公开(公告)号：US09063055B2

公开(公告)日：2015-06-23

申请号：US13610365

申请日：2012-09-11

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: G01N23/04 ,  A61B6/00

CPC classification number: G01N23/04 ,  A61B6/484 ,  G01N2223/313 ,  G01N2223/3301

Abstract: An X-ray imaging apparatus for imaging a subject includes a diffraction grating configured to form an interference pattern by diffracting X-ray radiation from an X-ray source, a shielding grating configured to shield part of the interference pattern, a detector configured to detect the X-ray radiation passing through the shielding grating, and a moving unit configured to change an angle between each of the diffraction grating, the shielding grating and the detector and an optical axis, wherein the detector is configured to detect the X-ray according to a change in the angle between each of the diffraction grating, the shielding grating and the detector and the optical axis.

Abstract translation: 用于成像对象的X射线成像装置包括被构造成通过衍射来自X射线源的X射线辐射而形成干涉图案的衍射光栅，被配置为屏蔽部分干涉图案的屏蔽光栅，被配置为检测 穿过屏蔽光栅的X射线辐射，以及被配置为改变每个衍射光栅，屏蔽光栅和检测器之间的角度和光轴的移动单元，其中检测器被配置为根据 涉及每个衍射光栅，屏蔽光栅和检测器之间的角度以及光轴的变化。

公开(公告)号：US09043182B2

公开(公告)日：2015-05-26

申请号：US12676002

申请日：2008-11-18

Applicant: Yuzo Seo ,  Chidane Ouchi ,  Takao Ukaji

Inventor： Yuzo Seo ,  Chidane Ouchi ,  Takao Ukaji

IPC: G01C9/00 ,  G01B9/02

CPC classification number: G01B9/02083 ,  G01B9/02007 ,  G01B2290/70

Abstract: An absolute position measurement apparatus measures an absolute position of an object to be measured using a first light source and a second light source which has coherency lower than that of the first light source. The absolute position measurement apparatus includes a measurement part which measures a point where phases of interference signals from the first and the second light sources coincide with each other or a point where an intensity of the interference signal from the second light source is maximized, an origin defining part which defines the point measured by the measurement part as an origin position, a phase storing part which stores the phase of the interference signal from the first light source at the origin position, an origin redefining part which redefines the origin position, and a position calculating part which calculates the absolute position of the object to be measured.

Abstract translation: 绝对位置测量装置使用具有低于第一光源的相干性的第一光源和第二光源来测量被测量物体的绝对位置。 绝对位置测量装置包括测量部分，其测量来自第一和第二光源的干扰信号的相位彼此一致的点或来自第二光源的干扰信号的强度最大化的点，原点 将由测量部分测量的点定义为原点位置的定义部分，存储来自第一光源的干涉信号在原点位置的相位的相位存储部分，重新​​定义原点位置的原点重新定义部分，以及 位置计算部，其计算被测量物体的绝对位置。

公开(公告)号：US08077391B2

公开(公告)日：2011-12-13

申请号：US12391918

申请日：2009-02-24

Applicant: Chidane Ouchi ,  Masanobu Hasegawa ,  Seima Kato

Inventor： Chidane Ouchi ,  Masanobu Hasegawa ,  Seima Kato

IPC: G02B5/18 ,  G01B9/02

CPC classification number: G03F7/706 ,  G03F1/44

Abstract: A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.

Abstract translation: 一种波前像差测量装置，包括放置在被测试光学系统的物平面中的掩模，并且具有包括产生球面波的针孔和相邻衍射光栅的图案，每个衍射光栅以与另一个不同的方向定向的线划分; 照明光学系统，其利用从光源发射的光照射所述掩模的区域; 分光器，其将来自透过待测光学系统的图案的光分离; 摄像单元，拍摄由分光产生的干涉条纹的图像，该图像用于测量待测光学系统的波前像差; 检测器，其检测来自各个被照射的衍射光栅的各个衍射光束的各个光量; 以及控制单元，其根据检测结果控制掩模的照明区域和图案的对准。

公开(公告)号：US20100271636A1

公开(公告)日：2010-10-28

申请号：US12765037

申请日：2010-04-22

Applicant: Toshiyuki Naoi ,  Seima Kato ,  Naoki Kohara ,  Chidane Ouchi

Inventor： Toshiyuki Naoi ,  Seima Kato ,  Naoki Kohara ,  Chidane Ouchi

IPC: G01B9/02

CPC classification number: G01B9/02097 ,  G01B9/02024 ,  G01B2290/30

Abstract: A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit.

