US09911634B2

公开(公告)日：2018-03-06

申请号：US15193502

申请日：2016-06-27

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Abner Bello ,  Stephanie Waite ,  William J. Fosnight ,  Thomas Beeg

IPC: G01J5/00 ,  H01L21/673 ,  H01L21/66 ,  G01N21/55 ,  G01N21/21 ,  G01J5/08

CPC classification number: G01J5/0096 ,  G01J5/0007 ,  G01J5/025 ,  G01J5/0825 ,  G01J5/0896 ,  G01N21/211 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/0683 ,  G01N2201/12 ,  G01R27/00 ,  H01L21/67253 ,  H01L21/6732 ,  H01L21/67353 ,  H01L21/67386 ,  H01L22/12

Abstract: A self-contained metrology wafer carrier systems and methods of measuring one or more characteristics of semiconductor wafers are provided. A wafer carrier system includes, for instance, a housing configured for transport within the automated material handling system, the housing having a support configured to support a semiconductor wafer in the housing, and a metrology system disposed within the housing, the metrology system operable to measure at least one characteristic of the wafer, the metrology system comprising a sensing unit and a computing unit operably connected to the sensing unit. Also provided are methods of measuring one or more characteristics of a semiconductor wafer within the wafer carrier systems of the present disclosure.

公开(公告)号：US20170370847A1

公开(公告)日：2017-12-28

申请号：US15534771

申请日：2016-04-25

Applicant: Becton, Dickinson and Company

Inventor： James Ghadiali

IPC: G01N21/64 ,  G01N15/14 ,  G01N33/58 ,  G01N15/10

CPC classification number: G01N21/6458 ,  G01N15/1436 ,  G01N15/1475 ,  G01N21/6428 ,  G01N21/6445 ,  G01N33/582 ,  G01N2015/1006 ,  G01N2015/1447 ,  G01N2021/6439 ,  G01N2201/0683

Abstract: Methods for producing a high resolution image of a sample are provided. In some embodiments, the method includes: detecting first and second sets of spatially-dependent emission signals from a sample labeled with a fluorescent polymeric dye; and producing a high resolution fluorescence image of the sample from the detected first and second sets of spatially-dependent emission signals. In some embodiments, the sample is a cell. Also provided are systems for imaging a sample that include a high resolution light microscope including a light source configured to irradiate a field of view with an excitation light; a photodetector configured to detect an emission signal: and a polarization modulator disposed in the light pathway between the light source and the photodetector; and a sample labelled with a polymeric dye and disposed in the field of view.

公开(公告)号：US09835566B2

公开(公告)日：2017-12-05

申请号：US15058115

申请日：2016-03-01

Applicant: KLA-Tencor Corporation

Inventor： Ardis Liang ,  Martin Plihal ,  Raghav Babulnath ,  Sankar Venkataraman

IPC: G01N21/88 ,  G01N23/20 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N23/20008 ,  G01N2021/8809 ,  G01N2201/061 ,  G01N2201/0683

Abstract: Methods and systems for generating inspection results for a specimen with an adaptive nuisance filter are provided. One method includes selecting a portion of events detected during inspection of a specimen having values for at least one feature of the events that are closer to at least one value of at least one parameter of the nuisance filter than the values for at least one feature of another portion of the events. The method also includes acquiring output of an output acquisition subsystem for the sample of events, classifying the events in the sample based on the acquired output, and determining if one or more parameters of the nuisance filter should be modified based on results of the classifying. The nuisance filter or the modified nuisance filter can then be applied to results of the inspection of the specimen to generate final inspection results for the specimen.

公开(公告)号：US09835565B2

公开(公告)日：2017-12-05

申请号：US14746427

申请日：2015-06-22

Applicant: Samsung Display Co., Ltd.

Inventor： Wal jun Kim ,  JoongYoung Ryu ,  Seung-Young Baeck ,  Changhyun Ryu ,  Deok joo Lim

IPC: G01J4/00 ,  G01N21/88 ,  G01N21/95 ,  G01N21/84

CPC classification number: G01N21/8806 ,  G01N21/8422 ,  G01N21/95 ,  G01N2021/8427 ,  G01N2021/8848 ,  G01N2201/0683

Abstract: An inspection device of a display device includes a first illumination unit providing a first incident light to the display device at a first incident angle, a second illumination unit providing a second incident light to the display device at a second incident angle, a third illumination unit providing a third incident light to the display device at a third incident angle, and a defect detector receiving at least one of a first reflection light obtained from the first incident light reflected by the display device at a first reflection angle, a second reflection light obtained from the second incident light reflected by the display device at a second reflection angle, and a third reflection light obtained from the third incident light reflected by the display device at a third reflection angle to detect defects of the display device.

公开(公告)号：US20170336331A1

公开(公告)日：2017-11-23

申请号：US15159626

申请日：2016-05-19

Applicant: Zeta Instruments, Inc.

Inventor： Steven W. Meeks ,  Rusmin Kudinar ,  Ronny Soetarman ,  Hung P. Nguyen

IPC: G01N21/958 ,  G01N21/55 ,  G01N21/21

CPC classification number: G01N21/958 ,  G01N21/21 ,  G01N21/55 ,  G01N2201/0636 ,  G01N2201/0638 ,  G01N2201/0683 ,  G01N2201/105

Abstract: An optical inspector includes a time varying beam reflector, a radiating source that irradiates the time varying beam reflector, a telecentric scan lens configured to direct the radiation reflected by the time varying beam reflector onto a first surface of a transparent sample, a first detector that receives at least a portion of top surface specular reflection, a second detector that receives at least a portion of the bottom surface specular reflection. A turning mirror may also be included. The turning mirror is a switchable mirror that can be adjusted to a first position where the turning mirror reflects the top and bottom surface specular reflection, and can be adjusted to a second position where the turning mirror does not reflect the top or the bottom surface specular reflection. A first and second polarizing element may also be included to detect additional types of defects on either surface.

