DIAMOND FILM DEPOSITION
    31.
    发明公开
    DIAMOND FILM DEPOSITION 审中-公开
    分离金刚石薄膜

    公开(公告)号:EP2176443A2

    公开(公告)日:2010-04-21

    申请号:EP08781572.6

    申请日:2008-07-09

    CPC classification number: C23C16/279 C23C16/271 Y10T428/24372

    Abstract: Diamond material made by a hot filament chemical vapor deposition process, providing large film area, good growth rate, phase purity, small average grain size, smooth surfaces, and other useful properties. Low substrate temperatures can be used. Control of process variables such as pressure and filament temperature and reactant ratio allow control of the diamond properties. Applications include MEMS, wear resistance low friction coatings, biosensors, and electronics.

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