公开(公告)号：US09107637B2

公开(公告)日：2015-08-18

申请号：US13511896

申请日：2011-01-21

Applicant: Chidane Ouchi ,  Naoki Kohara

Inventor： Chidane Ouchi ,  Naoki Kohara

IPC: A61B6/00 ,  A61B6/06 ,  G21K1/06 ,  A61B6/02

CPC classification number: A61B6/484 ,  A61B6/027 ,  A61B6/06 ,  A61B6/4291 ,  G21K1/06 ,  G21K2207/005

Abstract: There is provided an X-ray imaging apparatus which images a specimen. The X-ray imaging apparatus comprises: an X-ray source; a diffraction grating configured to diffract an X-ray from the X-ray source; an X-ray detector configured to detect the X-ray diffracted by the diffraction grating; and a calculator configured to calculate phase information of the specimen on the basis of an intensity distribution of the X-ray detected by the X-ray detector, wherein the calculator obtains a spatial frequency spectrum from the plural intensity distributions, and calculates the phase information from the obtained spatial frequency spectrum.

Abstract translation: 提供了对样本进行成像的X射线成像装置。 X射线成像装置包括：X射线源; 构造成从X射线源衍射X射线的衍射光栅; X射线检测器，被配置为检测由衍射光栅衍射的X射线; 以及计算器，被配置为基于由所述X射线检测器检测到的X射线的强度分布来计算所述样本的相位信息，其中所述计算器从所述多个强度分布中获得空间频谱，并且计算所述相位信息 从获得的空间频谱。

公开(公告)号：US08995613B2

公开(公告)日：2015-03-31

申请号：US13518233

申请日：2011-02-14

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: A61B6/00 ,  G21K1/06 ,  G01N23/04 ,  G01N23/20

CPC classification number: G21K1/06 ,  A61B6/484 ,  G01N23/046 ,  G01N23/20075 ,  G01N2223/064 ,  G01N2223/419 ,  G21K2207/005

Abstract: An X-ray imaging apparatus which takes an image of an object to be detected, comprises: a first grating to form a periodic bright-dark pattern by a Talbot effect, based on an X-ray from an X-ray source; a second grating, disposed at a position where the bright-dark pattern is formed, to block a part of the bright-dark pattern; a detector to detect an X-ray intensity distribution of the X-ray which passed through the second grating; and a calculator to calculate phase information of the X-ray based on the detected X-ray intensity distribution, wherein the second grating includes a first region having a first blocking pattern and a second region having a second blocking pattern, and a direction in which the first blocking pattern blocks a bright section of the bright-dark pattern is different from a direction in which the second blocking pattern blocks the bright section of the bright-dark pattern.

Abstract translation: 拍摄被检测物体的图像的X射线摄像装置包括：基于来自X射线源的X射线，通过Talbot效应形成周期性明暗图案的第一光栅; 设置在形成明暗图案的位置处的第二光栅，以阻挡亮暗图案的一部分; 用于检测通过第二光栅的X射线的X射线强度分布的检测器; 以及计算器，用于基于检测到的X射线强度分布来计算X射线的相位信息，其中第二光栅包括具有第一阻挡图案的第一区域和具有第二阻挡图案的第二区域，以及其中 第一阻挡图案阻挡亮暗图案的明亮部分不同于第二遮挡图案阻挡亮暗图案的亮部的方向。

公开(公告)号：US20120281217A1

公开(公告)日：2012-11-08

申请号：US13511896

申请日：2011-01-21

Applicant: Chidane Ouchi ,  Naoki Kohara

Inventor： Chidane Ouchi ,  Naoki Kohara

IPC: G01T1/36 ,  G01N21/59

CPC classification number: A61B6/484 ,  A61B6/027 ,  A61B6/06 ,  A61B6/4291 ,  G21K1/06 ,  G21K2207/005

Abstract: There is provided an X-ray imaging apparatus which images a specimen. The X-ray imaging apparatus comprises: an X-ray source; a diffraction grating configured to diffract an X-ray from the X-ray source; an X-ray detector configured to detect the X-ray diffracted by the diffraction grating; and a calculator configured to calculate phase information of the specimen on the basis of an intensity distribution of the X-ray detected by the X-ray detector, wherein the calculator obtains a spatial frequency spectrum from the plural intensity distributions, and calculates the phase information from the obtained spatial frequency spectrum.

