ENERGY-BASED PROCESS FOR FLUID TREATMENT AND SYSTEM THEREFOR
    32.
    发明申请
    ENERGY-BASED PROCESS FOR FLUID TREATMENT AND SYSTEM THEREFOR 审中-公开
    基于能量的流体处理方法及其系统

    公开(公告)号:WO2003016222A1

    公开(公告)日:2003-02-27

    申请号:PCT/CA2002/001282

    申请日:2002-08-19

    Abstract: A process for treating a fluid which comprises the step of exposing the fluid to ultraviolet radiation and high-energy ionizing radiation. It has been discovered that combining ultraviolet radiation with high-energy ionizing radiation in the treatment of a fluid results in synergistic performances of the treatment process -e.g., improvement in the inactivation or killing of microorganisms in the fluid, in destruction of organic contaminants and the like. More specifically, fluid treatment performance is improved to a level typically not possible when using ultraviolet radiation and high-energy ionizing radiation separately.

    Abstract translation: 一种用于处理流体的方法,其包括将流体暴露于紫外线辐射和高能电离辐射的步骤。 已经发现,在处理流体中结合紫外线辐射与高能电离辐射导致处理过程的协同性能 - 例如改善流体中微生物的灭活或杀死,有机污染物的破坏和 喜欢。 更具体地,当分别使用紫外线辐射和高能量电离辐射时,流体处理性能提高到通常不可能的水平。

    RADIATION MODULE, ITS APPLICATION AND METHOD FOR SELF-CLEANING
    34.
    发明申请
    RADIATION MODULE, ITS APPLICATION AND METHOD FOR SELF-CLEANING 审中-公开
    辐射模块,其自动清洗应用与方法

    公开(公告)号:WO1996011880A1

    公开(公告)日:1996-04-25

    申请号:PCT/CA1995000579

    申请日:1995-10-17

    CPC classification number: C02F1/325 C02F1/36 C02F2201/3223 C02F2201/324

    Abstract: A method of cleaning fouling materials from a radiation module, the method comprising the steps of: (i) immersing at least a portion of the radiation module in a fluid; and (ii) subjecting the radiation module to vibration at a frequency sufficient to substantially inhibit fouling materials adhering to the at least one radiation source. A radiation module for use in a fluid treatment system comprising: a support member for mounting the module in the fluid treatment system; at least one radiation assembly extending from the support member; and vibration generation means associated with the at least one radiation assembly. The radiation module is self-cleaning and can take the form of a radiation module or a radiation sensor module. Incorporation of the radiation source module in a fluid treatment system is also described.

    Abstract translation: 一种从辐射模块清洁污垢材料的方法,所述方法包括以下步骤:(i)将辐射模块的至少一部分浸入流体中; 和(ii)使辐射模块以足以基本上抑制粘附在至少一个辐射源上的结垢材料的频率进行振动。 一种用于流体处理系统的辐射模块,包括:用于将所述模块安装在所述流体处理系统中的支撑构件; 至少一个从所述支撑构件延伸的辐射组件; 以及与所述至少一个辐射组件相关联的振动产生装置。 辐射模块是自清洁的,并且可以采取辐射模块或辐射传感器模块的形式。 还描述了将辐射源模块结合在流体处理系统中。

