公开(公告)号：JPH03266271A

公开(公告)日：1991-11-27

申请号：JP6558290

申请日：1990-03-15

Applicant: DAICEL CHEM

Inventor： FUNAKI KATSUNORI

IPC: G11B23/00 ,  G11B7/24

Abstract: PURPOSE:To easily and surely correct the warp or the deformation of a disk by fitting a hub to the disk by a fitting member other than the hub. CONSTITUTION:The flat and ring-shaped fitting member 8 is joined to the optical disk 1 by adhesive 9, and the flange part 7 of the hub 4 is interposed and fixed to the optical disk 1 by this fitting member 8. The ring-shaped fitting member 8 is, at least, as large as to overlap the flange part 7 in a fitted state in order to exercise pressing force to the flange part 7, and in addition, its outer diameter is formed into size not to reach a recording.reproducing zone 3. Namely, the fitting member 8 is larger than the flange part 7 in length in a radial direction, and the fitting member 8 is made of the metal of high bending strength. Thus, the warp or the deformation of the optical disk 1 can be easily corrected by the fitting member 8, and in addition, a resonance point can be adjusted.

公开(公告)号：JPS63187483A

公开(公告)日：1988-08-03

申请号：JP1953787

申请日：1987-01-29

Applicant: DAICEL CHEM

Inventor： FUNAKI KATSUNORI ,  IYOSHI SHIYUUZOU

IPC: G11B23/00

Abstract: PURPOSE:To fix the hub with an optical disk main body with simple method suitable for mass-production and high accuracy by using a solvent solving at least both the hub and the disk main body locally so as to fix them. CONSTITUTION:The hub 1 is fixed onto a disk center hole 3 of a disk main body 2 and the disk center hole 3 is formed concentrically with a concentric information string formed on the disk main body 2. A recessed slot 11 being a flow path of the solvent is formed on the bottom of the hub 1 and the flow path 11 is linked to a solvent poring port 12 opened onto the surface of a plastic ring part 10. The solvent poured from the poring port 12 solves the hub 1 and the disk main body 2 while flowing through the flow path 11 and the both are adhered incorporatedly after a prescribed time. For example, when the disk main body 2 and the hub ring 10 are made of a polycarbonate resin, a methylene chloride is used as the solvent to adhere the both.

公开(公告)号：JPS62208482A

公开(公告)日：1987-09-12

申请号：JP24239985

申请日：1985-10-30

Applicant: DAICEL CHEM

Inventor： FUNAKI KATSUNORI

IPC: G11B7/00 ,  G11B7/004 ,  G11B7/26 ,  G11B23/50

Abstract: PURPOSE:To remove dust out of the surface of an optical disk by relatively moving an optical high density information recording carrier and a hair-like body with the surface of said carrier brought into contact with the hair-like thing. CONSTITUTION:With the hair-like body brought into contact with the surface of the optical high density information recording carrier, the surface and the hair-like body are relatively moved. The optical high density information recording carrier includes a compact disk and a laser disk, both of which are made of ROMs, a disk composed of a DRAW and a E-DRAW, and optical recording media such as an optical card and an optically recording tape. The compression elastic modulus of the hair-like body with respect to a load of 200g is more than 40%. Feathers of birds are preferably for such a hair-like body. Moreover, it can be selected from a variety of natural fibers, that is, animal fibers, plant fibers such as seed feathers, regenerated fibers, semi-synthetic fibers and synthetic fibers.

公开(公告)号：JP2009023983A

公开(公告)日：2009-02-05

申请号：JP2007208644

申请日：2007-08-09

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： OKAMOTO KAZUKI ,  FUNAKI KATSUNORI ,  TORIEDA MAYUMI ,  HORAI AKIRA

