Abstract:
There is provided an illumination device from which an index can be obtained, the index appropriately reflecting intensity of a light beam guided to an object to be illuminated. A light source, a photodetector, and a support structure are provided in the illumination device. The light source emits light. The light source has light distribution in which a reference axis serves as an axis of symmetry or light distribution in which a plane including the reference axis serves as a plane of symmetry. A first light beam included in the light is guided to the object to be illuminated. A second light beam included in the light is guided to the photodetector. The photodetector detects intensity of the second light beam. The light source and the photodetector are supported by the support structure in positions and postures that allow the first light beam and the second light beam to be guided in an aforementioned manner. A traveling direction of the first light beam makes a first angle with the reference axis. A traveling direction of the second light beam makes a second angle with the reference axis. The second angle is the same as the first angle.
Abstract:
A spectrometer 1A comprises a package 2 having a stem 4 and a cap 5, an optical unit 10A arranged on the stem 4, and a lead pin 3 penetrating through the stem 4. The optical unit 10A has a dispersive part 21 for dispersing and reflecting light entering from a light entrance part 6 of the cap 5, a light detection element 30 for detecting the light dispersed and reflected by the dispersive part 21, a support 40 for supporting the light detection element 30 such as to form a space between the dispersive part 21 and the light detection element 30, a projection 11 projecting from the support 40, and a wiring electrically connected to the light detection element 30. The projection 11 is arranged at such a position as to be separated from the stem 4. The lead pin 3 is electrically connected to the second terminal part while being disposed to the projection 11.
Abstract:
A hyperspectral imaging system (100b) and a method are disclosed herein for providing a hyperspectral image of an area of a remote object (e.g., scene of interest 104). In one aspect, the hyperspectral imaging system includes at least one optic (106), a rotatable disk (302) which has multiple straight slits (304) formed therein, a spectrometer (110), a two-dimensional image sensor (112), and a controller (114). In another aspect, the hyperspectral imaging system includes at least one optic, a rotatable disk (which has at least one spiral slit formed therein), a spectrometer, a two-dimensional image sensor, and a controller. In yet another aspect, the hyperspectral imaging system includes at least one optic, a rotatable drum (which has a plurality of slits formed on the outer surface thereof and a fold mirror located therein), a spectrometer, a two-dimensional image sensor, and a controller.
Abstract:
A spectrometer 1A comprises a package 2 having a stem 4 and a cap 5, an optical unit 10A arranged on the stem 4, and a lead pin 3 penetrating through the stem 4. The optical unit 10A has a dispersive part 21 for dispersing and reflecting light entering from a light entrance part 6 of the cap 5, a light detection element 30 for detecting the light dispersed and reflected by the dispersive part 21, a support 40 for supporting the light detection element 30 such as to form a space between the dispersive part 21 and the light detection element 30, a projection 11 projecting from the support 40, and a wiring electrically connected to the light detection element 30. The projection 11 is arranged at such a position as to be separated from the stem 4. The lead pin 3 is electrically connected to the second terminal part while being disposed to the projection 11.
Abstract:
A multi field of view hyperspectral imaging device (300) and method for using the same are described herein. In one embodiment, the multi field of view hyperspectral imaging device comprises multiple fore optics (308, 310), multiple fold mirrors (312, 314), a slit including multiple openings (318, 320), a spectrometer (302), and a 2 - dimensional detector.
Abstract:
In the spectroscopy module 1, a light detecting element 4 is provided with a light passing opening 4b through which light made incident into a body portion 2 passes. Therefore, it is possible to prevent deviation of the relative positional relationship between the light passing opening 4b and a light detection portion 4a of the light detecting element 4. Further, an optical element 7, which guides light made incident into the body portion 2, is arranged at the light passing opening 4b. Therefore, light, which is to be made incident into the body portion 2, is not partially blocked at a light incident edge portion of the light passing opening 4b, but light, which is to be made incident into the body portion 2, can be guided securely. Therefore, according to the spectroscopy module 1, it is possible to improve the reliability.
Abstract:
A monolithic Offner spectrometer is described herein as are various components like a diffraction grating and a slit all of which are manufactured by using a state-of-the-art diamond machining process. In one embodiment, a monolithic Offner spectrometer is directly manufactured by using a diamond machining process. In another embodiment, a monolithic Offner spectrometer is manufactured by using molds which are made by a diamond machining process. In yet another embodiment, a diffraction grating is directly manufactured by using a diamond machining process. In still yet another embodiment, a diffraction grating is manufactured by using a mold which is made by a diamond machining process. In yet another embodiment, a slit is directly manufactured by using a diamond machining process.
Abstract:
Die Vorrichtung zur Erfassung des Spektrums elektromagnetischer Strahlung innerhalb eines vorgegebenen Wellenlängenbereichs ist versehen mit einem Substrat (12), einer oberhalb des Substrats (12) angeordneten ersten Lochmaske (20) aus einem für Strahlung innerhalb des vorgegebenen Wellenlängenbereichs undurchlässigen Material, wobei die erste Lochmaske (20) eine Vielzahl von ersten Fenstern (22) aufweist, einer Vielzahl von in dem Substrat (12) angeordneten, für Strahlung innerhalb des vorgegebenen Wellenlängenbereichs empfindlichen Sensorelementen, und einer oberhalb der ersten Lochmaske (20) angeordneten, zweite Fenster (36) aufweisenden zweiten Lochmaske (32) aus einem für die Strahlung innerhalb des vorgegebenen Wellenlängenbereichs undurchlässigen Material. Die zweiten Fenster (36) der zweiten Lochmaske (32) sind überlappend mit den Fenstern der ersten Lochmaske (20) angeordnet und gegenüberliegende Ränder der jeweils zwei sich überlappenden Fenster der beiden Lochmasken (20,32) definieren die Größe einer jeweils einem Sensorelement zugeordneten Strahlungsdurchlassöffnung (42) zum Durchlassen von Strahlung innerhalb des vorgegebenen Wellenlängenbereichs zu dem unterhalb der Strahlungsdurchlassöffnung (42) angeordneten Sensorelement. Für die Erfassung der Intensität von elektromagnetischer Strahlung bei jeder interessierenden Wellenlänge innerhalb des vorgegebenen Wellenlängenbereichs ist mindestens eine Strahlungsdurchlassöffnung (42) mit einer der interessierenden Wellenlängen zugeordnete Größe vorgesehen.