Abstract:
PROBLEM TO BE SOLVED: To provide a lubricating oil composition exhibiting an extremely low friction coefficient when used as the lubricating oil for a low-friction sliding material, and to provide a sliding mechanism having excellent low friction properties by combining the lubricating oil composition with a sliding mechanism having a film of a specific low-friction sliding material on a sliding surface.SOLUTION: A lubricating oil composition used for a low-friction sliding material containing in a lubricant base oil, based on the total amount of the composition, (A) 0.005 mass% to 0.12 mass% of organic zinc dithiophosphate in phosphorus concentration equivalent, (B) 0.05 mass% to 5 mass% of an amine-based friction-reducing agent, and (C) 0.05 mass% to 0.5 mass% of an alkaline-earth metal salicylate-based cleaning agent and/or an alkaline-earth metal sulfonate-based cleaning agent in alkaline-earth metal concentration equivalent is characterized by containing 0.005 mass% to 0.05 mass% of primary dialkyl zinc dithiophosphate in phosphorous concentration equivalent in the component (A). There is also provided a sliding mechanism obtained by interposing the lubricating oil composition between mutually sliding surfaces of two sliding members, and having at least one sliding surface of the two sliding members having a DLC film containing hydrogen in the amount of 5 atom% to 50 atom% formed thereon.
Abstract:
PROBLEM TO BE SOLVED: To provide a DLC coating film capable of providing a sliding member exerting a reduced coefficient of friction at sliding in the presence of a lubricant compared to a conventional one, and a method for forming the same.SOLUTION: The DLC coating film is applied to the sliding surface of the sliding member in which the DLC coating film has a surface energy of 52-74 mJ/m, or a contact angle of ethylene glycol is 27-51°. The DLC coating film shows a graphite crystal peak in an X-ray scattering spectrum. The method for forming the DLC coating film comprises steps for subjecting the previously-formed DLC coating film to plasma treatment, thereby controlling the surface energy and forming the DLC coating film. In the plasma treatment, the DLC coating film is irradiated with plasma with an adjusted amount of ions of 1.30×10to 1.85×10ions/cmat a bias (ion acceleration) voltage of 80-140 V.
Abstract:
PROBLEM TO BE SOLVED: To provide a layer structure having a hard carbon film layer, which prevents the formed hard carbon film layer from peeling even if the layer structure is used for a member in which a high sliding surface pressure of 600 MPa or higher acts during being operated.SOLUTION: The layer structure 1 comprises a Ti layer 3, an intermediate layer 4 and a hard carbon film layer 5, layered in this order on a substrate 2. In the layer structure 1, the intermediate layer 4 is a mixture component layer of Si and C, and is composed of: a first layer 41 formed on the Ti layer 3; and a second layer 42 formed on the first layer 41. The first layer 41 has a composition ratio of Si amount of 30 to 60 mass% with respect to the amount of C. The second layer 42 is a gradient layer in which the composition ratio of the Si amount to the C amount decreases from the first layer 41 to the hard carbon film layer 5, and the composition ratio of the Si amount with respect to the C amount is 5 to 20 mass% directly under the hard carbon film layer 5.
Abstract:
PROBLEM TO BE SOLVED: To provide a case for a semiconductor, capable of suppressing the diffusion of gas originated from a resin into the inside of the case. SOLUTION: The case includes: a case body which has an inner side face made of a resin and stores a reticle or a wafer; and a diamond-like carbon film for coating the inner side face and preventing the diffusion of an evaporated material contained in the resin from the inner side face. COPYRIGHT: (C)2010,JPO&INPIT