公开(公告)号：JP2010280844A

公开(公告)日：2010-12-16

申请号：JP2009136172

申请日：2009-06-05

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： FUNAKI KATSUNORI ,  TSUTSUMI KIYOHARU ,  MAHIKO TOMOAKI ,  ARAKI NAOKO

IPC: C08F265/06 ,  C08G65/18 ,  C08G65/22

CPC classification number: C08G59/3209 ,  C08G65/18 ,  C08G65/22

Abstract: PROBLEM TO BE SOLVED: To provide a cationically polymerizable resin composition having low viscosity and easy processability, and extremely quickly curable by light irradiation to give a cured product excellent in softness, heat-resistance and flexibility after heat-treatment. SOLUTION: The cationically polymerizable resin composition contains (A) a vinyl ether compound containing an oxetane ring and/or (B) a vinyl ether compound containing an alicyclic epoxy group, and (C) an oligomer or polymer of a specific (meth)acrylic acid ester (co)polymer having oxetane rings or epoxy rings, exhibiting a liquid state at 0°C and having a molecular weight of ≥500. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 解决的问题：提供一种粘度低，易加工性的阳离子聚合性树脂组合物，通过光照射极快地固化，得到热处理后的柔软性，耐热性和柔软性优异的固化物。 解决方案：阳离子聚合性树脂组合物含有（A）含有氧杂环丁烷环的乙烯基醚化合物和/或（B）含有脂环族环氧基的乙烯基醚化合物，和（C）特定（ 甲基）丙烯酸酯（共）聚合物，其具有氧杂环丁烷环或环氧环，在0℃显示分子量≥500的液态。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2002220424A

公开(公告)日：2002-08-09

申请号：JP2001015891

申请日：2001-01-24

Applicant: DAICEL CHEM

Inventor： HORAI AKIRA ,  FUNAKI KATSUNORI

IPC: G03F7/039 ,  C08F220/06 ,  C08F220/18 ,  C08F220/28 ,  C08F222/06 ,  C08F222/10 ,  C08F222/40 ,  C08F232/08 ,  C08K5/00 ,  C08L33/02 ,  C08L33/04 ,  C08L35/00 ,  C08L45/00

Abstract: PROBLEM TO BE SOLVED: To provide a useful maleimide copolymer as a resist resin excellent in the drying etching resistance. SOLUTION: The copolymer contains the units represented by the formulas (1) and (2) [R is an alkyl group which may have a substituted group; Z ring is a lactone ring; x is an integer of 0-3]. Further, it may contain at least one unit selected from (meth)acrylic acid or its ester and, maleic anhydride or its ester. The copolymer is useful as a resist composition combined with an optical acid generating agent.

公开(公告)号：JP2002145954A

公开(公告)日：2002-05-22

申请号：JP2000343762

申请日：2000-11-10

Applicant: DAICEL CHEM

Inventor： TSUTSUMI KIYOHARU ,  FUNAKI KATSUNORI

IPC: G03F7/039 ,  C08F220/28 ,  C08K5/00 ,  C08L33/14 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a polymer compound for photoresist, containing uniformly distributed monomer units, having small intramolecular and intermolecular compositional distributions and exhibiting excellent etching resistance. SOLUTION: The polymer compound for photoresist is produced by the copolymerization of a monomer mixture containing three kinds of (meth)acrylic acid esters comprising (A) a compound of formula 1, (B) a compound of formula 2 and/or 3 and (C) a (meth)acrylic acid ester of formula 4 having a substituted adamantane ring (R2, R12 and R13 are each H or a 1-3C hydrocarbon group; R14 is a 6-20C bridged alicyclic hydrocarbon group; R16 is methyl or the like; R18 and R19 are each H, hydroxy group, oxo group or carboxy group provided that R18 and R19 are not H at the same time; (p), (q), (r) and (s) are each 0 or 1; and p+q+r+s is 2-4).

公开(公告)号：JP2001131232A

公开(公告)日：2001-05-15

申请号：JP31232999

申请日：1999-11-02

Applicant: TOSHIBA CORP ,  DAICEL CHEM

Inventor： GOKOCHI TORU ,  OKINO TAKASHI ,  ASAKAWA KOUJI ,  SHINODA NAOMI ,  FUNAKI KATSUNORI ,  TSUTSUMI KIYOHARU ,  HORAI AKIRA ,  INOUE KEIZO

IPC: H01L21/027 ,  C08F2/48 ,  C08F20/18 ,  C08F20/30 ,  C08K5/00 ,  C08L33/04 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To obtain a polymeric compound which not only is excellent in clarity, alkali resistance, and adhesive properties but also has a high etching resistance. SOLUTION: This polymeric compound contains at least one of monomer units represented by formula I (wherein R1 is H or methyl; and R2 and R3 are each H or hydroxyl) and may further contain at least one of monomer units selected from among monomer units represented by formulas II a and II b (wherein R1 is H or methyl; R4 and R5 are each H, hydroxyl, oxo, carboxyl, or the like provided they are not simultaneously H; and R7 and R8 are each H, hydroxyl, or oxo).

