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公开(公告)号：JP2007276041A
公开(公告)日：2007-10-25
申请号：JP2006104589
申请日：2006-04-05
Applicant: Kishida Seisakusho:Kk , Kurita Seisakusho:Kk , Shirasaki Seisakusho:Kk , 株式会社岸田製作所 , 株式会社栗田製作所 , 株式会社白崎製作所
Inventor： SHIRASAKI SUSUMU , SHINOHARA MASARU , SUGIHARA MASAHIKO , KISHIDA SHINICHI
IPC: B24B37/08 , B24B37/27 , B24B37/28 , H01L21/304
Abstract: PROBLEM TO BE SOLVED: To provide a DLC coated wafer holder and a manufacturing method therefor unlike a conventional technology capable of preventing the wear of the wafer holder caused by contact with a surface plate and an adverse influence caused by adhesive grains or abrasive compounds, and in addition, solving a problem of metal ion leakage to the outside by abrasives supplied during polishing operations in the case of a metal wager holder. SOLUTION: This disk-shaped wafer holder designed to hold a wafer against the surface plate of a polishing device in which a wafer installation hole is formed is at least partially or entirely DLC-coated. In addition, the disk-shaped wafer holder includes, a disk-shaped body and a wafer ring with a wafer installation hole formed therein so as to be attachable and detachable to and from the disk-shaped wafer holder, and the thickness of the ring is set to be thicker than that of the disk-shaped body. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种DLC涂覆的晶片保持器及其制造方法，其不同于传统技术，其能够防止由于与表面板的接触而导致的晶片保持器的磨损和由粘合剂颗粒或研磨剂引起的不利影响 化合物，并且另外，在金属冲击保持器的情况下，通过在抛光操作期间提供的研磨剂来解决金属离子向外部泄漏的问题。 解决方案：设计成将晶片固定在其上形成晶片安装孔的抛光装置的表面板上的该盘形晶片保持架至少部分或全部是DLC涂覆的。 此外，盘状晶片保持架包括：盘状体和具有形成在其中的晶片安装孔的晶片环，以便可与盘形晶片保持器相连接和可拆卸，并且环的厚度 被设定为比盘状体的厚度更厚。 版权所有（C）2008，JPO＆INPIT
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34.发明专利Plasma surface treatment method, plasma generation apparatus, and plasma surface treatment apparatus 审中-公开等离子体表面处理方法，等离子体生成装置和等离子体表面处理装置（PLASMA SURFACE TREATMENT APPARATUS）
公开(公告)号：JP2006216468A
公开(公告)日：2006-08-17
申请号：JP2005029760
申请日：2005-02-04
Applicant: Daiken Kagaku Kogyo Kk , Kurita Seisakusho:Kk , Toyohashi Univ Of Technology , 国立大学法人豊橋技術科学大学 , 大研化学工業株式会社 , 株式会社栗田製作所
Inventor： TAKIGAWA HIROSHI , SHIKI HAJIME , MOTOKI JUNPEI , NISHIMURA YOSHIMI , HARADA AKIO
Abstract: PROBLEM TO BE SOLVED: To provide a plasma generation apparatus and a plasma surface treatment apparatus that modify the surface of a solid substance, which has been difficult by conventional plasma apparatuses. SOLUTION: The plasma generation apparatus is constituted of a plasma generation part to generate a plasma between electrodes, and a raw material supplying part to supply a raw material to the plasma generation part. The raw material contains at least an OH-containing material having OH in its chemical composition. The raw material supplying part is constituted of an OH-containing material supplying means to supply the OH-containing material to the plasma generation part. The plasma generated in the plasma generation part contains at least OH molecules, OH ions or OH-containing plasma containing secondary particles generated therefrom. The plasma surface treatment method and the plasma surface treatment apparatus are to impart desired surface characteristics by treating the surface to be treated by the OH-containing plasma generated by the plasma generation apparatus. