公开(公告)号：ZA9406988B

公开(公告)日：1996-03-12

申请号：ZA9406988

申请日：1994-09-12

Applicant: HOECHST AG

Inventor： HOENEL MICHAEL ,  SCHAFHEUTLE MARKUS A ,  VOELKER ACHIM ,  WALZ GERD ,  WEHNER SUSANNE ,  ZIEGLER PETER

IPC: C08F2/16 ,  C08F2/24 ,  C08F2/44 ,  C08G18/00 ,  C08G18/08 ,  C08G18/58 ,  C08G18/64 ,  C08G18/72 ,  C08G18/80 ,  C08L63/10 ,  C09D5/02 ,  C09D5/44 ,  C09D175/04 ,  C08G ,  C08F ,  C08L ,  C09D

CPC classification number: C08G18/643 ,  C08G18/0814 ,  C08G18/728 ,  C09D5/4488

公开(公告)号：AU2332895A

公开(公告)日：1996-01-18

申请号：AU2332895

申请日：1995-06-28

Applicant: HOECHST AG

Inventor： NEUMANN UWE ,  HOENEL MICHAEL ,  VOELKER ACHIM ,  WALZ GERD ,  WEHNER SUSANNE ,  ZIEGLER PETER

IPC: C08L75/04 ,  C08F283/10 ,  C08F290/06 ,  C08F290/14 ,  C08G18/08 ,  C08G18/58 ,  C08G18/64 ,  C08G18/67 ,  C08G18/80 ,  C08G59/06 ,  C08G59/14 ,  C08G59/24 ,  C08G59/40 ,  C08G59/50 ,  C08G59/56 ,  C08J3/03 ,  C08L51/08 ,  C08L63/00 ,  C08L75/00 ,  C09D5/44 ,  C09D175/00 ,  C09D175/04 ,  C09D163/00

Abstract: The aq. synthetic resin dispersions (I) contain: (a) an ionic epoxy resin derived from bisphenol A substd. with aralkyl gp(s)., (b) a capped polyisocyanate, and (c) a polymer of radically polymerisable olefinic monomer(s). Also claimed are: (i) a process for the prodn. of (I) from a mixt. of vinyl monomer (c), resin (a) and blocked di or poly-isocyanate (b), by converting the mixt. into an aq. dispersion and polymerising with a radical initiator; and (ii) articles coated with the dispersion (I).

公开(公告)号：CZ223794A3

公开(公告)日：1995-03-15

申请号：CZ223794

申请日：1994-09-13

Applicant: HOECHST AG

Inventor： HOENEL MICHAEL ,  SCHAFHEUTLE MARKUS A ,  VOELKER ACHIM ,  WALZ GERD ,  WEHNER SUSANNE ,  ZIEGLER PETER

IPC: C08F2/16 ,  C08F2/24 ,  C08F2/44 ,  C08G18/00 ,  C08G18/08 ,  C08G18/58 ,  C08G18/64 ,  C08G18/72 ,  C08G18/80 ,  C08L63/00 ,  C08L63/10 ,  C09D5/02 ,  C09D5/44 ,  C09D163/00 ,  C09D175/04

Abstract: Solvent-free, aqueous synthetic resin dispersions containing a polymer A) obtained by polymerisation of A1) masked polyisocyanates, where some of the masking groups contain an ethylenically unsaturated group, and A2) ethylenically unsaturated monomers, in the presence of an ionic resin B).

公开(公告)号：BR9401644A

公开(公告)日：1994-12-27

申请号：BR9401644

申请日：1994-04-29

Applicant: HOECHST AG

Inventor： HOENEL MICHAEL ,  VOELKER ACHIM ,  WALZ GERD ,  ZIEGLER PETER

IPC: C08G18/08 ,  C08F2/16 ,  C08F2/18 ,  C08F2/44 ,  C08F283/00 ,  C08G18/00 ,  C08G18/63 ,  C08G18/64 ,  C08G18/70 ,  C08G18/80 ,  C08L63/00 ,  C08L75/00 ,  C08L75/04 ,  C09D5/44 ,  C09D163/00 ,  C09D175/00 ,  C09D175/04 ,  C25D15/02 ,  C08G59/02

Abstract: Aqueous synthetic resin dispersions containing A) an ionic resin, preferably a cationic resin, B) a masked polyisocyanate and C) a polymer comprising at least one free-radical-polymerizable ethylenically unsaturated monomer. These synthetic resin dispersions are used as binders in electrodeposition coating baths.

公开(公告)号：SK50794A3

公开(公告)日：1994-11-09

申请号：SK50794

申请日：1994-04-29

Applicant: HOECHST AG

Inventor： HOENEL MICHAEL ,  VOELKER ACHIM ,  WALZ GERD ,  ZIEGLER PETER

IPC: C08G18/08 ,  C08F2/16 ,  C08F2/18 ,  C08F2/44 ,  C08F283/00 ,  C08G18/00 ,  C08G18/63 ,  C08G18/64 ,  C08G18/70 ,  C08G18/80 ,  C08L63/00 ,  C08L75/00 ,  C08L75/04 ,  C09D5/44 ,  C09D163/00 ,  C09D175/00 ,  C09D175/04 ,  C25D15/02 ,  C08J3/03 ,  C08L57/00 ,  C08G18/58 ,  C09D157/00

Abstract: Aqueous synthetic resin dispersions containing A) an ionic resin, preferably a cationic resin, B) a masked polyisocyanate and C) a polymer comprising at least one free-radical-polymerizable ethylenically unsaturated monomer. These synthetic resin dispersions are used as binders in electrodeposition coating baths.