公开(公告)号：JPH0768963A

公开(公告)日：1995-03-14

申请号：JP20147393

申请日：1993-08-13

Applicant: DAICEL CHEM

Inventor： NOZU KAZUO ,  FUNAKI KATSUNORI

IPC: B41C1/055 ,  B41N1/12 ,  B41N1/14 ,  G03F7/039

Abstract: PURPOSE:To provide such a plate material for printing that drawing is enabled on the surface even by low laser energy and strength is large by providing both a photosensitive layer containing nitrocellulose, carbon black and bound resin and a supporting body consisting of a PET film having specified average density. CONSTITUTION:A form plate material for printing is constituted of a supporting body and a photosensitive layer containing nitrocellulose, carbon black and bound resin. The supporting body is formed of a PET film having average density less than 1.39. Thereby, since strength of heat decomposable photosensitive layer is large and strength of the PET film being the supporting body is large, durability of the plate material for printing is enhanced. Therefore the plate material for printing is obtained in which drawing is enabled on the surface even by application of low laser energy and strength is large.

公开(公告)号：JPH06346311A

公开(公告)日：1994-12-20

申请号：JP15440293

申请日：1993-05-31

Applicant: DAICEL CHEM

Inventor： KANEDA HIROSHI ,  FUNAKI KATSUNORI

IPC: D01D4/02 ,  B24B9/00

Abstract: PURPOSE:To smoothly produce high-quality fiber having hardly any unevenness of denier without causing yarn breakage by a spinneret being uniform in the length of capillary in a spinning hole. CONSTITUTION:This spinneret forms plural spinning holes 5 consisting of inversely conical introducing parts 9 and columnar discharge parts 10 formed in the lower part of the introducing part 9 in a spinneret plate 1. In this spinneret, the spinneret plate 1 is formed by laminating an introducing plate 2 in which an introducing hole corresponding to the introducing part 9 is bored to a discharge plate 3 in which a discharge hole corresponding to the discharge part 10 is bored. A reinforced plate 4 forming a hole 11 larger than hole diameter of the discharge hole at a position corresponding to the discharge hole may be laminated to the discharge plate 3. The introducing plate 2, the discharge plate 3 and reinforced plate 4 may be separable, respectively. In this spinneret, the discharge part having uniform length is obtained, because these plates can separately be produced.

公开(公告)号：JP2009110010A

公开(公告)日：2009-05-21

申请号：JP2008308900

申请日：2008-12-03

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： NAKANO TATSUYA ,  FUNAKI KATSUNORI

IPC: G03F7/039 ,  C07C69/54 ,  C07C69/753 ,  C07C69/757 ,  C08F20/12 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30

CPC classification number: G03F7/0045 ,  G03F7/039 ,  G03F7/0397

Abstract: PROBLEM TO BE SOLVED: To provide a resin composition for positive photoresist, in which a polymer itself can be solubilized upon irradiation with light, even if the polymer has an adamantane skeleton, and which has high etching resistance (in particular, high dry etching resistance) and can form a fine pattern, using a simple composition with high accuracy. SOLUTION: The resin composition for photoresist contains the polymer, having a unit represented by formula (1) and a photoacid generator. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：即使聚合物具有金刚烷骨架，并且具有高耐蚀刻性（特别是高的抗蚀剂性），提供一种聚合物本身在光照下可溶解的正性光致抗蚀剂用树脂组合物 干蚀刻电阻），并可以形成精细图案，使用具有高精度的简单组成。 光致抗蚀剂用树脂组合物含有具有式（1）表示的单元和光致酸发生剂的聚合物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007217455A

公开(公告)日：2007-08-30

申请号：JP2006036518

申请日：2006-02-14

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： HORAI AKIRA ,  FUNAKI KATSUNORI ,  ITAYA AKIRA

