公开(公告)号：JPH02219059A

公开(公告)日：1990-08-31

申请号：JP32160189

申请日：1989-12-13

Applicant: BASF AG

Inventor： GEERUHARUTO BAUAA ,  GEERUHARUTO HOFUMAN ,  AKUSERU ZANAA ,  FURIIDORIHI ZAITSU

IPC: G03F7/004 ,  G03F7/033 ,  H05K3/06

Abstract: PURPOSE: To ensure satisfactory stability in a rolled state even at the time of storage of a dry film resist over a long period of time by allowing a specified N-vinylamide copolymer or a polyamide additive to exist in a photopolymerizable recording layer. CONSTITUTION: The top of a carrier having dimensional stability is coated with a photopolymerizable recording layer developable with an aq. alkali soln. and contg. a polymer binder, at least one kind of ethylenic unsatd. photopolymerizable compd. and at least one kind of photoinitiator or further contg. other additives and/or auxiliaries. In the recording layer, an N-vinylamide homopolymer, an N-vinylamide copolymer contg. >=50mol% N-vinylamide units in a polymerized state or a polyamide additive having 1,500-300,000g/mol mol.wt. exists by 0.2-6wt.% of the total amt. of the recording layer. Laminating is facilitated and stability in a rolled state can be improved even at the time of storage of a dry film resist over a long period of time.

公开(公告)号：JPH02214710A

公开(公告)日：1990-08-27

申请号：JP32412689

申请日：1989-12-15

Applicant: BASF AG

Inventor： BIRUGITSUTO POTSUTOHOFUUKAARU ,  KARIN SUPERURINGU ,  AKUSERU ZANAA

IPC: A61K8/00 ,  A61K8/04 ,  A61K8/81 ,  A61Q5/06 ,  C08F26/10 ,  C08F220/10 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C08F226/10 ,  C08L33/06 ,  C08L39/06 ,  C09D133/06 ,  C09D139/06

公开(公告)号：JPS63230601A

公开(公告)日：1988-09-27

申请号：JP5387688

申请日：1988-03-09

Applicant: BASF AG

Inventor： ROOGAA KURIMETSUSHIYU ,  ADORUFU PARUKU ,  AKUSERU ZANAA ,  BUINFURIITO ANGERAA ,  HANSU TEEOBARUTO ,  RAINAA BETSUKAA ,  PEETAA HOOFUMAISUTAA ,  KURISUTOFU KIYUNASUTO ,  BERUNTO BUORUFU

IPC: A01N25/10 ,  A01N25/14 ,  A01N25/18

公开(公告)号：JPS61156116A

公开(公告)日：1986-07-15

申请号：JP28807785

申请日：1985-12-23

Applicant: BASF AG

Inventor： AKUSERU ZANAA ,  ARUBERUTO ERUTSUAA ,  GUNARU SHIYORUNIKU

IPC: C08F220/00 ,  C08F26/00 ,  C08F220/04 ,  C08F220/06 ,  C08F226/06 ,  G03F7/004 ,  G03F7/032 ,  G03F7/033

公开(公告)号：JPS6174575A

公开(公告)日：1986-04-16

申请号：JP19966585

申请日：1985-09-11

Applicant: Basf Ag

Inventor： HANSU HERUMUUTO GERUTSU ,  RORUFU RUNGERUSUHAUZEN ,  SHIYUTEFUAN MARUSHINOUSUKI ,  AKUSERU ZANAA

IPC: C12N1/02 ,  C12N1/14 ,  C12N1/20 ,  C12P1/00 ,  C12P19/06

CPC classification number: C12N1/02 ,  C12P1/00 ,  C12P19/06

公开(公告)号：JPS60222128A

公开(公告)日：1985-11-06

申请号：JP3673385

申请日：1985-02-27

Applicant: BASF AG

Inventor： HANSU YOOZEFU SHIYUTERUTSUERU ,  AKUSERU ZANAA ,  PEETAA NOIMAN

IPC: C08F26/00 ,  B01D53/22 ,  B01D69/00 ,  B01D71/28 ,  B01D71/44 ,  C01B13/02 ,  C08F8/42 ,  C08F20/06 ,  C08F26/06 ,  C08F30/00 ,  C08F30/04 ,  C08J5/18 ,  H01M4/60 ,  H01M4/86 ,  H01M8/00

公开(公告)号：JPS60216805A

公开(公告)日：1985-10-30

申请号：JP3898885

申请日：1985-03-01

Applicant: BASF AG

Inventor： HANSU YOOZEFU SHIYUTERUTSUERU ,  AKUSERU ZANAA

IPC: C08J5/22 ,  B01D69/00 ,  B01D71/26 ,  B01D71/66 ,  B01D71/72 ,  C01B13/02 ,  C01G1/00 ,  C02F1/58 ,  C08F8/30 ,  C08G65/00 ,  C08G67/00 ,  C08G75/20 ,  C08J5/18 ,  C08L71/00 ,  C08L79/08 ,  C08L81/06

公开(公告)号：JPS5790019A

公开(公告)日：1982-06-04

申请号：JP15400181

申请日：1981-09-30

Applicant: BASF AG

Inventor： CHIYUNNII CHIYAN ,  AKUSERU ZANAA ,  SHIYUTEFUAN MARUCHINOBUSUKII

IPC: C12N11/08 ,  C08J3/12 ,  C08J9/28 ,  C08J9/36 ,  C12N11/04