    Cleaning apparatus
    35.
    发明申请
    Cleaning apparatus 失效
    清洁装置

    公开(公告)号:US20040140434A1

    公开(公告)日:2004-07-22

    申请号:US10345951

    申请日:2003-01-17

    Inventor: Peter Ueberall

    CPC classification number: B08B9/023

    Abstract: A cleaning apparatus with cleaning rings for cleaning cylindrical bodies, preferably for the quartz cladding tubes in UV disinfection units, especially in UV disinfection sluices for waste water, which in addition to an axially parallel longitudinal movement over the outside surfaces perform an additional angularly limited and alternating rotational movement The object of the invention is a cleaning apparatus with cleaning rings for cleaning cylindrical bodies, preferably for the quartz cladding tubes in UV disinfection units, especially in UV disinfection sluices for waste water, which in addition to an axially parallel longitudinal movement over the outside surfaces perform an additional angularly limited and alternating rotational movement. According to the inventive idea the cleaning rings are moved slowly in an axially parallel way over the quartz cladding tubes, with the same moving additionally in an angularly limited and with suitable speed alternatingly about a rotational axis for reinforcing the cleaning performance and especially for the better penetration of troughs at places that are out of round. This manner of movement of the cleaning rings necessitates a considerably lower amount of mechanical complexity at virtually the same cleaning performance than would be necessary in a full and uninterrupted rotation of the cleaning rings. Compared with the usual rigid wiper rings which are moved back and forth in an axially parallel manner on the quartz cladding tubes without any rotational movement, the cleaning performance with the cleaning rings according to the inventive idea is considerably better.

    Abstract translation: 具有用于清洁圆柱体的清洁环的清洁装置,优选用于UV消毒单元中的石英包层管,特别是用于废水的UV消毒闸门,除了在外表面上的轴向平行的纵向运动之外,还执行额外的角度限制和 交替旋转运动本发明的目的是一种具有用于清洁圆柱体的清洁环的清洁装置,优选用于紫外线消毒单元中的石英包层管,特别是用于废水的紫外线消毒水闸,除了轴向平行的纵向运动 外表面执行额外的角度限制和交替的旋转运动。 根据本发明的想法,清洁环以轴向平行的方式缓慢地移动到石英包层管上方,并且以相对于旋转轴线交替地以角度限制和适当的速度另外移动,以增强清洁性能,特别是对于更好的 在不合适的地方渗透槽。 清洁环的这种移动方式在与清洁环的完全和不间断旋转所需的实质上相同的清洁性能下需要相当低的机械复杂性。 与在石英包层管上轴向平行移动而没有任何旋转运动的通常的刚性擦拭环相比,根据本发明构思的清洁环的清洁性能相当好。

    Fluid treatment system
    36.
    发明申请
    Fluid treatment system 失效
    流体处理系统

    公开(公告)号:US20030080071A1

    公开(公告)日:2003-05-01

    申请号:US10247317

    申请日:2002-09-20

    Abstract: There is described a fluid treatment system comprising an array of independent fluid treatment reactors. The reactors are arranged in a manner whereby a flow of fluid may be passed through the array in a substantially helical direction. The fluid treatment system is capable of treating large volumes of fluid (e.g., water) while requiring a relatively small foot print. In essence, the present fluid treatment system concentrates a relatively large number of radiation sources in a relatively small amount of space resulting in the ability to treat large volumes of fluid (e.g., water).

    Abstract translation: 描述了包括独立流体处理反应器阵列的流体处理系统。 反应器以这样的方式排列,使得流体流可以以基本螺旋方向通过阵列。 流体处理系统能够处理大量的流体(例如水),同时需要相对小的脚印。 本质上,本流体处理系统将相对大量的辐射源集中在相对少量的空间中,从而产生处理大量流体(例如水)的能力。

    Sectoral ring brush
    37.
    发明申请
    Sectoral ring brush 审中-公开
    部门环刷

    公开(公告)号:US20040216254A1

    公开(公告)日:2004-11-04

    申请号:US10428156

    申请日:2003-05-02

    Inventor: Peter Ueberall

    Abstract: A sectoral ring brush with inside trimming for keeping clear and/or cleaning cylindrical bodies, preferably quartz cladding tubes in UV disinfection units, especially in UV disinfection sluices for the disinfection of waste water, characterized in that the sectoral ring brush consists of sectoral elements whose trimming can be integrated prior to the installation in a housing, with the sectoral element being fastened individually or in a connected fashion, e.g. by connecting bridges on the circumference, in a ring-shaped housing.

