New fungicidal cpds. used for plant protection

    公开(公告)号:DE4407021A1

    公开(公告)日:1995-09-07

    申请号:DE4407021

    申请日:1994-03-03

    Applicant: BASF AG

    Abstract: Carbamoyl carboxylic acid amide derivs. of formula (I) and their salts are new. R1 = R or N=CW1W2: R1 = 1-8C alkyl, 2-8C alkenyl, 2-8C alkynyl, 3-7C cycloalkyl or 3-7C cycloalkenyl, A', aryl or heteroaryl (all opt. substd.); A' = a non-aromatic 4-8 membered ring (opt. contg. 1 or 2 additional heteroatoms); W1 = R; W2 = H or R; R2, R5 = H, 1-8C alkyl or 3-7C cycloalkyl (these last 2 gps. each opt. partially or completely halogenated); R3 = 1-8C alkyl, 3-7C cycloalkyl (opt. substd.); R4 = H or R3; or CR3R4 = A'; X = independently 1-8C alkyl, 2-8C alkenyl, 3-7C cycloalkyl or 3-7C cycloalkenyl (all opt. substd.); m = 0-2; A = CY1Y2; Y1 = 3-7C cycloalkyl or 3-7C cycloalkenyl (both opt. substd.); Y2 = 1-8C alkyl, 2-8C alkenyl or aryl (all opt. substd.), Y1 or H; R6 = aryl or heteroaryl (both opt. substd.).

    33.
    发明专利
    未知

    公开(公告)号:ES2066052T3

    公开(公告)日:1995-03-01

    申请号:ES90113631

    申请日:1990-07-17

    Applicant: BASF AG

    Abstract: Cinnamic acid esters of the general formula I in which the dotted bond represents a single or double bond and the substituents have the following meanings: R is hydrogen or fluorine, R is halogen, R is hydrogen, halogen or C1-C4-alkyl, R is hydrogen, optionally substituted C1-C6-alkyl, C3-C6-alkenyl, C3-C6-alkynyl or benzyl, and X is oxygen or sulphur, preparation process, and agents containing them.

    34.
    发明专利
    未知

    公开(公告)号:DE59008167D1

    公开(公告)日:1995-02-16

    申请号:DE59008167

    申请日:1990-05-07

    Applicant: BASF AG

    Abstract: N-phenyltetrahydrophthalimides of general formula I in which the substituents and the index have the following meanings: R is C1-C4-alkyl; n is 1 or 2; R is hydrogen or fluorine; R is halogen; R is hydrogen or C1-C4-alkyl; R is hydrogen or optionally substituted C1-C8-alkoxycarbonyl, C3-C6- alkenyloxycarbonyl or C3-C6-alkynyloxycarbonyl; X and Y represent oxygen or sulphur; A represents optionally substituted C2-C3-alkylene, where R does not represent hydrogen when X and Y denote oxygen, processes for their preparation, and herbicidal compositions containing them.

    35.
    发明专利
    未知

    公开(公告)号:AT115583T

    公开(公告)日:1994-12-15

    申请号:AT90113631

    申请日:1990-07-17

    Applicant: BASF AG

    Abstract: Cinnamic acid esters of the general formula I in which the dotted bond represents a single or double bond and the substituents have the following meanings: R is hydrogen or fluorine, R is halogen, R is hydrogen, halogen or C1-C4-alkyl, R is hydrogen, optionally substituted C1-C6-alkyl, C3-C6-alkenyl, C3-C6-alkynyl or benzyl, and X is oxygen or sulphur, preparation process, and agents containing them.

    36.
    发明专利
    未知

    公开(公告)号:DE59007091D1

    公开(公告)日:1994-10-20

    申请号:DE59007091

    申请日:1990-01-13

    Applicant: BASF AG

    Abstract: N-(Phenyl)-tetrahydroindazole derivatives of the general formula Ia and Ib Ia Ib where R1 is halogen; R2 is C1-C6-alkoxycarbonyl-C3-C5-alkenyl or C1-C3-alkyl which is substituted in the 1- or 2-position by C1-C6-alkoxycarbonyl or a 5- or 6-membered saturated or monounsaturated heterocycle which contains one oxygen or sulfur as heteroatom and can be substituted by from one to four C1-C4-alkyls, and R3 is C2-C7-alkyl, C3-C6-alkenyl, C3-C6-alkynyl, C1-C6-alkoxycarbonyl-C3-C5-alkenyl of C1-C3-alkyl which is substituted in the 1- or 2-position by C1-C6-alkoxycarbonyl or a 5- or 6-membered saturated or monounsaturated heterocycle which contains one oxygen or sulfur as heteroatom and can be substituted by from one to four C1-C4-alkyls, their manufacture and their use.

    40.
    发明专利
    未知

    公开(公告)号:DE3782141D1

    公开(公告)日:1992-11-12

    申请号:DE3782141

    申请日:1987-11-19

    Applicant: BASF AG

    Abstract: (A) 1-Arylsulphonyl-3-azinyl -(thio)ureas of formula (I) and their salts are new: A = 2-R1-5-R3-phenyl (opt. substd. by R2), 3-R1-2-thienyl or 2-R1-3-thienyl; R1 = H, halogen, CN, NO2, 1-4C haloalkyl, 1-4C alkyl, 1-4C alkoxy, COR4, SO2R5 or S(O)mR6; R2 = halogen, Me, Et, OMe or OEt; R3 = H, halogen, NO2 or OMe; R4 = H, 1-4C alkyl, 1-5C alkoxy, 3-5C alkenyloxy, 3-5C alkynyloxy, 1-5C alkylthio, OPh, OCH2Ph, or 1-5C alkoxy substd. by 1-3 halogen atoms or 1-3C alkoxy; R5 = OPh, OCH2Ph or 1-4C alkoxy opt. substd. by 1-3 halogen atoms; R6 = 1-4C alkyl; m = 0-2; B = O or S; D = H or 1-3C alkyl; X = 1-3C alkyl, haloalkyl, alkoxy, haloalkoxy or alkylthio, or halogen; Y = CH or N; Z = N-bonded azolyl.

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