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 解决的问题：提供一种等离子体产生装置和等离子体表面处理装置，其通过传统的等离子体装置难以改变固态物质的表面。 解决方案：等离子体产生装置由等离子体产生部分构成，以在电极之间产生等离子体，以及原料供应部分，用于将原料供应到等离子体产生部分。 该原料至少含有其化学组成中具有OH的含OH材料。 原料供给部由向OH等离子体产生部供给含OH材料的含OH材料供给机构构成。 在等离子体生成部中产生的等离子体至少含有OH分子，OH离子或含有OH的等离子体，其含有二次粒子。 等离子体表面处理方法和等离子体表面处理装置通过用等离子体产生装置产生的含OH等离子体处理待处理表面来赋予所需的表面特性。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2015065085A
公开(公告)日：2015-04-09
申请号：JP2013198997
申请日：2013-09-25
Applicant: 株式会社栗田製作所 , 公立大学法人兵庫県立大学
IPC: H01M4/139
CPC classification number: Y02P70/54
Abstract: 【課題】本発明の目的は、安全で環境負荷の少ない材料を用いてリチウムイオン二次電池電極形成用塗料やこれを用いて形成した電極を提供することである。 【解決手段】本発明の形態は、リチウムイオン二次電池の電極を形成するリチウムイオン二次電池電極形成用塗料であり、液中プラズマ9を使用して製造されるリチウムイオン二次電池電極形成用塗料である。本発明の他の形態は、液中プラズマ9を使用するリチウムイオン二次電池電極形成用塗料製造方法である。本発明の他の形態は、リチウムイオン二次電池の電極を形成する塗料を製造するリチウムイオン二次電池電極用塗料製造装置であり、液中プラズマ9を発生させる液中プラズマ発生手段を有するリチウムイオン二次電池電極形成用塗料製造装置である。 【選択図】図1
Abstract translation: 要解决的问题：提供一种使用安全且环境负荷小的材料形成锂离子二次电池电极的涂料和使用该涂料形成的电极。本发明的实施方案是一种用于 形成锂离子二次电池电极，用于形成锂离子二次电池的电极并使用浸没式等离子体9制造。本发明的其他实施方式是一种制造用于形成锂离子二次电池电极的涂料的方法，其使用浸没式 等离子体9.本发明的其他实施方案是一种用于锂离子二次电池电极的涂料制造装置，该涂料制造装置制造用于形成锂离子二次电池的电极的涂料，并且包括用于产生浸没等离子体的浸没等离子体产生装置 9。
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Patent Agency Ranking
公开(公告)号：JP5295485B2
公开(公告)日：2013-09-18
申请号：JP2006024084
申请日：2006-02-01
Applicant: 株式会社栗田製作所
Abstract: PROBLEM TO BE SOLVED: To provide an in-liquid plasma generation method and an apparatus for generating plasma in a bubble formed in a liquid and permeating and diffusing active ion species into the liquid. SOLUTION: In the in-liquid plasma generation method and the in-liquid plasma generation apparatus 2, a pair of electrodes at least one of which consists of a high voltage electrode 6 having a high voltage insulating part 6b and at least one projection part is immersed in liquid 14, a high voltage pulse is applied at a high repetition rate between these electrodes to Joule-heat the liquid adjacent to the high voltage electrode 6 and continuously or intermittently to boil and evaporate the liquid, the evaporation bubbles form an evaporation bubble region 28 surrounding at least a projection part tip 6c of the high voltage electrode 6, evaporation objects in the bubbles is ionized (turned to plasma) by high voltage dielectric breakdown discharge in the evaporation bubbles by the high voltage pulse 26 to form various kinds of ions, and the ion species in the plasma is permeated and diffused into the liquid 14. COPYRIGHT: (C)2007,JPO&INPIT
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37.发明专利
公开(公告)号：JP2012018890A
公开(公告)日：2012-01-26
申请号：JP2010157116
申请日：2010-07-09
Applicant: Kurita Seisakusho:Kk , Nagoya Univ , 国立大学法人名古屋大学 , 株式会社栗田製作所
Inventor： TAKAI OSAMU , SAITO NAGAHIRO , SHIRAFUJI RITSU , HIEDA JUNKO , NISHIMURA YOSHIMI , HISHIDA SIGEJI , KAKITANI SHINICHI