公开(公告)号：ZA9303247B

公开(公告)日：1993-11-23

申请号：ZA9303247

申请日：1993-05-10

Applicant: HOECHST AG

Inventor： HOENEL MICHAEL ,  ZIEGLER PETER ,  WEHNER SUSANNE ,  KUEPER KLAUS ,  VOELKER ACHIM

IPC: C07F7/22 ,  C08G18/22 ,  C08G18/24 ,  C09D5/44 ,  C07F ,  C08G ,  C08K ,  C09D

CPC classification number: C08G18/242 ,  C09D5/4492

公开(公告)号：CA1308117C

公开(公告)日：1992-09-29

申请号：CA555198

申请日：1987-12-23

Applicant: HOECHST AG

Inventor： LENZ RUEDIGER ,  WALZ GERD ,  HOENEL MICHAEL ,  ZIEGLER PETER

IPC: C08G73/02 ,  C07C67/00 ,  C07C213/00 ,  C07C215/18 ,  C07C217/04 ,  C07C217/28 ,  C07C219/06 ,  C07C313/00 ,  C07C323/25 ,  C07C323/29 ,  C08G18/32 ,  C09D4/00 ,  C07C217/02 ,  C07C219/02 ,  C08G18/50

Abstract: HOE 86/F 319 Polyamines based on derivatives of 1,3-bissubstituted 2propanol containing a multiplicity of amino groups, the latter containing at least one primary amino group and additionally further N-basic groupings, prepared by reacting 1,2,3-trisubstituted propane compounds with bis(primary amines or with monoamines and bis(primary amines). The polyamines according to the invention are clear to yellowish or yellow products which, at room temperature, form viscous to highly viscous liquids or may be pastelike or wax-like. They may be used, inter alia, advantageously as starting products for the preparation of thermosetting, in particular water-dispersible and cataphoretically depositable binders based on aminourethanes for coating solid substrates, in particular metals.

公开(公告)号：HUT70858A

公开(公告)日：1995-11-28

申请号：HU9402624

申请日：1994-09-13

Applicant: HOECHST AG

Inventor： SCHAFHEUTLE MARKUS A ,  HOENEL MICHAEL ,  VOELKER ACHIM ,  WALZ GERD ,  WEHNER SUSANNE ,  ZIEGLER PETER

IPC: C08F2/16 ,  C08F2/24 ,  C08F2/44 ,  C08G18/00 ,  C08G18/08 ,  C08G18/58 ,  C08G18/64 ,  C08G18/72 ,  C08G18/80 ,  C08L63/00 ,  C08L63/10 ,  C09D5/02 ,  C09D5/44 ,  C09D163/00 ,  C09D175/04 ,  C08G59/40 ,  C08F226/02 ,  C08L39/00

Abstract: Solvent-free, aqueous synthetic resin dispersions containing a polymer A) obtained by polymerisation of A1) masked polyisocyanates, where some of the masking groups contain an ethylenically unsaturated group, and A2) ethylenically unsaturated monomers, in the presence of an ionic resin B).

公开(公告)号：AU7289594A

公开(公告)日：1995-03-23

申请号：AU7289594

申请日：1994-09-09

Applicant: HOECHST AG

Inventor： HOENEL MICHAEL ,  SCHAFHEUTLE MARKUS A ,  VOELKER ACHIM ,  WALZ GERD ,  WEHNER SUSANNE ,  ZIEGLER PETER

IPC: C08F2/16 ,  C08F2/24 ,  C08F2/44 ,  C08G18/00 ,  C08G18/08 ,  C08G18/58 ,  C08G18/64 ,  C08G18/72 ,  C08G18/80 ,  C08L63/00 ,  C08L63/10 ,  C09D5/02 ,  C09D5/44 ,  C09D163/00 ,  C09D175/04 ,  C08F283/00 ,  C09D151/08

Abstract: Solvent-free, aqueous synthetic resin dispersions containing a polymer A) obtained by polymerisation of A1) masked polyisocyanates, where some of the masking groups contain an ethylenically unsaturated group, and A2) ethylenically unsaturated monomers, in the presence of an ionic resin B).

公开(公告)号：HU9402624D0

公开(公告)日：1994-11-28

申请号：HU9402624

申请日：1994-09-13

Applicant: HOECHST AG

Inventor： SCHAFHEUTLE MARKUS A ,  HOENEL MICHAEL ,  VOELKER ACHIM ,  WALZ GERD ,  WEHNER SUSANNE ,  ZIEGLER PETER

IPC: C08F2/16 ,  C08F2/24 ,  C08F2/44 ,  C08G18/00 ,  C08G18/08 ,  C08G18/58 ,  C08G18/64 ,  C08G18/72 ,  C08G18/80 ,  C08L63/00 ,  C08L63/10 ,  C09D5/02 ,  C09D5/44 ,  C09D163/00 ,  C09D175/04

Abstract: Solvent-free, aqueous synthetic resin dispersions containing a polymer A) obtained by polymerisation of A1) masked polyisocyanates, where some of the masking groups contain an ethylenically unsaturated group, and A2) ethylenically unsaturated monomers, in the presence of an ionic resin B).