DIAMOND FILM DEPOSITION
    1.
    发明申请
    DIAMOND FILM DEPOSITION 审中-公开
    金刚石薄膜沉积

    公开(公告)号:WO2009009604A2

    公开(公告)日:2009-01-15

    申请号:PCT/US2008/069541

    申请日:2008-07-09

    CPC classification number: C23C16/279 C23C16/271 Y10T428/24372

    Abstract: Diamond material made by a hot filament chemical vapor deposition process, providing large film area, good growth rate, phase purity, small average grain size, smooth surfaces, and other useful properties. Low substrate temperatures can be used. Control of process variables such as pressure and filament temperature and reactant ratio allow control of the diamond properties. Applications include MEMS, wear resistance low friction coatings, biosensors, and electronics.

    Abstract translation: 通过热丝化学气相沉积工艺制造的金刚石材料,提供大的膜面积,良好的生长速度,相纯度,小的平均晶粒尺寸,光滑的表面和其他有用的性质。 可以使用低基板温度。 过程变量的控制,例如压力和灯丝温度和反应物比率,可以控制金刚石性能。 应用包括MEMS,耐磨损低摩擦涂层,生物传感器和电子产品。

    DIAMOND FILM DEPOSITION
    2.
    发明公开
    DIAMOND FILM DEPOSITION 审中-公开
    分离金刚石薄膜

    公开(公告)号:EP2176443A2

    公开(公告)日:2010-04-21

    申请号:EP08781572.6

    申请日:2008-07-09

    CPC classification number: C23C16/279 C23C16/271 Y10T428/24372

    Abstract: Diamond material made by a hot filament chemical vapor deposition process, providing large film area, good growth rate, phase purity, small average grain size, smooth surfaces, and other useful properties. Low substrate temperatures can be used. Control of process variables such as pressure and filament temperature and reactant ratio allow control of the diamond properties. Applications include MEMS, wear resistance low friction coatings, biosensors, and electronics.

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