公开(公告)号：US11913776B2

公开(公告)日：2024-02-27

申请号：US17645200

申请日：2021-12-20

Applicant: Applied Materials, Inc.

Inventor： Yangyang Sun ,  Jinxin Fu ,  Ludovic Godet

IPC: G01B11/26

CPC classification number: G01B11/26

Abstract: Embodiments described herein provide for devices and methods of measuring a pitch P of optical device structures and an orientation angle ϕ of the optical device structures. One embodiment of the system includes an optical arm coupled to an arm actuator. The optical arm includes a light source. The light source emits a light path operable to be diffracted to the stage. The optical arm further includes a first beam splitter and a second beam splitter positioned in the light path. The first beam splitter directs the light path through a first lens and the second beam splitter directs the light path through a first dove prism and a second lens. The optical arm further includes a first detector operable to detect the light path from the first lens and second detector operable to detect the light path from the second lens.

公开(公告)号：US11802791B2

公开(公告)日：2023-10-31

申请号：US17456421

申请日：2021-11-24

Applicant: Applied Materials, Inc.

Inventor： Jinxin Fu ,  Kazuya Daito ,  Ludovic Godet

IPC: G01J1/04 ,  G01J1/08

CPC classification number: G01J1/0459 ,  G01J1/0425 ,  G01J1/08

Abstract: A method of optical device metrology is provided. The method includes providing a first type of light into a first optical device during a first time period; measuring a quantity of the first type of light transmitted from a first location on the top surface or the bottom surface during the first time period; coating at least a portion of an edge of the one or more edges with a first coating of optically absorbent material during a second time period that occurs after the first time period; providing the first type of light into the first optical device during a third time period that occurs after the second time period; and measuring a quantity of the first type of light transmitted from the first location on the top surface or the bottom surface during the third time period.

公开(公告)号：US11193198B2

公开(公告)日：2021-12-07

申请号：US16706113

申请日：2019-12-06

Applicant: Applied Materials, Inc.

Inventor： Joseph C. Olson ,  Ludovic Godet ,  Rutger Meyer Timmerman Thijssen ,  Morgan Evans ,  Jinxin Fu

IPC: G03F7/20 ,  C23C14/22 ,  G02B5/18 ,  G03F7/00 ,  G03F7/16 ,  F21V8/00

Abstract: Embodiments of the disclosure relate to systems and methods for forming devices on a substrate. For example, a method for forming devices on a substrate can include projecting one or more ion beams from one or more ion beam chambers to form one or more devices on a first surface of a substrate and projecting one or more ion beams from one or more ion beam chambers to form one or more devices on a second surface of a substrate. In these embodiments, the first surface and the second surface are on opposite sides of the substrate. Therefore, the ion beams can form the devices on both sides of the substrate.

公开(公告)号：US10705268B2

公开(公告)日：2020-07-07

申请号：US16120733

申请日：2018-09-04

Applicant: Applied Materials, Inc.

Inventor： Jinxin Fu ,  Ludovic Godet ,  Wayne McMillan

IPC: B29D11/00 ,  G02B5/18 ,  G03F7/00

Abstract: Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device. In one embodiment, the method includes forming a first layer on a substrate, and the first layer has a first refractive index. The method further includes pressing a stamp having a pattern onto the first layer, and the pattern of the stamp is transferred to the first layer to form a patterned first layer. The method further includes forming a second layer on the patterned first layer by spin coating, and the second layer has a second refractive index greater than the first refractive index. The second layer having the high refractive index is formed by spin coating, leading to improved nanoparticle uniformity in the second layer.