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31.发明申请公开(公告)号：US20190003981A1
公开(公告)日：2019-01-03
申请号：US16102178
申请日：2018-08-13
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny Van Voorst , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Sietse Thijmen Van Der Post
IPC: G01N21/88 , G03F7/20 , G01N21/95 , G01N21/956 , H05G2/00
CPC classification number: G01N21/8806 , G01N21/9501 , G01N2021/95676 , G03F7/70616 , G03F7/7065 , H05G2/00 , H05G2/008
Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.
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32.发明授权公开(公告)号：US10133192B2
公开(公告)日：2018-11-20
申请号：US15494056
申请日：2017-04-21
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Simon Gijsbert Josephus Mathijssen , Sander Bas Roobol , Nan Lin
Abstract: A structure of interest (T) is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector (19, 274, 908, 1012). A processor (PU) calculates a property such as linewidth (CD) or overlay (OV), for example by simulating (S16) interaction of radiation with a structure and comparing (S17) the simulated interaction with the detected radiation. The method is modified (S14a, S15a, S19a) to take account of changes in the structure which are caused by the inspection radiation. These changes may be for example shrinkage of the material, or changes in its optical characteristics. The changes may be caused by inspection radiation in the current observation or in a previous observation.
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公开(公告)号：US10101675B2
公开(公告)日：2018-10-16
申请号：US15444765
申请日：2017-02-28
Applicant: ASML Netherlands B.V.
Inventor： Alessandro Polo , Simon Gijsbert Josephus Mathijssen
Abstract: Disclosed is a metrology apparatus and method for measuring a structure formed on a substrate by a lithographic process. The metrology apparatus comprises an illumination system operable to provide measurement radiation comprising a plurality of wavelengths; and a hyperspectral imager operable to obtain a hyperspectral representation of a measurement scene comprising the structure, or a part thereof, from scattered measurement radiation subsequent to the measurement radiation being scattered by the structure.
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公开(公告)号：US10048596B2
公开(公告)日：2018-08-14
申请号：US15585072
申请日：2017-05-02
Applicant: ASML Netherlands B.V.
Inventor： Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen
Abstract: An method for generating illuminating radiation in an illumination apparatus for use in an inspection apparatus for use in lithographic processes is described. A driving radiation beam is provided that comprises a plurality of radiation pulses. The beam is split into first and second pluralities of driving radiation pulses. Each plurality of driving radiation pulses has a controllable characteristic. The first and second pluralities may be used to generate an illuminating radiation beam with an output wavelength spectrum. The first and second controllable characteristics are controlled so as to control first and second portions respectively of the output wavelength spectrum of the illuminating radiation beam.
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35.发明申请公开(公告)号：US20180073992A1
公开(公告)日：2018-03-15
申请号：US15683216
申请日：2017-08-22
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny VAN VOORST , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Sietse Thijmen Van Der Post
CPC classification number: G01N21/8806 , G01N21/9501 , G01N2021/95676 , G03F7/70616 , G03F7/7065 , H05G2/00 , H05G2/008
Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.
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Patent Agency Ranking
公开(公告)号：US20170322497A1
公开(公告)日：2017-11-09
申请号：US15585072
申请日：2017-05-02
Applicant: ASML Netherlands B.V.
Inventor： Nan LIN , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen
CPC classification number: G03F7/70575 , G02F1/353 , G02F2001/354 , G02F2201/16 , G03F7/2004 , G03F7/70033 , G03F7/70625 , G03F7/70633 , G03F2007/2067 , G21K5/04 , H05G2/00
Abstract: An method for generating illuminating radiation in an illumination apparatus for use in an inspection apparatus for use in lithographic processes is described. A driving radiation beam is provided that comprises a plurality of radiation pulses. The beam is split into first and second pluralities of driving radiation pulses. Each plurality of driving radiation pulses has a controllable characteristic. The first and second pluralities may be used to generate an illuminating radiation beam with an output wavelength spectrum. The first and second controllable characteristics are controlled so as to control first and second portions respectively of the output wavelength spectrum of the illuminating radiation beam.