IPC: C07D235/18 ,  C08F38/00 ,  C09D5/25 ,  C09D149/00 ,  H01L21/312 ,  H01L21/768 ,  H01L23/522

Abstract: PROBLEM TO BE SOLVED: To provide a polymerizable compound having high heat resistance and extremely low relative permittivity which are useful for the production of semiconductors and forming an insulating film having little dispersion of relative permittivity, an insulating film-forming material containing the compound and an insulating film composed of a polymer having a pore structure obtained by subjecting the insulating film-forming material to a polymerization reaction. SOLUTION: The ethynyl group-containing organic alicyclic compound is represented by formula (1) (wherein Z is a bridged alicyclic skeleton; X is a heterocyclic ring or a divalent or higher-valent organic group containing the precursor structure; Y is a group containing an ethynyl group which may have a substituent; R is a hydrogen atom or a hydrocarbon group; m is an integer of 1-5; n is an integer of 2-7 and k is an integer of 0-5 and n+k=2-7; two or more X and Y in the molecule and two or more R may each be same or different). Especially, an adamantane skeleton is preferable as Z and a compound having a benzimidazolyl group is preferable as X. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供可用于制造半导体和形成几乎没有相对介电常数分散的绝缘膜的具有高耐热性和极低相对介电常数的可聚合化合物，含有 化合物和由具有通过对绝缘膜形成材料进行聚合反应而获得的孔结构的聚合物构成的绝缘膜。 解决方案：含炔基的有机脂环化合物由式（1）表示（其中Z是桥连脂环骨架; X是杂环或含有前体结构的二价或更高价的有机基团; Y是 含有可以具有取代基的乙炔基的基团; R是氢原子或烃基; m是1-5的整数; n是2-7的整数，k是0-5的整数，n是0的整数 + k = 2-7;分子中两个或更多个X和Y和两个或更多个R可以各自相同或不同）。 特别地，金刚烷骨架优选为Z，具有苯并咪唑基的化合物优选为X.版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008266308A

公开(公告)日：2008-11-06

申请号：JP2008070961

申请日：2008-03-19

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： IWAHAMA TAKAHIRO ,  NAKANO TATSUYA ,  INOUE KEIZO ,  MIYAKE HIROTO ,  YOSHIDA TSUKASA ,  ONO MITSURU ,  FUNAKI KATSUNORI

IPC: C07D305/06 ,  C08F16/26 ,  C08F16/32 ,  C08G65/22 ,  G02B5/32

Abstract: PROBLEM TO BE SOLVED: To provide an oxetane-ring-containing vinyl ether compound which exhibits a high curing rate and forms a cured product excellent in transparency and heat resistance. SOLUTION: The oxetane-ring-containing vinyl ether compound has an aromatic or non-aromatic carbon ring within the molecule or has two or more vinyl ether structures within the molecule. Alternatively, the compound contains a compound of formula (1) [wherein the ring Z represents a non-aromatic carbon ring and optionally exists within the molecule; R represents an optionally substituted vinyl group; W is a linking group linking an optionally substituted vinyloxy group (-OR group) and an oxetane ring or ring Z and represents a single bond or an organic group with a valence of (m+1); X is a substituent bound to the oxetane ring and to the ring Z; m represents 1 or 2; p represents an integer of 0-5; and q represents 1 or 2, provided that when m=q=1, at least one of the following conditions is satisfied: ring Z exists, X contains a carbon ring or W contains a carbon ring]. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 待解决的问题：提供显示高固化速度并形成透明性和耐热性优异的固化产物的含氧杂环丁烷环的乙烯基醚化合物。 解决方案：含氧杂环丁烷的乙烯基醚化合物在分子内具有芳族或非芳族碳环，或在分子内具有两个或更多个乙烯基醚结构。 或者，化合物含有式（1）化合物[其中环Z表示非芳族碳环且任选地存在于分子内; R表示任选取代的乙烯基; W是连接任选取代的乙烯基氧基（-OR基团）和氧杂环丁烷环或环Z的连接基团，并且表示单键或化合价（m + 1）的有机基团。 X是与氧杂环丁烷环和环Z结合的取代基; m表示1或2; p表示0〜5的整数。 q表示1或2，条件是当m = q = 1时，满足以下条件中的至少一个：存在环Z，X包含碳环或W包含碳环]。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007217297A

公开(公告)日：2007-08-30

申请号：JP2006036516

申请日：2006-02-14

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： HORAI AKIRA ,  FUNAKI KATSUNORI ,  TORIEDA MAYUMI ,  ITAYA AKIRA ,  GOTO FUMIKO