Abstract translation: Talbot干涉仪包括衍射光栅，图像拾取装置，被配置为沿着测试对象的光轴方向移动衍射光栅和图像拾取装置中的至少一个的移动单元，以及计算机，被配置为调整 所述至少一个所述衍射光栅和所述图像拾取装置使用所述移动单元，从而可以基于从所述图像拾取装置捕获的多个干涉条纹获得的空间频谱，同时至少移动所述至少一个 衍射光栅中的一个和使用移动单元的图像拾取装置。

公开(公告)号：US20090213389A1

公开(公告)日：2009-08-27

申请号：US12391918

申请日：2009-02-24

Applicant: Chidane Ouchi ,  Masanobu Hasegawa ,  Seima Kato

Inventor： Chidane Ouchi ,  Masanobu Hasegawa ,  Seima Kato

IPC: G01B9/02

CPC classification number: G03F7/706 ,  G03F1/44

Abstract: A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.

Abstract translation: 一种波前像差测量装置，包括放置在被测试光学系统的物平面中的掩模，并且具有包括产生球面波的针孔和相邻衍射光栅的图案，每个衍射光栅以与另一个不同的方向定向的线划分; 照明光学系统，其利用从光源发射的光照射所述掩模的区域; 分光器，其将来自透过待测光学系统的图案的光分离; 摄像单元，拍摄由分光产生的干涉条纹的图像，该图像用于测量待测光学系统的波前像差; 检测器，其检测来自各个被照射的衍射光栅的各个衍射光束的各个光量; 以及控制单元，其根据检测结果控制掩模的照明区域和图案的对准。

公开(公告)号：US06961132B2

公开(公告)日：2005-11-01

申请号：US10693880

申请日：2003-10-28

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: G01B9/02 ,  G01B11/24 ,  G01J9/02 ,  G01M11/00 ,  G01M11/02 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/706 ,  G01B9/02057 ,  G01B9/02065 ,  G01J9/02

Abstract: An exposure apparatus for exposing a substrate with a pattern of an original includes a projection optical system for projecting the pattern of the original onto the substrate with light from a light source, and an interferometer for measuring an optical characteristic of the projection optical system by use of the light from the light source, which passes a pinhole and the projection optical system. The pinhole has a diameter which is smaller than a diameter of an Airy disc.

Abstract translation: 用于以原稿的图案曝光基板的曝光装置包括投影光学系统，用于利用来自光源的光将原稿的图案投影到基板上，以及用于通过使用来测量投影光学系统的光学特性的干涉仪 来自光源的光通过针孔和投影光学系统。 针孔的直径小于艾里版圆盘的直径。

公开(公告)号：US06853442B2

公开(公告)日：2005-02-08

申请号：US09986324

申请日：2001-11-08

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: G02B13/18 ,  G02B13/22 ,  G02B13/24 ,  G03F7/20 ,  H01L21/027 ,  H01S3/00 ,  H01S3/0943 ,  H01S3/105 ,  G03B27/72 ,  G03B27/54

CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70066 ,  G03F7/701 ,  G03F7/70241 ,  G03F7/70575 ,  G03F7/70958

Abstract: A projection exposure apparatus includes a continuous emission excimer laser for providing laser light having a predetermined wavelength, an illumination optical system for illuminating a pattern of a reticle with laser light having the predetermined wavelength, a projection optical system for projecting the illuminated pattern of the reticle onto a substrate, wherein the projection optical system is provided by a lens system made of a substantially single glass material, a laser for injecting light having the predetermined wavelength into a resonator of the continuous emission excimer laser, a wavemeter for measuring the wavelength of the laser light from the continuous emission excimer laser, and a changing device for changing a resonator length of the continuous emission excimer laser on the basis of a signal from the wavemeter so that the wavelength of the laser light from the continuous emission excimer laser becomes equal to the predetermined wavelength.

Abstract translation: 投影曝光装置包括用于提供具有预定波长的激光的连续发射准分子激光器，用于用具有预定波长的激光照射掩模版图案的照明光学系统，用于投影光罩图案的投影光学系统 其中投影光学系统由基本上单一的玻璃材料制成的透镜系统提供，用于将具有预定波长的光注入到连续发射准分子激光器的谐振器中的激光器，用于测量连续发射准分子激光器的波长的波长计 来自连续发射准分子激光器的激光以及用于根据来自波长计的信号改变连续发射准分子激光器的谐振器长度的改变装置，使得来自连续发射准分子激光器的激光的波长等于 预定波长。

公开(公告)号：US09046466B2

公开(公告)日：2015-06-02

申请号：US13641966

申请日：2011-05-20

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: G03H5/00 ,  G01N23/20 ,  G01B9/021 ,  G03H1/10 ,  G01N23/04 ,  G01J9/02 ,  A61B6/00 ,  G02B5/18 ,  G01J9/00 ,  G21K1/06 ,  G01B11/25

CPC classification number: G01N23/04 ,  A61B6/4291 ,  A61B6/484 ,  G01B11/2527 ,  G01J9/00 ,  G01J9/0215 ,  G01N2223/1016 ,  G01N2223/32 ,  G02B5/18 ,  G02B5/1814 ,  G02B5/1838 ,  G02B5/1842 ,  G02B5/1871 ,  G02B5/189 ,  G21K1/06 ,  G21K2201/06 ,  G21K2207/005