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公开(公告)号：US20170255104A1
公开(公告)日：2017-09-07
申请号：US15444765
申请日：2017-02-28
Applicant: ASML Netherlands B.V.
Inventor： Alessandro POLO , Simon Gijsbert Josephus Mathijssen
CPC classification number: G03F9/7046 , G01B11/00 , G01B11/02 , G01B11/24 , G01B11/272 , G01B11/303 , G01B2210/56 , G01N21/9501 , G01N21/956 , G02B2207/129 , G03F7/70625 , G03F7/70633 , G03F7/70775 , G03F7/7085 , G03F9/7069 , G03F9/7088
Abstract: Disclosed is a metrology apparatus and method for measuring a structure formed on a substrate by a lithographic process. The metrology apparatus comprises an illumination system operable to provide measurement radiation comprising a plurality of wavelengths; and a hyperspectral imager operable to obtain a hyperspectral representation of a measurement scene comprising the structure, or a part thereof, from scattered measurement radiation subsequent to the measurement radiation being scattered by the structure.
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38.发明授权Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method 有权标记位置测量装置和方法，光刻设备和装置制造方法公开(公告)号：US09551939B2
公开(公告)日：2017-01-24
申请号：US14428565
申请日：2013-09-23
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef , Stanley Drazkiewicz , Justin Lloyd Kreuzer , Gerrit Johannes Nijmeijer
CPC classification number: G03F7/70141 , G01B11/14 , G03F9/7069 , G03F9/7088
Abstract: An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
Abstract translation: 一种用于测量标记位置的装置，该装置包括用于将辐射引导到装置的光瞳上的照明装置，所述照明装置包括照明源，以提供基本上相等偏振的多波长辐射和波片，以改变 依赖于波长的辐射的极化，使得提供不同极化的辐射; 使用由照射装置提供的辐射在扫描方向上扫描横过标记的辐射来将辐射引导到标记上的目的; 辐射处理元件，用于处理由所述标记衍射并由所述物镜接收的辐射; 以及检测装置，用于检测在扫描期间由辐射处理元件输出的辐射强度的变化，并且根据检测到的变化来计算至少第一测量方向上的标记的位置。
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公开(公告)号：US12189314B2
公开(公告)日：2025-01-07
申请号：US18035008
申请日：2021-11-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus Goorden , Simon Gijsbert Josephus Mathijssen , Leendert Jan Karssemeijer , Manouk Rijpstra , Ralph Brinkhof , Kaustuve Bhattacharyya
Abstract: A method for a metrology process, the method includes obtaining first measurement data relating to a first set of measurement conditions and determining a first measurement recipe based on the first measurement data. At least one performance indicator is determined from one or more components of the first measurement data obtained from a component analysis or statistical decomposition. Alternatively, at least one performance indicator is determined from a comparison of one or more first measurement values relating to the first measurement recipe and one or more second measurement values relating to a second measurement recipe, where second measurement recipe is different to the first measurement data and relates a second set of measurement conditions, the second set of measurement conditions being different to the first set of measurement conditions.
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公开(公告)号：US12189305B2
公开(公告)日：2025-01-07
申请号：US18004555
申请日：2021-05-27
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Patricius Aloysius Jacobus Tinnemans , Arie Jeffrey Den Boef , Kaustuve Bhattacharyya , Samee Ur Rehman
Abstract: Disclosed is a method of improving a measurement of a parameter of interest. The method comprises obtaining metrology data comprising a plurality of measured values of the parameter of interest, relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of said one or more targets and a measurement condition used to measure that target and asymmetry metric data relating to asymmetry for said one or more targets. A respective relationship is determined for each of said measurement combinations relating a true value for the parameter of interest to the asymmetry metric data, based on an assumption that there is a common true value for the parameter of interest over said measurement combinations. These relationships are used to improve a measurement of the parameter of interest.
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