Abstract: PROBLEM TO BE SOLVED: To provide a power supply apparatus capable of continuously applying a repetitive high-power and high-voltage pulse with higher frequency to use continuous plasma in liquid to allow efficiency of a chemical reaction to be improved.SOLUTION: A power supply apparatus continuously applies a repetitive high-power and high-voltage pulse with higher frequency to electrodes disposed in a solution to generate plasma in the vicinity of the electrodes to thereby improve efficiency of a chemical reaction of the plasma at a gas-liquid interface in the solution. In the apparatus, a divided frequency and phase control circuit 3 of an IGBT driver 18 generates first, second and third switching signals with a phase shifted by a 1/3 period, and outputs the first, second and third switching signals to first, second and third switching circuits 11, 12, and 13 of first, second and third modulator power supplies 4, 5, and 6, respectively, to allow the respective switching circuits to perform a switching operation and to generate power-amplified first, second and third pulse voltages. A pulse voltage formed by combining the first, second and third pulse voltages is inputted to a pulse transformer 15.
Abstract translation: 要解决的问题：提供一种能够连续地施加具有更高频率的重复高功率和高电压脉冲的电源装置，以在液体中使用连续等离子体以提高化学反应的效率。 解决方案：电源设备对设置在溶液中的电极连续地施加具有较高频率的重复高功率和高电压脉冲，以在电极附近产生等离子体，从而提高等离子体的化学反应效率 在溶液中的气 - 液界面处。 在该装置中，IGBT驱动器18的分频和相位控制电路3产生相移一个1/3周期的第一，第二和第三开关信号，并将第一，第二和第三开关信号输出到第一，第二 和第一，第二和第三调制器电源4,5和6的第三开关电路11,12和13，以允许相应的开关电路执行开关操作并产生功率放大的第一，第二和第三 脉冲电压。 通过组合第一，第二和第三脉冲电压形成的脉冲电压被输入到脉冲变压器15.版权所有：（C）2012，JPO和INPIT
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38.发明专利
公开(公告)号：JP4658506B2
公开(公告)日：2011-03-23
申请号：JP2004102452
申请日：2004-03-31
Applicant: 大研化学工業株式会社 , 株式会社栗田製作所 , 浩史 滝川
IPC: H05H1/46 , H01L21/304 , H05H1/30 , H05H1/36
Abstract: A power supply circuit for plasma generation by which a large quantity of generated plasma can be smoothly obtained without increasing the sizes of an apparatus, a plasma generating apparatus, a plasma processing apparatus which can process a large quantity of objects to be processed at a low cost by using the plasma generating apparatus, and plasma processed objects having target quantities are realized. An electric discharge generating electrode is composed of two or more first electrodes and one or more second electrodes. An LC series circuit is provided by connecting a capacitor C and a coil L in series between one of outputs of an alternating high voltage generating circuit which generates an alternating high voltage to be applied between the electrodes of electric discharge generating electrode, and the first electrode. When electricity is discharged in one of the electrode pair, voltage drop is suppressed by the coil even when the electric discharge of capacitor progresses, and since electric discharge from the other electrode pair is induced without being disturbed, a large quantity of plasma can be smoothly generated by common use of the alternating high voltage generating circuit.
