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    ANTIREFLECTION FILM
    31.
    发明申请
    ANTIREFLECTION FILM 审中-公开
    抗反射膜

    公开(公告)号：WO2010038709A9

    公开(公告)日：2010-09-23

    申请号：PCT/JP2009066813

    申请日：2009-09-28

    Applicant: TOPPAN PRINTING CO LTD ,  YOSHIHARA TOSHIAKI ,  HIGASHIKAWA EIICHI ,  SHIBAYAMA NAOYUKI

    Inventor： YOSHIHARA TOSHIAKI ,  HIGASHIKAWA EIICHI ,  SHIBAYAMA NAOYUKI

    IPC: G02B1/11 ,  B32B7/02 ,  G02B1/10 ,  G02B5/30 ,  G02F1/1335

    CPC classification number: G02B1/111 ,  G02B1/105 ,  G02B1/113 ,  G02B1/16 ,  G02B5/3033 ,  G02F1/133502 ,  Y10T428/31663

    Abstract: Provided is an antireflection film which not only has sufficient antireflection performance and sufficient antistatic performance but can show an excellent light-place contrast and an excellent dark-place contrast when provided on the surface of a display, in particular, on the surface of a transmissive liquid crystal display. The antireflection film provided with an antistatic hard coat layer and a low refractive index layer in order from the transparent substrate side on at least one surface of the transparent substrate is characterized in that the average luminous reflectance of the surface of the antireflection film on the low refractive index layer side is in the range of 0.5-1.5% inclusive, the haze of the antireflection film is in the range of 0.5% or less, the parallel light transmittance of the antireflection film is in the range of 94.0-96.5% inclusive, and the absorption loss in average luminous transmittance of the antireflection film is in the range of 0.5-3.0% inclusive.

    Abstract translation: 提供一种防反射膜，其不仅具有足够的抗反射性能和足够的抗静电性能，而且当设置在显示器的表面上时，特别是在透射表面上，可以显示出优异的光照对比度和优异的暗处的对比度 液晶显示器。 在透明基板的至少一个表面上从透明基板侧依次设置有抗静电硬涂层和低折射率层的防反射膜的特征在于，防反射膜的表面的平均光反射率低 折射率层侧在0.5-1.5％的范围内，防反射膜的雾度在0.5％以下的范围内，防反射膜的平行透光率在94.0〜96.5％的范围内， 并且防反射膜的平均透光率的吸收损失在0.5-3.0％的范围内。

    SOLID STATE IMAGING DEVICE, MANUFACTURING METHOD OF THE SAME, AND SUBSTRATE FOR SOLID STATE IMAGING DEVICE
    32.
    发明申请
    SOLID STATE IMAGING DEVICE, MANUFACTURING METHOD OF THE SAME, AND SUBSTRATE FOR SOLID STATE IMAGING DEVICE 审中-公开
    固态成像装置及其制造方法以及用于固态成像装置的基板

    公开(公告)号：WO2006001317B1

    公开(公告)日：2006-04-06

    申请号：PCT/JP2005011485

    申请日：2005-06-16

    Applicant: TOPPAN PRINTING CO LTD ,  FUKUYOSHI KENZO ,  ISHIMATSU TADASHI ,  OGATA KEISUKE ,  NAKAO MITSUHIRO ,  UCHIBORI AKIKO

    Inventor： FUKUYOSHI KENZO ,  ISHIMATSU TADASHI ,  OGATA KEISUKE ,  NAKAO MITSUHIRO ,  UCHIBORI AKIKO

    IPC: H01L27/146

    CPC classification number: H01L27/14601 ,  H01L27/14627 ,  H01L27/14685

    Abstract: A method of manufacturing a solid state imaging device having photoelectric conversion devices, the method including: 1) forming a plurality of color filters differing in color from each other, 2) forming a transparent resin layer on the color filters, 3) forming an etching control layer on the transparent resin layer, the etching control layer being enabled to be etched at a different etching rate from the etching rate of the transparent resin layer, 4) forming a lens master on the etching control layer by using a heat-flowable resin material, 5) transferring a pattern of the lens master to the etching control layer by dry etching to form an intermediate micro lens, and 6) transferring a pattern of the intermediate micro lens to the transparent resin layer by dry etching to form the transfer lenses.

    Abstract translation: 一种制造具有光电转换装置的固态成像装置的方法，所述方法包括：1）形成多个不同颜色的滤色器，2）在滤色器上形成透明树脂层，3）形成蚀刻 控制层，能够以与透明树脂层的蚀刻速率不同的蚀刻速率蚀刻蚀刻控制层，4）通过使用热可流动树脂在蚀刻控制层上形成透镜母版 材料，5）通过干蚀刻将透镜主体的图案转移到蚀刻控制层以形成中间微透镜，以及6）通过干蚀刻将中间微透镜的图案通过干蚀刻转印到透明树脂层上以形成转印透镜 。

    축전 장치용 외장재
    40.
    发明公开
    축전 장치용 외장재 审中-公开
    蓄电装置用外部材料

    公开(公告)号：KR20180017014A

    公开(公告)日：2018-02-20

    申请号：KR20177035123

    申请日：2016-06-07

    Applicant: TOPPAN PRINTING CO LTD

    Inventor： DAI HIROSHI ,  IMAMOTO JUNYA ,  OGIHARA YU ,  SUZUTA MASAYOSHI

    IPC: H01M2/02 ,  B32B7/12 ,  B32B15/085 ,  B32B27/20 ,  H01G11/78

    CPC classification number: H01M2/02

    Abstract: 본발명은, 적어도기재층, 접착제층, 금속박층및 실란트층을구비하고, 실란트층은무기계필러를함유하고, 또한적층방향을따른단면에있어서, 실란트층의총두께에대한무기계필러가차지하는비율이 5 ∼ 50 % 인, 축전장치용외장재, 또는기재층, 배리어층및 실란트층을이 순서로구비하고, 배리어층은금속박으로이루어지고, 배리어층은, 적어도실란트층측에부식방지처리층을가지고있고, 실란트층은부식방지처리층상에직접형성되어있고, 실란트층의두께는 5 ∼ 30 ㎛이고, 실란트층은고융점물질을함유하는, 축전장치용외장재에관한것이다.

    Abstract translation: 本发明涉及一种用于蓄电装置的外部材料，所述材料至少具有基材层，粘合剂层，金属薄片层和密封剂层，所述密封剂层包含无机填料，所述比例 所述无机填料相对于所述密封层的总厚度沿所述层叠方向的横截面为5-50％。 或用于功率存储装置的外部材料，所述材料以所述顺序具有衬底层，阻挡层和密封剂层，所述阻挡层包括金属箔，所述阻挡层具有防腐蚀处理层 在防腐处理层上至少在密封层侧直接形成密封层，密封层的厚度为5〜30μm，密封层包含高熔点物质。

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