Abstract translation: 提供了对样本进行成像的X射线成像装置。 X射线成像装置包括：X射线源; 构造成从X射线源衍射X射线的衍射光栅; X射线检测器，被配置为检测由衍射光栅衍射的X射线; 以及计算器，被配置为基于由所述X射线检测器检测到的X射线的强度分布来计算所述样本的相位信息，其中所述计算器从所述多个强度分布中获得空间频谱，并且计算所述相位信息 从获得的空间频谱。

公开(公告)号：US20100190115A1

公开(公告)日：2010-07-29

申请号：US12280926

申请日：2007-02-28

Applicant: Seima Kato ,  Chidane Ouchi

Inventor： Seima Kato ,  Chidane Ouchi

IPC: G03F7/20 ,  G01B11/02 ,  G03B27/54

CPC classification number: G03F7/706

Abstract: A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/λ where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measurement light, and m is an integer except for 0.

Abstract translation: 测量装置包括布置在目标光学系统的物平面上并具有透射测量光的窗口的第一掩模，具有用于减小测量光的相干性的反射表面的第二掩模和配置在所述衍射光栅中的衍射光栅 通过第一掩模和目标光学系统，将衍射光栅与目标光学系统的像面之间的距离Lg分别满足Lg = m·Pg2 /λ 其中Pg是衍射光栅的光栅间距，λ是测量光的波长，m是除0之外的整数。

公开(公告)号：US20100177323A1

公开(公告)日：2010-07-15

申请号：US12683141

申请日：2010-01-06

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: G01B9/02

CPC classification number: G03F7/706 ,  G01J9/02 ,  G01J9/0215

Abstract: A wavefront-aberration-measuring device measures wavefront aberration of a to-be-tested optical system and includes a diffraction grating that splits light transmitted through the optical system, a detecting unit that detects interference fringes produced by beams of the split light, an arithmetic unit that calculates the wavefront aberration from the detected interference fringes, an image-side mask insertable into and retractable from an image plane of the optical system, and an illuminating unit that incoherently illuminates the image-side mask. The image-side mask has an aperture with a diameter larger than λ/2NA, where λ denotes a wavelength of the illuminating unit and NA denotes a numerical aperture of the to-be-tested optical system. The arithmetic unit calculates the wavefront aberration of the optical system from the interference fringes detected with the image-side mask being retracted from the image plane and the interference fringes detected with the image-side mask being in the image plane.

Abstract translation: 波前像差测量装置测量待测光学系统的波前像差，并包括分离透过光学系统的光的衍射光栅，检测由分束光束产生的干涉条纹的检测单元，算术 从检测到的干涉条纹计算波前像差的单元，可插入光学系统的像面并从光学系统的图像平面缩回的图像侧掩模，以及不相干地照射图像侧掩模的照明单元。 图像侧掩模具有直径大于λ/ 2NA的孔径，其中λ表示照明单元的波长，NA表示被测试光学系统的数值孔径。 算术单元根据从图像平面缩回的图像侧掩模检测到的干涉条纹和由图像侧掩模在图像平面中检测到的干涉条纹来计算光学系统的波前像差。

公开(公告)号：US20090268188A1

公开(公告)日：2009-10-29

申请号：US12419194

申请日：2009-04-06

Applicant: Seima Kato ,  Chidane Ouchi

Inventor： Seima Kato ,  Chidane Ouchi

IPC: G03B27/72

CPC classification number: G03F7/706 ,  G03F7/70066

Abstract: An exposure apparatus includes an illumination optical system. The illumination optical system includes a first member configured to define an illuminated region of a reflective mask having a pattern to be projected onto a substrate; a second member configured to define an illuminated region in which a measurement pattern used in measuring wavefront aberration of a projection optical system is illuminated, the second member being able to be inserted into and removed from an optical path of the illumination optical system; and a condensing mirror configured to condense light from the first member on the pattern to be projected onto the substrate and light from the second member on the measurement pattern. The illuminated region defined by the second member is smaller than the illuminated region defined by the first member.

