A SYSTEM, A METHOD AND A COMPUTER PROGRAM PRODUCT FOR CONTROLLING A GROUP OF ACTUATOR ARRAYS FOR PRODUCING A PHYSICAL EFFECT
    31.
    发明公开
    A SYSTEM, A METHOD AND A COMPUTER PROGRAM PRODUCT FOR CONTROLLING A GROUP OF ACTUATOR ARRAYS FOR PRODUCING A PHYSICAL EFFECT 有权
    系统,方法和计算机程序产品用于控制致动器阵列的一组用于生成物理效应

    公开(公告)号:EP2856769A1

    公开(公告)日:2015-04-08

    申请号:EP13729476.5

    申请日:2013-05-22

    CPC classification number: G05B15/02 H04R1/005

    Abstract: A system which controls a group of multiple arrays of actuator elements, each of the actuator elements including a moving element which moves between a first and a second extreme positions; the system including: a controller, configured to generate control commands for at least one array of the multiple arrays in each individual cycle out of a series of sampling cycles, based on obtained information; and (b) an interface configured to transfer the control commands to the at least one array, thereby resulting in releasing from the first extreme position during the intended cycle of at least one moving element that is included in the at least one array; wherein release of all moving elements of at least one restrained array out of the multiple arrays is prevented during the intended cycle.

    Abstract translation: 哪个控制一组致动器元件,每一个都包括移动元件,其第一和第二极限位置之间移动致动器元件的多个阵列的系统; 该系统包括:控制器,配置为生成用于所述多个阵列中的至少一个阵列中的每个单独的循环了一系列采样周期,基于所获得的信息的控制命令; 和(b)到接口,配置为控制命令传送到所述至少一个阵列,由此在至少一个移动元件的预定周期期间从所述第一极限位置释放并包括所述至少一个阵列中得到的; 至少一个约束阵列的所有移动元件出多个阵列的worin释放预定循环期间被阻止。

    MICROSYSTEM AND MANUFACTURING METHOD
    32.
    发明公开

    公开(公告)号:EP4201872A1

    公开(公告)日:2023-06-28

    申请号:EP21217618.4

    申请日:2021-12-23

    Abstract: The present disclosure provides a method for use in manufacturing a microsystem, the method comprising forming an array of pillars in a thickness of a substrate, an area surrounding the array of pillars defining a cavity in the substrate; transforming at least some of the pillars into a sacrificial material; and depositing a sacrificial material layer using a non-conformal deposition process to fill up the cavity while enclosing hollow channels between the pillars of the pillars array, thereby obtaining a cavity filled with an etching facilitator arrangement.

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