Manufacture of micro electron emitter
    372.
    发明授权
    Manufacture of micro electron emitter 失效
    微电子发射器的制造

    公开(公告)号:US5599749A

    公开(公告)日:1997-02-04

    申请号:US544922

    申请日:1995-10-18

    Applicant: Atsuo Hattori

    Inventor: Atsuo Hattori

    CPC classification number: H01J9/025 H01J2201/30457 H01L2924/00013

    Abstract: A method of manufacturing an electric field emission type device. A recess having a tapered surface at an upper portion of the recess is provided. A sacrificial film is deposited on the substrate with the tapered recess. A sharp cusp is therefore formed on the surface of the sacrificial film over the recess. An electron emitting material film is deposited on the sacrificial film to form a fine emitter with a sharp tip. This fine emitter is exposed by etching and removing unnecessary regions under the fine emitter. This manufacturing method realizes a high performance electric field emission type device having an emitter tip with a small radius of curvature and a small apex angle.

    Abstract translation: 一种制造电场发射型装置的方法。 设置有在凹部的上部具有锥形表面的凹部。 牺牲膜沉积在具有锥形凹槽的基底上。 因此,在凹部上的牺牲膜的表面上形成尖锐的尖点。 电子发射材料膜沉积在牺牲膜上以形成具有尖锐尖端的精细发射极。 该精细发射体通过蚀刻而除去精细发射体以下的不需要的区域。 该制造方法实现了具有小曲率半径和小顶角的发射极尖端的高性能电场发射型装置。

    Spaced-gate emission device and method for making same
    375.
    发明授权
    Spaced-gate emission device and method for making same 失效
    间隔栅极发射装置及其制造方法

    公开(公告)号:US5504385A

    公开(公告)日:1996-04-02

    申请号:US299470

    申请日:1994-08-31

    Abstract: In accordance with the invention, a field emission device is made by disposing emitter material on an insulating substrate, applying a sacrificial film to the emitter material and forming over the sacrificial layer a conductive gate layer having a random distribution of apertures therein. In the preferred process, the gate is formed by applying masking particles to the sacrificial film, applying a conductive film over the masking particles and the sacrificial film and then removing the masking particles to reveal a random distribution of apertures. The sacrificial film is then removed. The apertures then extend to the emitter material. In a preferred embodiment, the sacrificial film contains dielectric spacer particles which remain after the film is removed to separate the emitter from the gate. The result is a novel and economical field emission device having numerous randomly distributed emission apertures which can be used to make low cost flat panel displays.

    Abstract translation: 根据本发明,通过将发射极材料设置在绝缘衬底上,将牺牲膜施加到发射极材料并在牺牲层上形成具有其中孔径随机分布的导电栅极层而形成场致发射器件。 在优选的方法中,通过将掩模颗粒施加到牺牲膜,在掩模颗粒和牺牲膜上施加导电膜,然后去除掩模颗粒以显示孔的随机分布来形成栅极。 然后去除牺牲膜。 孔然后延伸到发射体材料。 在优选实施例中,牺牲膜包含介电间隔物颗粒,其在除去膜之后保留,以将发射极与栅极分离。 结果是一种新颖且经济的场致发射装置,其具有许多随机分布的发射孔,其可用于制造低成本的平板显示器。

    Diamond cold cathode using patterned metal for electron emission control
    376.
    发明授权
    Diamond cold cathode using patterned metal for electron emission control 失效
    金刚石冷阴极,使用图案化金属进行电子发射控制

    公开(公告)号:US5473218A

    公开(公告)日:1995-12-05

    申请号:US251415

    申请日:1994-05-31

    Inventor: Curtis D. Moyer

    CPC classification number: H01J3/021 H01J1/3042 H01J2201/30457

    Abstract: A flat, cold-cathode electron emitter including a substrate having a relatively flat surface with a low work function electron emission material layer for emitting electrons supported on the surface of the substrate. A contact conductive layer is disposed on the electron emission material layer and defines an aperture therethrough. An insulating layer is disposed on the contact conductive layer and has an aperture defined therethrough coextensive and in peripheral alignment with the aperture in the contact conductive layer and a conductive gate layer is disposed on the insulating layer. The contact conductive layer forms the field potential so that emission occurs substantially in the center of the aperture.

