公开(公告)号：WO2007092950A3

公开(公告)日：2007-08-16

申请号：PCT/US2007/061912

申请日：2007-02-09

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  KIRK, Michael D. ,  BEVIS, Christopher F. ,  ADLER, David ,  BHASKAR, Kris

Inventor： KIRK, Michael D. ,  BEVIS, Christopher F. ,  ADLER, David ,  BHASKAR, Kris

IPC: G01N21/00

Abstract: Methods and systems for determining a characteristic of a wafer are provided. One method includes generating output responsive to light from the wafer using an inspection system. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. The method also includes determining the characteristic of the wafer using the second output. One system includes an inspection subsystem configured to illuminate the wafer and to generate output responsive to light from the wafer. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. The system also includes a processor configured to determine the characteristic of the wafer using the second output.

公开(公告)号：WO2007087101A3

公开(公告)日：2007-08-02

申请号：PCT/US2006/062097

申请日：2006-12-14

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  SHORTT, David ,  HALLER, Kurt L. ,  WOLTERS, Christian

Inventor： HALLER, Kurt L. ,  WOLTERS, Christian

IPC: B08B3/12

Abstract: Systems and methods for inspecting a wafer with increased sensitivity are provided. One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer. The system also includes a gas flow subsystem configured to replace a gas located proximate to the spot on the wafer with a medium that scatters less of the light than the gas thereby increasing the sensitivity of the system. In addition, the system includes a processor configured to detect defects on the wafer using the output signals.

公开(公告)号：WO2007076138A2

公开(公告)日：2007-07-05

申请号：PCT/US2006/049318

申请日：2006-12-26

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CHUANG, Yung-ho ,  BROWN, David, Lee

Inventor： CHUANG, Yung-ho ,  BROWN, David, Lee

IPC: G01N21/88

CPC classification number: G01N21/95607

Abstract: A method and apparatus for simultaneous high-speed inspection and acquisition of multiple data channels is provided. The method and apparatus enables inspecting semiconductor wafers and reticles and comprises converting a single image region into two image sections, reorienting one image into a transposed configuration enabling simultaneous scanning of two inspected object locations with a single sensor, and controlling acquisition parameters for a second image by using information collected from a first image in a feedback arrangement. The design provides a dual-linear or time-delay-integration sensor operating in a split readout configuration mode to simultaneously provide data from two regions of the sensor using two sets of readout circuitry.

Abstract translation: 提供了用于同时高速检查和获取多个数据信道的方法和装置。 该方法和装置能够检测半导体晶片和标线，并且包括将单个图像区域转换成两个图像部分，将一个图像重新定向为转置配置，使得能够利用单个传感器同时扫描两个检查对象位置，并且控制第二图像的获取参数 通过使用从反馈安排中的第一图像收集的信息。 该设计提供了以分离读出配置模式工作的双线性或时间延迟积分传感器，以使用两组读出电路同时从传感器的两个区域提供数据。

公开(公告)号：WO2007064910A2

公开(公告)日：2007-06-07

申请号：PCT/US2006/046031

申请日：2006-11-30

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  BROWN, David, Lee ,  CAO, Kai ,  CHUANG, Yung-Ho

Inventor： BROWN, David, Lee ,  CAO, Kai ,  CHUANG, Yung-Ho

IPC: H04N5/335

CPC classification number: H04N5/3765 ,  H04N5/37206

Abstract: A method and apparatus for propagating charge through a sensor and implementation thereof is provided. The method and apparatus may be used to inspect specimens, the sensor operating to advance an accumulated charge between gates of the TDI sensor. The design implementation provides a set of values representing a plurality of out of phase signals, such as sinusoidal or trapezoidal signals. These out of phase signals are converted and transmitted to the sensor. The converted signals cause the sensor to transfer charges in the sensor toward an end of the sensor. Aspects such as feed through correction and correction of nonlinearities are addressed.

Abstract translation: 提供了一种通过传感器传播电荷的方法和装置及其实现。 该方法和装置可用于检查样品，传感器操作以提前TDI传感器的门之间的累积电荷。 设计实现提供了一组表示多个异相信号的值，例如正弦或梯形信号。 这些异相信号被转换并传输到传感器。 转换的信号使传感器将传感器中的电荷传送到传感器的一端。 解决馈线通过校正和校正非线性等方面。

公开(公告)号：WO2007016217A2

公开(公告)日：2007-02-08

申请号：PCT/US2006/029135

申请日：2006-07-26

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  ARMSTRONG, J., Joseph ,  CHUANG, Yung-Ho

Inventor： ARMSTRONG, J., Joseph ,  CHUANG, Yung-Ho

IPC: H04B1/707

CPC classification number: H01S3/06708 ,  G01N21/8806 ,  G01N21/9501 ,  G02F1/3501 ,  G02F1/3534 ,  G02F1/3536 ,  G02F1/3544 ,  G02F1/3551 ,  G02F1/3553 ,  G02F1/3558 ,  G02F1/37 ,  G02F2001/3507 ,  G02F2001/354 ,  H01S3/06712 ,  H01S3/06741 ,  H01S3/0675 ,  H01S3/06791 ,  H01S3/094007 ,  H01S3/09415 ,  H01S3/1118 ,  H01S3/23 ,  H01S3/2383

