INSTALLATION ET PROCEDE POUR LE CONTRÔLE EN LIGNE D'UN BAIN DE GALVANISATION
    323.
    发明公开
    INSTALLATION ET PROCEDE POUR LE CONTRÔLE EN LIGNE D'UN BAIN DE GALVANISATION 有权
    安装及方法FEUERVERZINKUNGSBADES在线监测

    公开(公告)号:EP2092281A1

    公开(公告)日:2009-08-26

    申请号:EP07719218.5

    申请日:2007-06-05

    CPC classification number: C23C2/003 G01J3/443 G01N21/718 G01N21/94

    Abstract: The present invention relates to an installation for in-line controlling and, in real time, a bath for the hot-dip coating of a metal sheet by means of a molten metal, in particular for controlling the chemical composition of the bath and the presence of dross on the surface of the bath, comprising an LIBS (laser-induced breakdown spectroscopy) analysis system, a device for directing the laser beam onto the region to be analysed, a camera associated with a light source, so as to acquire an image of the bath at a point that it is desired to monitor the presence of dross, a control system, incorporated into a computer, for carrying out image processing, the storage of chemical analysis data using the aforementioned LIBS method, and the management of the movements of the laser beam and a system for warning an operator or a robotic mechanical device for removing dross from the surface of the bath.

    APPARATUS AND METHOD FOR DETECTION OF VACUUM ULTRAVIOLET RADIATION
    327.
    发明授权
    APPARATUS AND METHOD FOR DETECTION OF VACUUM ULTRAVIOLET RADIATION 有权
    DEVICE AND METHOD FOR DETECTION真空紫外线辐射的

    公开(公告)号:EP1664691B1

    公开(公告)日:2008-03-26

    申请号:EP04786908.6

    申请日:2004-09-03

    CPC classification number: G01J1/429 G01J3/443

    Abstract: Vacuum ultraviolet radiation detection apparatus (10) comprises a radiation detector (30) in a chamber (12). The detector (30) receives ultraviolet radiation from a radiation source (36). The chamber is evacuated using a dry vacuum pump (18) to a relatively poor vacuum of no less than 5 Pa. UV transparent gas is supplied from a gas supply (26), into the chamber (12) at a relatively low flow rate (around 0.1 litres/minute) so as to provide an overall pressure in the chamber (12) of between 100 and 1,000 Pa. The use of a relatively inexpensive pump coupled with a lower gas flow rate provides significant cost savings.

    VERFAHREN UND VORRICHTUNG ZUR DURCHFÜHRUNG DER EMISSIONSSPEKTROMETRIE
    328.
    发明授权
    VERFAHREN UND VORRICHTUNG ZUR DURCHFÜHRUNG DER EMISSIONSSPEKTROMETRIE 有权
    方法和设备实现发射光谱法

    公开(公告)号:EP1520165B1

    公开(公告)日:2008-03-19

    申请号:EP03761506.9

    申请日:2003-06-25

    CPC classification number: G01J3/443 G01N21/718

    Abstract: The invention relates to a method and a device for carrying out emission spectroscopy, in particular laser emission spectroscopy. According to said method, a pulsed laser beam is automatically focussed on a workpiece to generate a laser-induced plasma, the radiation emitted from the plasma is detected and an elemental analysis is performed using the captured radiation spectrum. The invention is characterised in that a laser beam impingement is carried out with a variable pulse interval DELTA T, that prior to the plasma generation, additional geometric parameters P 1, P 2 .. PN of a potential measurement location on the workpiece surface, in addition to the distance d of the autofocus lens from said workpiece surface are determined and in that an elemental analysis is only performed for the potential measurement locations, at which at least one of the additional geometric parameters lies within a predefined tolerance range [T1..T2].

    Spectroscopic analysis apparatus
    330.
    发明公开
    Spectroscopic analysis apparatus 有权
    分光分析装置

    公开(公告)号:EP1167932A3

    公开(公告)日:2004-10-13

    申请号:EP01112798.2

    申请日:2001-05-28

    Applicant: HORIBA, LTD.

    Inventor: Uemura, Takeshi

    CPC classification number: G01J3/20 G01J3/2803 G01J3/443

    Abstract: This invention presents a spectroscopic analyzing apparatus, which can increase the SN ratio, by executing an optimal spectroscopic analysis of light from a light source, which gives different light spectrum inherent to the component to be measured and has a different strength distribution according to the light emitting position therein, for example, light emitted from ICP. This invention comprises a light source (2), which emits different light spectra, each light spectrum being inherent to a component to be measured and having a different strength distribution according to the respective light emitting position; a spectroscope (6) for dispersing the light from the light source (2) according to its wavelength; at least one CTD photo sensor (8a - 8c) for sensing light being dispersed by the spectroscope (6) and lying within a specific wavelength range; and an optical system(9) for analyzing the light sensed by said at least one CTD photo sensor (8a - 8c), thereby making an image of the light source (2).

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