公开(公告)号：NL1035775A1

公开(公告)日：2009-02-10

申请号：NL1035775

申请日：2008-07-31

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER FREDERIK ,  BANINE VADIM YEVGENYEVICH ,  HERPEN MAARTEN MARINUS JOHANNES

IPC: H01L21/027 ,  B08B3/08

公开(公告)号：SG133550A1

公开(公告)日：2007-07-30

申请号：SG2006088553

申请日：2006-12-19

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA

Abstract: A lithographic apparatus is disclosed that comprises a template holder configured to hold a plurality of imprint templates, and a substrate holder configured to hold a substrate, the template holder being located beneath the substrate holder.