Abstract: A laser illuminator and illumination method for use in an inspection system, such as a semiconductor wafer inspection system or photomask inspection system is provided. The design comprises generating fundamental frequency laser energy at different fundamental wavelengths, such as 998nm, converting a portion of the fundamental frequency laser energy to 2 nd harmonic frequency laser energy, further converting the 2" harmonic frequency laser energy to 4 th harmonic frequency laser energy, and mixing the 4 th harmonic frequency laser energy with a portion of the fundamental frequency laser energy to produce laser energy at a sum frequency. Mixing is accomplished by non-critical phase matching in a crystal of Cesium Lithium Borate (CLBO). Alternately, the design may employ shifting a portion of the fundamental frequency laser energy to laser energy at a Raman line and/or mixing the 2 nd harmonic frequency laser energy with a portion of the fundamental frequency laser energy to produce 3 rd harmonic frequency laser energy.

Abstract translation: 提供了一种用于检查系统中的激光照明器和照明方法，例如半导体晶片检查系统或光掩模检查系统。 该设计包括在不同的基本波长（例如998nm）处产生基频激光能量，将基频激光能量的一部分转换为二次谐波激光能量，进一步转换2“谐波激光能量 谐波频率激光能量，并将第4次谐波激光能量与基频激光能量的一部分混合，以产生激光能量的和频率 可以通过在硼酸铯（CLBO）的晶体中的非临界相位匹配来实现，或者，该设计可以使用将一部分基频激光能量转换成拉曼线上的激光能量和/ 谐波频率激光能量与基频激光能量的一部分产生3阶谐波激光能量。

公开(公告)号：WO2007008473A2

公开(公告)日：2007-01-18

申请号：PCT/US2006/025836

申请日：2006-06-30

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  GHINOVKER, Mark

Inventor： GHINOVKER, Mark

IPC: G01B11/00

CPC classification number: G01B11/272 ,  G01N21/4785 ,  G01N21/9501 ,  G03F7/70633 ,  H01L21/68 ,  H01L21/682 ,  H01L23/544 ,  Y10S438/975

Abstract: Disclosed are overlay targets having flexible symmetry characteristics and metrology techniques for measuring the overlay error between two or more successive layers of such targets. In one embodiment, a target includes structures for measuring overlay error (or a shift) in both the x and y direction, wherein the x structures have a different center of symmetry (COS) than the y structures. In another embodiment, one of the x and y structures is invariant with a 180° rotation and the other one of the x and y structures has a mirror symmetry. In one aspect, the x and y structures together are variant with a 180° rotation. In yet another example, a target for measuring overlay in the x and/or y direction includes structures on a first layer having a 180 symmetry and structures on a second layer having mirror symmetry. In another embodiment, a target for determining overlay in the x and/or y direction includes structures on a first layer and structures on a second layer, wherein the structures on the first layer have a COS that is offset by a known amount from the COS of the structures on the second layer. In a specific implementation, any of the disclosed target embodiments may take the form of device structures. In a use case, device structures that have an inherent 180° rotational symmetry or a mirror symmetry in each of the first and second layers are used to measure overlay in a first layer and a second layer. Techniques for imaging targets with flexible symmetry characteristics and analyzing the acquired images to determine overlay or alignment error are disclosed.

Abstract translation: 公开了具有灵活对称特征的覆盖目标和用于测量这些目标的两个或更多个连续层之间的重叠误差的计量技术。 在一个实施例中，目标包括用于测量x和y方向上的重叠误差（或移位）的结构，其中x结构具有与y结构不同的对称中心（COS）。 在另一个实施例中，x和y结构之一是不变的，具有180°旋转，并且x和y结构中的另一个具有镜像对称性。 在一个方面，x和y结构一起是180°旋转的变型。 在又一示例中，用于测量x和/或y方向上的覆盖层的目标包括具有180对称性的第一层上的结构，并且在具有镜像对称性的第二层上的结构。 在另一个实施例中，用于确定x和/或y方向上的覆盖的目标包括第一层上的结构和第二层上的结构，其中第一层上的结构具有由COS的已知量偏移的COS 的第二层结构。 在具体实现中，所公开的目标实施例中的任何一个可以采取设备结构的形式。 在用例中，使用在第一和第二层中的每一个中具有固有的180°旋转对称性或镜像对称性的装置结构来测量第一层和第二层中的覆盖层。 公开了用于对具有灵活对称特性的目标成像和分析所获取的图像以确定覆盖或对准误差的技术。

公开(公告)号：WO2006133235A2

公开(公告)日：2006-12-14

申请号：PCT/US2006/022009

申请日：2006-06-06

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  JEONG, Hwan, J. ,  HILL, Andrew, V. ,  WANG, Mark, S.

Inventor： JEONG, Hwan, J. ,  HILL, Andrew, V. ,  WANG, Mark, S.