公开(公告)号：US09816917B2

公开(公告)日：2017-11-14

申请号：US15103609

申请日：2014-12-25

Applicant: SUMCO CORPORATION

Inventor： Toshiaki Sudo ,  Tadahiro Sato ,  Ken Kitahara ,  Eriko Kitahara

IPC: C30B15/10 ,  C30B29/06 ,  G01N21/23 ,  G01L1/24 ,  G01L5/00 ,  C03C3/04 ,  H04N5/232

CPC classification number: G01N21/23 ,  C03C3/04 ,  C30B15/10 ,  C30B29/06 ,  G01L1/24 ,  G01L5/0047 ,  G01N2201/062 ,  G01N2201/0683 ,  H04N5/232

Abstract: In an embodiment, a distortion-measuring apparatus for measuring a distortion distribution of an entire vitreous silica crucible in a non-destructive way includes: a light source 11; a first polarizer 12 and a first quarter-wave plate 13 disposed between the light source 11 and an outer surface of a vitreous silica crucible wall; a camera 14 disposed inside of a vitreous silica crucible 1; a camera control mechanism 15 configured to control a photographing direction of the camera 14; a second polarizer 16 and a second quarter-wave plate 17 disposed between the camera 14 and an inner surface of the vitreous silica crucible wall. An optical axis of the second quarter-wave plate 17 inclines 90 degrees with respect to the first quarter-wave plate 13.

公开(公告)号：US09797835B2

公开(公告)日：2017-10-24

申请号：US14898600

申请日：2013-11-28

Applicant: SHENYANG INSTITUTE OF AUTOMATION OF THE CHINESE ACADEMY OF SCIENCES

Inventor： Lanxiang Sun ,  Haibin Yu ,  Yong Xin ,  Lifeng Qi ,  Yang Li ,  Zhibo Cong

IPC: G01N21/63 ,  G01N21/71 ,  G01N21/85 ,  G01B11/14 ,  G01N21/21 ,  G01N33/20 ,  G01N21/69

CPC classification number: G01N21/63 ,  G01B11/14 ,  G01N21/21 ,  G01N21/718 ,  G01N21/8507 ,  G01N33/206 ,  G01N2021/695 ,  G01N2201/06113 ,  G01N2201/0636 ,  G01N2201/0683 ,  G01N2201/088

Abstract: An in-situ on-line detection device and detection method for a long-distance metallurgical liquid metal component. The detection device comprises a front-end high-temperature resistant probe, a middle-end optical sensing device and a back-end control platform, wherein the head of the front-end high-temperature resistant probe is placed in a liquid metal, the tail thereof is coaxially connected to the middle-end optical sensing device, and an optical window is arranged in the connection position; and the middle-end optical sensing device is connected to the back-end control platform through a signal line. The detection device and detection method can provide a timely and valid message for quality control and a melting end, so that the detection time is greatly shortened, the detection distance can he adjusted extensively, the measurement result is accurate, and it can be achieved to measure components that are difficult to measure such as carbon, sulfur, phosphorous, etc.

公开(公告)号：US20170299512A1

公开(公告)日：2017-10-19

申请号：US15099088

申请日：2016-04-14

Applicant: Boyd V. Hunter ,  Michael A. Miller

Inventor： Boyd V. Hunter ,  Michael A. Miller

IPC: G01N21/63 ,  G01N21/65

CPC classification number: G01N21/636 ,  G01N21/65 ,  G01N2201/06113 ,  G01N2201/0683

Abstract: Raman instrumentation for detecting for the presence of a molecular species in a including: a source of radiation for pumping the sample; apparatus for controlling the frequency and pulse width of radiation from the pumping source; a Raman spectrometer including a detector and means for collecting scattered photons from the sample; a radiation source for probing the sample; means for directing radiation from the probing source to the sample; and means to interface the spectrometer with the source of radiation for pumping. The radiation source for probing is, preferably, a monochromatic light source emitting radiation in at least one of the group including UV, visible, and near infrared radiation and, preferably, in the range of 220-1080 nm. The photons collected from the sample include elastically and inelastically scattered photons, and the spectrometer further including means for rejecting the elastically scattered photons. The pumping source is a microwave source.

公开(公告)号：US09793673B2

公开(公告)日：2017-10-17

申请号：US13487075

申请日：2012-06-01

Applicant: Yung-Ho Chuang ,  J. Joseph Armstrong ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  David L. Brown

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  David L. Brown

IPC: G02B5/30 ,  G02B27/28 ,  H01S3/05 ,  H01S3/083 ,  H01S3/00 ,  G01N21/21 ,  G01N21/95 ,  G02B5/08

CPC classification number: H01S3/0057 ,  G01N21/21 ,  G01N21/9501 ,  G01N2201/06113 ,  G01N2201/0683 ,  G01N2201/0697 ,  G02B5/0816 ,  G02B5/3083 ,  G02B27/281 ,  G02B27/283 ,  G02B27/286 ,  H01S3/083

Abstract: A pulse multiplier includes a polarizing beam splitter, a wave plate, and a set of mirrors. The polarizing beam splitter receives an input laser pulse. The wave plate receives light from the polarized beam splitter and generates a first set of pulses and a second set of pulses. The first set of pulses has a different polarization than the second set of pulses. The polarizing beam splitter, the wave plate, and the set of mirrors create a ring cavity. The polarizing beam splitter transmits the first set of pulses as an output of the pulse multiplier and reflects the second set of pulses into the ring cavity. This pulse multiplier can inexpensively reduce the peak power per pulse while increasing the number of pulses per second with minimal total power loss.