    Abstract translation: 一种扁平的冷阴极电子发射器,包括具有相对平坦表面的基底,具有用于发射支撑在基底表面上的电子的功函数电子发射材料层。 接触导电层设置在电子发射材料层上并限定穿过其中的孔。 绝缘层设置在接触导电层上,并且具有通过共同延伸限定的孔,并且与接触导电层中的孔周边对准,并且导电栅极层设置在绝缘层上。 接触导电层形成场电位,使得发射基本上在孔的中心。

    Field emitter with diamond emission tips
    378.
    发明授权
    Field emitter with diamond emission tips 失效
    具有金刚石发射尖端的场发射器

    公开(公告)号:US5341063A

    公开(公告)日:1994-08-23

    申请号:US981958

    申请日:1992-11-24

    Applicant: Nalin Kumar

    Inventor: Nalin Kumar

    Abstract: A field emitter comprising a conductive metal and a diamond emission tip with negative electron affinity in ohmic contact with and protruding above the metal. The field emitter is fabricated by coating a substrate with an insulating diamond film having negative electron affinity and a top surface with spikes and valleys, depositing a conductive metal on the diamond film, and applying an etch to expose the spikes without exposing the valleys, thereby forming diamond emission tips which protrude a height above the conductive metal less than the mean free path of electrons in the diamond film.

    Abstract translation: 一种场致发射器,包括导电金属和具有负电子亲和力的金刚石发射尖端,与金属欧姆接触并在其上突出。 通过用具有负电子亲和性的绝缘金刚石膜和具有尖峰和谷的顶表面涂覆衬底,在金刚石膜上沉积导电金属以及施加蚀刻以暴露尖峰而不暴露谷来制造场致发射体,从而 形成金刚石发射尖端,其突出在导电金属之上的高度小于金刚石膜中电子的平均自由程。

    Method of making atomically sharp tips useful in scanning probe
microscopes
    379.
    发明授权
    Method of making atomically sharp tips useful in scanning probe microscopes 失效
    制造用于扫描探针显微镜的原子锋利尖端的方法

    公开(公告)号:US5302239A

    公开(公告)日:1994-04-12

    申请号:US884482

    申请日:1992-05-15

    CPC classification number: G01Q70/16 B82Y35/00 H01J9/025 H01J2201/30457

    Abstract: An in situ plasma dry etching process for the formation of atomically sharp tips for use in high resolution microscopes in which i) a mask layer is deposited on a substrate, ii) a photoresist layer is patterned superjacent the mask layer at the sites where the tips are to be formed, iii) the mask is selectively removed by plasma etching, iv) after which the substrate is etched in the same plasma reacting chamber, thereby creating sharp microscope tips.

    Abstract translation: 用于形成用于高分辨率显微镜的原子锋利尖端的原位等离子体干蚀刻工艺,其中i)掩模层沉积在基底上,ii)在尖端的位置处,将图案层叠在掩模层的上方, 要形成,iii)通过等离子体蚀刻选择性地除去掩模,iv)然后在相同的等离子体反应室中蚀刻衬底,从而产生尖锐的显微镜尖端。

    Electron device employing a low/negative electron affinity electron
source
    380.
    发明授权
    Electron device employing a low/negative electron affinity electron source 失效
    采用低/负电子亲和力电子源的电子器件

    公开(公告)号:US5283501A

    公开(公告)日:1994-02-01

    申请号:US732298

    申请日:1991-07-18

    CPC classification number: H01J1/3042 H01J3/022 H01J2201/30457

    Abstract: Electron devices employing electron sources including a material having a surface exhibiting a very low/negative electron affinity such as, for example, the 111 crystallographic plane of type II-B diamond. Electron sources with geometric discontinuities exhibiting radii of curvature of greater than approximately 1000.ANG. are provided which substantially improve electron emission levels and relax tip/edge feature requirements. Electron devices employing such electron sources are described including image generation electron devices, light source electron devices, and information signal amplifier electron devices.

    Abstract translation: 使用电子源的电子器件包括具有非常低/负电子亲和力的表面的材料,例如II-B型金刚石的111晶体平面。 提供具有大于约1000(Aangstroem)的曲率半径的几何不连续性的电子源,其基本上改善电子发射水平并缓和尖端/边缘特征要求。 描述了使用这种电子源的电子器件,其包括图像生成电子器件,光源电子器件和信息信号放大器电子器件。

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