Abstract: Provided is an X-ray imaging apparatus having simple configuration and obtaining differential phase contrast images in two directions crossing each other without rotating the diffraction grating and the masking grating. The apparatus including: a diffraction grating diffracting X-rays; a masking grating masking portions rays and transmitting portions are two-dimensionally arranged to partially mask bright zones of the interference pattern; a moving device changing the relative position between the interference pattern and the masking grating; a detector detecting the intensity distribution of the X-rays transmitted through the masking grating; and a calculator calculating a differential phase contrast image or a phase contrast image of a subject, the calculator being configured to calculate the differential phase contrast image or the phase contrast image in each of two mutually crossing directions on the basis of results of detection performed a plurality of times by the detector.

Abstract translation: 本发明提供一种具有简单结构的X射线成像设备，并且在不旋转衍射光栅和掩蔽光栅的情况下彼此交叉的两个方向获得差分相位差图像。 该装置包括衍射光栅衍射X射线; 屏蔽光栅遮蔽部分光线和透射部分被二维布置以部分地掩蔽干涉图案的亮区; 移动装置改变干涉图案和掩蔽光栅之间的相对位置; 检测器，其检测透过所述掩蔽光栅的X射线的强度分布; 以及计算器，其计算对象的差分相位差图像或相位对比图像，所述计算器被配置为基于检测结果a计算两个相互交叉方向中的每一个中的差分相位对比图像或相位对比图像 多次由检测器。

公开(公告)号：US08559594B2

公开(公告)日：2013-10-15

申请号：US13085199

申请日：2011-04-12

Applicant: Chidane Ouchi ,  Kentaro Nagai

Inventor： Chidane Ouchi ,  Kentaro Nagai

IPC: G03H5/00

CPC classification number: G01N23/04 ,  G01N2223/401

Abstract: An imaging apparatus analyzes a periodic pattern of a Moiré due to Talbot interference by the Fourier transform method and forms an image. The imaging apparatus includes a first grating having a structure that transmits light beams from a beam source to refract or diffract the light beams and forms a self image based on a first periodic pattern by the Talbot interference at a predetermined position; a second grating that absorbs part of the first periodic pattern and causes a Moiré to be generated based on a second periodic pattern when the second grating is arranged at a position at which the self image is formed. All cross sections of the Moiré with axes in differential directions of a wavefront for the analysis by the Fourier transform method have a two-dimensional periodic structure in which periods of patterns in the second periodic pattern are the same.

Abstract translation: 成像装置通过傅里叶变换方法分析由于Talbot干扰引起的莫尔的周期性图案并形成图像。 成像装置包括第一光栅，其具有透射来自光束源的光束以折射或衍射光束的结构，并且通过Talbot在预定位置处的干涉基于第一周期性图案形成自身图像; 当第二光栅布置在形成自身图像的位置时，第二光栅吸收第一周期性图案的一部分并且基于第二周期性图案产生莫尔（Moiré）。 具有用于通过傅立叶变换方法分析的波前差分方向上的轴的莫尔的所有横截面具有其中第二周期图案中的图案周期相同的二维周期性结构。

公开(公告)号：US08351050B2

公开(公告)日：2013-01-08

申请号：US12683141

申请日：2010-01-06

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: G01B11/02 ,  G01B9/02

CPC classification number: G03F7/706 ,  G01J9/02 ,  G01J9/0215

Abstract: A wavefront-aberration-measuring device measures wavefront aberration of a to-be-tested optical system and includes a diffraction grating that splits light transmitted through the optical system, a detecting unit that detects interference fringes produced by beams of the split light, an arithmetic unit that calculates the wavefront aberration from the detected interference fringes, an image-side mask insertable into and retractable from an image plane of the optical system, and an illuminating unit that incoherently illuminates the image-side mask. The image-side mask has an aperture with a diameter larger than λ/2NA, where λ denotes a wavelength of the illuminating unit and NA denotes a numerical aperture of the to-be-tested optical system. The arithmetic unit calculates the wavefront aberration of the optical system from the interference fringes detected with the image-side mask being retracted from the image plane and the interference fringes detected with the image-side mask being in the image plane.

Abstract translation: 波前像差测量装置测量待测光学系统的波前像差，并包括分离透过光学系统的光的衍射光栅，检测由分束光束产生的干涉条纹的检测单元，算术 从检测到的干涉条纹计算波前像差的单元，可插入光学系统的像面并从光学系统的像面缩回的图像侧掩模，以及不连续地照射图像侧掩模的照明单元。 图像侧掩模具有直径大于λ/ 2NA的孔径，其中λ表示照明单元的波长，NA表示被测试光学系统的数值孔径。 算术单元根据从图像平面缩回的图像侧掩模检测到的干涉条纹和由图像侧掩模在图像平面中检测到的干涉条纹来计算光学系统的波前像差。