IPC: C09D177/06 ,  C07D235/18 ,  C07D235/20 ,  C08G73/18 ,  C09D5/25 ,  C09D179/00 ,  H01L21/312 ,  H01L21/768 ,  H01L23/522

Abstract: PROBLEM TO BE SOLVED: To provide an insulation film without having unevenness in insulation property, having a uniform film quality and having an extremely low specific resistivity, and an insulation film-forming material capable of forming the same. SOLUTION: This insulation film-forming material consisting of a polymerizable composition obtained by dissolving a polymerizable compounds including a compound having an adamantane skeleton is characterized by having COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供绝缘膜，其绝缘性不均匀，膜质量均匀且具有极低的电阻率，以及能够形成该绝缘膜的绝缘膜形成材料。 解决方案：由通过溶解包含具有金刚烷骨架的化合物的可聚合化合物获得的可聚合组合物构成的绝缘膜形成材料的特征在于具有<5％的含水量。 作为包含具有金刚烷骨架的化合物的可聚合化合物，例如 由式（1）表示的含羰基的金刚烷衍生物，式（2）表示的胺衍生物和/或下式（3）表示的含氨基的金刚烷衍生物的组合，或式 （5A），（5B）或（5C）。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2004307803A

公开(公告)日：2004-11-04

申请号：JP2003325518

申请日：2003-09-18

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： NAGANO SHINYA ,  HASHIMOTO HARUICHIRO ,  TSUTSUMI KIYOHARU ,  FUNAKI KATSUNORI

IPC: C08G73/08 ,  C08F120/04 ,  C08G73/10 ,  C08G73/18 ,  C08J5/18 ,  C08L79/04

CPC classification number: C08J5/18 ,  C08G73/10 ,  C08G73/18 ,  C08J2379/04 ,  C08L79/04 ,  Y10T428/1023 ,  Y10T428/24917 ,  Y10T428/31504 ,  Y10T428/31681 ,  Y10T428/31721

Abstract: PROBLEM TO BE SOLVED: To provide a material forming a polybenzazole insulating film which has high heat resistance and a low dielectric constant and is useful for a semiconductor part and the like. SOLUTION: The insulating film-forming material comprises a polymerizable composition obtained by dissolving an adamantane polycarboxylic acid represented by formula (1) (wherein X is a hydrogen atom, a carboxyl group or a hydrocarbon group; and Y 1 , Y 2 , Y 3 and Y 4 are the same or different and are each a single bond or a divalent aromatic cyclic group) and an aromatic polyamine represented by formula (2) (wherein the ring Z is a monocyclic or polycyclic aromatic ring; and R 1 and R 2 are each a substituent group bonded to the ring Z and are, same or different, an amino group, a mono-substituted amino group, a hydroxyl group or a mercapto group) in a solvent other than a ketone and an aldehyde. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004300441A

公开(公告)日：2004-10-28

申请号：JP2004126370

申请日：2004-04-22

Applicant: Daicel Chem Ind Ltd ,  ダイセル化学工業株式会社

Inventor： NAKANO TATSUYA ,  FUNAKI KATSUNORI

IPC: G03F7/033 ,  C07C69/54 ,  C08F20/28 ,  G03F7/039 ,  G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a fine pattern by using a resin composition for a photoresist having high etching solution resistance and capable of being solubilized by photoirradiation. SOLUTION: The adamantane-based monomer for a photoresist is represented by formula (1b), wherein, R 11 is H or methyl, R 12 , R 13 and R 14 are the same or different from each other and are each H, an alkyl or hydroxy, at least one of R 12 , R 13 and R 14 is hydroxy, X is a connecting group and m and n are each 0 or 1. The resin composition for a photoresist can be solubilized by photoirradiation, is useful for forming a fine pattern, has an adamantane skeleton, has high etching resistance and is capable of forming a fine pattern with a simple composition at a high resolution. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：通过使用具有高抗蚀剂溶解性并能够通过光照射溶解的光致抗蚀剂用树脂组合物来提供精细图案。 解决方案：用于光致抗蚀剂的基于金刚烷的单体由式（1b）表示，其中R 11是H或甲基，R SP 12， > 13 和R“SP 14”彼此相同或不同，并且各自为H，烷基或羟基，R 12， SP> 13 和R 14 是羟基，X是连接基团，m和n各自为0或1.用于光致抗蚀剂的树脂组合物可以通过光照射增溶，可用于 形成精细图案，具有金刚烷骨架，耐腐蚀性高，能够以高分辨率形成具有简单组成的精细图案。 版权所有（C）2005，JPO＆NCIPI