    Abstract translation: 具有内部修整的扇形环刷,用于保持清洁和/或清洁圆柱形体,优选在UV消毒单元中的石英包层管,特别是用于消毒废水的UV消毒闸门中,其特征在于扇形环刷由扇形元件组成, 修整可以在安装在外壳中之前集成,其中扇形元件单独地或以连接方式固定,例如 通过在圆周上连接桥,在环形壳体中。

    Radiation source module
    38.
    发明申请
    Radiation source module 失效
    辐射源模块

    公开(公告)号:US20040211926A1

    公开(公告)日:2004-10-28

    申请号:US10846592

    申请日:2004-05-17

    CPC classification number: C02F1/325 A61L2/10 C02F2201/3227

    Abstract: The present invention provides a radiation source module for use in a fluid treatment system. In one embodiment, the module comprises: a substantially elongate first support member having a longitudinal first axis; and a first pair of radiation source assemblies extending from the first support member, each radiation source assembly comprising a radiation source; wherein the first pair of radiation source assemblies is oriented such that a second axis extending through a center point of each radiation source assembly is disposed at an angle with respect to the first axis. In another embodiment, the module comprises a substantially elongate first support member having a longitudinal first axis; and a first column of radiation source assemblies extending from the first support member, and a second column of radiation source assemblies extending from the first support member, each radiation source assembly comprising a radiation source;the first column of radiation source assemblies and the second column of radiation source assemblies disposed adjacent one another.

    Abstract translation: 本发明提供一种用于流体处理系统的辐射源模块。 在一个实施例中,模块包括:具有纵向第一轴线的基本细长的第一支撑构件; 以及从所述第一支撑构件延伸的第一对辐射源组件,每个辐射源组件包括辐射源; 其中所述第一对辐射源组件被定向成使得穿过每个辐射源组件的中心点的第二轴线相对于所述第一轴线成一定角度设置。 在另一个实施例中,模块包括具有纵向第一轴线的基本细长的第一支撑构件; 以及从第一支撑构件延伸的第一列辐射源组件和从第一支撑构件延伸的第二列辐射源组件,每个辐射源组件包括辐射源;第一列辐射源组件和第二列 的相邻的辐射源组件。

    Fluid treatment system and radiation sources module for use therein
    39.
    发明申请
    Fluid treatment system and radiation sources module for use therein 有权
    流体处理系统和辐射源模块

    公开(公告)号:US20040069954A1

    公开(公告)日:2004-04-15

    申请号:US10464849

    申请日:2003-06-19

    Abstract: A radiation source module comprising a support member, a radiation source assembly connected to the support member, the radiation source assembly comprising at least one elongate radiation source having a source longitudinal axis and a module-to-surface seal disposed on a first elongate surface of the module, the first elongate surface comprising a first longitudinal axis transverse to the source longitudinal axis, the seal operable to provide a substantially fluid tight seal between the first surface and a second surface which is adjacent to the first surface. A fluid treatment system employ the radiation source module is also described.

    Abstract translation: 辐射源模块,包括支撑构件,连接到所述支撑构件的辐射源组件,所述辐射源组件包括至少一个细长辐射源,所述辐射源组件具有源纵向轴线和模块到表面密封件,所述辐射源组件设置在第一细长表面上 所述模块,所述第一细长表面包括横向于所述源纵向轴线的第一纵向轴线,所述密封件可操作以在所述第一表面与邻近所述第一表面的第二表面之间提供基本上流体密封的密封。 还描述了采用辐射源模块的流体处理系统。

    Cleaning formulation and method of cleaning a surface
    40.
    发明申请
    Cleaning formulation and method of cleaning a surface 有权
    清洁配方和清洁表面的方法

    公开(公告)号:US20040048769A1

    公开(公告)日:2004-03-11

    申请号:US10659309

    申请日:2003-09-11

    CPC classification number: C11D3/364 C11D3/042 C11D3/1266 C11D3/323 C11D17/003

    Abstract: A cleaning formulation comprising a cleaning agent, a particulate clay material and an aqueous carrier. The formulation has a pH less than about 4.0 and is characterized by at least a 90% reduction in viscosity at 25null C. at a shear rate of up to about 0.10 snull1. The cleaning formulation is thixotropic and has a highly desirable combination of acid stability, temperature stability, electrolyte stability and ultraviolet radiation stability.

    Abstract translation: 一种清洁制剂,其包含清洁剂,颗粒状粘土材料和水性载体。 该制剂具有小于约4.0的pH,并且其特征在于在高达约0.10s -1的剪切速率下在25℃下至少降低90%的粘度。 清洗配方是触变性的,具有很好的酸稳定性,温度稳定性,电解液稳定性和紫外线辐射稳定性的组合。

Patent Agency Ranking