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39.发明专利In-liquid plasma generation method, in-liquid plasma generation apparatus, apparatus for purifying liquid to be treated, and ionic liquid supplying apparatus 有权液体等离子体生成方法，液体等离子体生成装置，待处理液体的洗涤装置和离子液体供给装置
公开(公告)号：JP2007207540A
公开(公告)日：2007-08-16
申请号：JP2006024084
申请日：2006-02-01
Applicant: Kurita Seisakusho:Kk , 株式会社栗田製作所
Inventor： NISHIMURA YOSHIMI , HISHIDA SHIGEJI
Abstract: PROBLEM TO BE SOLVED: To provide an in-liquid plasma generation method and an apparatus for generating plasma in a bubble formed in a liquid and permeating and diffusing active ion species into the liquid. SOLUTION: In the in-liquid plasma generation method and the in-liquid plasma generation apparatus 2, a pair of electrodes at least one of which consists of a high voltage electrode 6 having a high voltage insulating part 6b and at least one projection part is immersed in liquid 14, a high voltage pulse is applied at a high repetition rate between these electrodes to Joule-heat the liquid adjacent to the high voltage electrode 6 and continuously or intermittently to boil and evaporate the liquid, the evaporation bubbles form an evaporation bubble region 28 surrounding at least a projection part tip 6c of the high voltage electrode 6, evaporation objects in the bubbles is ionized (turned to plasma) by high voltage dielectric breakdown discharge in the evaporation bubbles by the high voltage pulse 26 to form various kinds of ions, and the ion species in the plasma is permeated and diffused into the liquid 14. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供一种在液体中形成的气泡中产生等离子体的液体内等离子体生成方法和装置，并且将活性离子物质渗透并扩散到液体中。 解决方案：在液体内等离子体产生方法和液体内等离子体产生装置2中，至少一个电极由具有高电压绝缘部分6b的高压电极6和至少一个 突出部分浸入液体14中，在这些电极之间以高重复率施加高电压脉冲，对邻近高电压电极6的液体进行焦耳加热，并连续或间断地使液体沸腾和蒸发，蒸发气泡形成 包围高压电极6的至少突出部分尖端6c的蒸发气泡区域28，通过高电压脉冲26在蒸发气泡中的高电压电介质击穿放电将气泡中的蒸发物体电离（转化为等离子体），形成 各种离子和等离子体中的离子物质渗透并扩散到液体14中。（C）2007，JPO和INPIT
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公开(公告)号：JP2006332899A
公开(公告)日：2006-12-07
申请号：JP2005151401
申请日：2005-05-24
Applicant: Asahi Kasei Chemicals Corp , Kurita Seisakusho:Kk , 旭化成ケミカルズ株式会社 , 株式会社栗田製作所
Inventor： MATSUI SHINSUKE , NISHIMURA YOSHIMI
Abstract: PROBLEM TO BE SOLVED: To provide an electromagnetic wave generator capable of generating a voltage pulse at a high voltage required to activate a virtual cathode electron tube at high rising speed by using a plasma switch. SOLUTION: An MC type explosive electric generator 20 amplifies a current to be supplied from a capacitor group 2, a first air-core transformer 30 stores the amplified current as electric energy, which passes through the plasma switch 40 to obtain a high voltage pulse, and a second air-core transformer 50 amplifies the high voltage pulse at a prescribed number of multiples. When the voltage of the high voltage pulse reaches a prescribed value, a gap switch 60 is operated, and a high speed rising pulse voltage waveform is applied to the virtual cathode electron tube 70. The virtual cathode electron tube 70 generates an electromagnetic wave of high output, which is emitted from an antenna 80. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 解决的问题：提供一种电磁波发生器，其能够通过使用等离子体开关产生以高的上升速度激活虚拟阴极电子管所需的高电压的电压脉冲。 解决方案：MC型爆炸发电机20放大从电容器组2供给的电流，第一空芯变压器30将放大的电流作为电能存储，其通过等离子体开关40获得高电平 电压脉冲，第二空芯变压器50以规定数量的倍数放大高电压脉冲。 当高电压脉冲的电压达到规定值时，间隙开关60动作，向虚拟阴极电子管70施加高速上升脉冲电压波形。虚拟阴极电子管70产生高电压的电磁波 输出，其从天线80发射。版权所有（C）2007，JPO＆INPIT
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