IPC: C07D235/20 ,  C08G73/18 ,  C09D5/25 ,  C09D179/04

CPC classification number: Y02P20/55

Abstract: PROBLEM TO BE SOLVED: To provide a polymer and insulation film, having a high heat resistance and an extremely low specific permittivity useful in the production of a semiconductor, an amino group-containing adamantane derivative capable of forming them, a method for producing the same, and an insulation film-forming material. SOLUTION: This amino group-containing adamantane derivative is expressed by formula (1) [wherein, X 1 , etc., are each the same or different and show a single bond or a divalent aromatic or non-aromatic ring group; and R 1 , etc., which are each an adamantane ring or a substituting group bonded with a ring X 1 , etc., are each the same or different and show H, a hydrocarbon group, carboxyl or an acyl, which may be protected with a protecting group, or a group expressed by formulae (wherein, ring Ys are each the same or different and show a single ring or a multiple ring aromatic or non-aromatic ring; and R 5 etc., are each the same or different and show an amino group which may be protected with a protecting group)]. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种聚合物和绝缘膜，其具有高的耐热性和极低的比介电常数，可用于制造半导体，能够形成它们的含氨基的金刚烷衍生物的方法 制造它们，以及绝缘膜形成材料。 解决方案：该含氨基的金刚烷衍生物由式（1）表示[其中，X 1 等各自相同或不同，表示单键或二价芳香族 或非芳族环基; 和R 1 等，它们各自为金刚烷环或与环X 1键合的取代基等，各自相同或不同，表示H ，可以用保护基保护的烃基，羧基或酰基，或由式表示的基团（其中，环Y各自相同或不同，并且表示单环或多环芳族或非芳族 环和R 5等<！ - SIPO - >各自相同或不同，表示可被保护基保护的氨基]。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2002351078A

公开(公告)日：2002-12-04

申请号：JP2001153172

申请日：2001-05-22

Applicant: DAICEL CHEM

Inventor： TSUTSUMI KIYOHARU ,  INOUE KEIZO ,  FUNAKI KATSUNORI ,  NAKANO TATSUYA ,  HORAI AKIRA

IPC: G03F7/039 ,  C07C49/553 ,  C07D307/00 ,  C08F32/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a high molecular compound having high etching resistance in the case of being used for a photoresist. SOLUTION: The high molecular compound contains at least one kind of a monomer unit selected from formulas (1a) and (1b). (In the formulas, R represents a hydrogen atom, a 1-5C hydrocarbon group, a hydroxyl group which can be protected by a protective group, a -COOR3 group or the like. The R represents a hydrogen atoms, a tertiary hydrocarbon group which can have a substituent group, a tetrahydro furanyl group or the like. Y represents a univalent alicyclic group which can have a substituent group. (n) represents 0, 1 or 2. R represents a hydrogen atom, a 1-20C hydrocarbon group, a hydroxyl group which can be protected by a protective group, or the like, L represent a lactone ring of >=5 members. Norbornane ring in the formula can have a substituent group in addition to the substituent group expressed by the formula.

公开(公告)号：JP2001215703A

公开(公告)日：2001-08-10

申请号：JP2000024527

申请日：2000-02-01

Applicant: DAICEL CHEM

Inventor： FUNAKI KATSUNORI ,  TSUTSUMI KIYOHARU ,  HORAI AKIRA

IPC: H01L21/027 ,  C08F18/00 ,  C08F20/10 ,  C08F22/06 ,  C08F32/00 ,  C08F32/08 ,  C08F232/02 ,  G03F7/004 ,  G03F7/039 ,  G03F7/027

Abstract: PROBLEM TO BE SOLVED: To obtain a high molecular compound for a photoresist excellent in adhesion to a substrate and capable of accurately forming a fine pattern. SOLUTION: The high molecular compound contains a monomer unit to formula I and may further contain at least one monomer unit selected from the units of formulae IIa-IIg (where R1 and R13-R15 are each H or methyl; R2 and R3 are each a 1-8C hydrocarbon group; R4-R6 are each H, hydroxyl or methyl; R7 and R8 are each H, hydroxyl or -COOR9; R9 is t-butyl, 2- tetrahydropyanyl or the like; R10 and R11 are each H, hydroxyl or oxo; R12 is a hydrocarbon group having a tertiary carbon atom in a bond position to an oxygen atom shown in each formula; R16 is t-butyl, 2-tetrahydropyranyl or the like; and (n) is an integer of 1-3).

公开(公告)号：JP2531581B2

公开(公告)日：1996-09-04

申请号：JP24239985

申请日：1985-10-30

Applicant: DAICEL CHEM

Inventor： FUNAKI KATSUNORI

IPC: G11B7/00 ,  G11B7/004 ,  G11B7/26 ,  G11B23/50

公开(公告)号：JPH0548553B2

公开(公告)日：1993-07-21

申请号：JP8609987

申请日：1987-04-08

Applicant: DAICEL CHEM

Inventor： FUNAKI KATSUNORI ,  TOKUHARA SHINJI

IPC: G11B23/00 ,  G11B7/24