Abstract translation: 曝光装置包括照明光学系统。 所述照明光学系统包括：第一构件，被配置为限定具有要投影到衬底上的图案的反射掩模的照明区域; 第二构件，被配置为限定照明区域，其中用于测量投影光学系统的波前像差的测量图案被照射，所述第二构件能够插入到所述照明光学系统的光路中并从所述照明光学系统的光路中移除; 以及会聚镜，其被配置为将来自第一构件的光在要投影到衬底上的图案上聚集，并且来自第二构件的光在测量图案上。 由第二构件限定的照明区域小于由第一构件限定的照明区域。

公开(公告)号：US07106452B2

公开(公告)日：2006-09-12

申请号：US09934713

申请日：2001-08-23

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: G07B9/02

CPC classification number: G01M11/0271 ,  G01M11/005

Abstract: A wavefront measuring device is disclosed which is capable of measuring an average wavefront and the retardation of a lens including birefringence. The measuring device includes a light source for emitting a linearly polarized light; a polarization orientation setting member for switching the polarization orientation of the light flux from the light source between at least two orientations; a light synthesizing member for synthesizing the light flux after passing the light fluxes through an object to be measured and a reference surface; an analyzer for switching the polarization orientation so as to pass only the same polarized component as the polarized light incident on the object to be measured; an image pickup member for detecting interference information of the light flux obtained through the analyzer; and a calculating section for calculating the average wavefront and/or the retardation of the object to be measured.

公开(公告)号：US06721056B1

公开(公告)日：2004-04-13

申请号：US09638885

申请日：2000-08-16

Applicant: Akihiro Nakauchi ,  Chidane Ouchi

Inventor： Akihiro Nakauchi ,  Chidane Ouchi

IPC: G01B902

CPC classification number: G01B11/24

Abstract: An apparatus for measuring the surface shape of the surface to be measured of an optical system to be measured includes a rotary stage holding the optical system to be measured thereon and rotatable about the optical axis of the optical system to be measured, a device for detecting the rotation azimuth of the rotary stage, an irradiating optical system for sequentially applying a coherent light beam to the plurality of measuring diameter positions of the surface to be measured of the optical system to be measured held on the rotary stage, a light receiving element for detecting the reflected light of the coherent light beam from the surface to be measured as an interference signal, and a calculating system for effecting the measurement of the surface shape of the surface to be measured on the basis of the result of the detection of the interference signal at each of the plurality of measuring diameter positions of the surface to be measured and the result of the detection by the rotation azimuth detecting device.

Abstract translation: 用于测量被测光学系统的待测表面的表面形状的装置包括：旋转台，其保持要测量的光学系统并围绕待测光学系统的光轴旋转;检测装置 旋转台的旋转方位角;照射光学系统，用于依次将相干光束施加到被保持在旋转台上的待测量光学系统的待测量表面的多个测量直径位置;光接收元件， 从所测量的表面检测相干光束的反射光作为干扰信号;以及计算系统，用于根据干扰检测的结果对待测表面的表面形状进行测量 在要测量的表面的多个测量直径位置中的每一个处的信号以及通过旋转检测的结果 方位检测装置。

公开(公告)号：US06322220B1

公开(公告)日：2001-11-27

申请号：US08991442

申请日：1997-12-16

Applicant: Naoto Sano ,  Chidane Ouchi

Inventor： Naoto Sano ,  Chidane Ouchi

IPC: G02B504

CPC classification number: G03F7/70091 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/225

Abstract: An exposure apparatus includes a first dispersing element for dispersing substantially parallel laser light, from a laser, with respect to the wavelength to provide light beams of wavelength units, a first optical system for collecting each light beam of a wavelength unit from the first dispersing element, a wavelength selecting device for passing a predetermined wavelength region of light, of the light beams of wavelength units each being collected by the first optical system, a second optical system for receiving the light from the wavelength selecting device and providing parallel light beams of wavelength units, and a second dispersing element for combining the parallel light beams of wavelength units from the second optical system, the second dispersing element having substantially the same angular dispersion as that of the first dispersing element and a direction of dispersion opposite to that of the first dispersing element.

Abstract translation: 曝光装置包括：第一分散元件，用于从激光器分散相对于波长的大致平行的激光，以提供波长单元的光束;第一光学系统，用于从第一分散元件收集波长单元的每个光束; 用于使每个由第一光学系统收集的波长单位的光束的预定波长区域通过的波长选择装置，用于接收来自波长选择装置的光并提供波长的平行光束的第二光学系统 单元和用于组合来自第二光学系统的波长单元的平行光束的第二分散元件，第二分散元件具有与第一分散元件基本相同的角度分散，并且与第一分散元件的分散方向相反的方向 分散元件。