IPC: G01N21/88

CPC classification number: G01N21/95623

Abstract: Serrated Fourier filters and inspection systems are provided. One Fourier filter includes one or more blocking elements configured to block a portion of light from a wafer. The Fourier filter also includes periodic serrations formed on edges of the one or more blocking elements. The periodic serrations define a transition region of the one or more blocking elements. The periodic serrations are configured to vary transmission across the transition region such that variations in the transmission across the transition region are substantially smooth. One inspection system includes a Fourier filter configured as described above and a detector that is configured to detect light transmitted by the Fourier filter. Signals generated by the detector can be used to detect the defects on the wafer.

Abstract translation: 提供锯齿傅立叶滤波器和检测系统。 一个傅立叶滤波器包括被配置为阻挡来自晶片的一部分光的一个或多个阻挡元件。 傅立叶滤波器还包括形成在一个或多个阻挡元件的边缘上的周期性锯齿。 周期性锯齿限定了一个或多个阻挡元件的过渡区域。 周期性锯齿被配置为改变穿过过渡区域的传输，使得跨越过渡区域的透射率的变化基本上是平滑的。 一个检查系统包括如上所述构造的傅里叶滤波器和被配置为检测由傅里叶滤波器发送的光的检测器。 由检测器产生的信号可用于检测晶片上的缺陷。

公开(公告)号：WO2006113135A3

公开(公告)日：2006-10-26

申请号：PCT/US2006/012741

申请日：2006-04-05

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  WATSON, Sterling, G. ,  LEVY, Ady ,  MACK, Chris, A. ,  STOKOWSKI, Stanley, E. ,  SAIDIN, Zain, K.

Inventor： WATSON, Sterling, G. ,  LEVY, Ady ,  MACK, Chris, A. ,  STOKOWSKI, Stanley, E. ,  SAIDIN, Zain, K.

IPC: G03F1/00 ,  G03F9/00 ,  G03C5/00 ,  G06F17/50

Abstract: Disclosed are techniques for determining and correcting reticle variations using a reticle global variation map generated by comparing a set of measured reticle parameters to a set of reference reticle parameters. The measured reticle parameters are obtained by reticle inspection, and the variation map identifies reticle regions and associated levels of correction. In one embodiment, the variation data is communicated to a system which modifies the reticle by embedding scattering centers within the reticle at identified reticle regions, thereby improving the variations. In another embodiment the variation data is transferred to a wafer stepper or scanner which in turn modifies the conditions under which the reticle is used to manufacture wafers, thereby compensating for the variations and producing wafers that are according to design.

公开(公告)号：WO2006107527A2

公开(公告)日：2006-10-12

申请号：PCT/US2006/009059

申请日：2006-03-13

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  SHAFER, David ,  ARMSTRONG, J. Joseph ,  CHUANG, Yung-Ho

Inventor： SHAFER, David ,  ARMSTRONG, J. Joseph ,  CHUANG, Yung-Ho

IPC: G02B23/00

CPC classification number: G02B17/0856 ,  G02B17/008 ,  G02B17/0892 ,  G02B21/04

Abstract: A relatively high NA objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective comprises a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. One or more elements may employ an aspheric surface. The objective may provide, in certain instances, an uncorrected spectral bandwidth up to approximately 193 to 266 nanometers and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may comprise more than one lens and may be formed of a material different from at least one other lens in the objective.

Abstract translation: 提供了用于成像试样的相对高的NA物镜和用于成像试样的方法。 该目的包括具有至少一个聚焦透镜的透镜组，该至少一个聚焦透镜被配置为接收光能并形成中间图像，至少一个定向成接收中间图像并提供中间光能的场透镜，以及定位成接纳中间图像的中间图像 光能并向样品施加光能。 一个或多个元件可以采用非球面。 在某些情况下，目标可以提供高达约193至266纳米的未校正的光谱带宽，并且可以提供超过0.9的数值孔径。 元素的直径小于100毫米，并且可以适合标准显微镜。 场透镜可以包括多于一个透镜，并且可以由与物镜中的至少一个其它透镜不同的材料形成。

公开(公告)号：WO2006094115A2

公开(公告)日：2006-09-08

申请号：PCT/US2006/007405

申请日：2006-03-01

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  BIELLAK, Stephen ,  SHORT, David

Inventor： BIELLAK, Stephen ,  SHORT, David

CPC classification number: G01N21/9501 ,  G01N21/474 ,  G01N21/8806

Abstract: A system and method for inspection is disclosed. The design includes focusing illumination beams of radiation at an optical axis to an array of illuminated elongated spots on the surface at oblique angle(s) of incidence to the surface, performing a linear scan along a linear axis, wherein the linear axis is offset from the optical axis by a not insubstantial angular quantity, and imaging scattered radiation from the spots onto an array of receivers so that each receiver in the array receives scattered radiation from a corresponding spot in the array of spots.

Abstract translation: 公开了一种用于检查的系统和方法。 该设计包括将光轴上的照射光束照射到表面上的照射细长光斑阵列的倾斜角度，沿着线性轴进行线性扫描，其中线性轴线偏离 通过非实质角度量的光轴，并且将来自斑点的散射辐射成像到接收器阵列上，使得阵列中的每个接收器接收来自点阵列中的对应点的散射辐射。