Radiation sensitive composition for color filter, color filter and liquid crystal display element
    31.
    发明专利
    Radiation sensitive composition for color filter, color filter and liquid crystal display element 有权
    彩色滤光片,彩色滤光片和液晶显示元件的辐射敏感组合物

    公开(公告)号:JP2003029018A

    公开(公告)日:2003-01-29

    申请号:JP2001216447

    申请日:2001-07-17

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition for a color filter generating no chip or no hiatus even with low exposure, further giving rise to pixels with excellent adhesion property to a substrate and to a light shielding layer and with excellent heat resistance and being excellent in application and development properties, and to provide the color filter formed of the same and a liquid crystal display element provided with the color filter. SOLUTION: The radiation sensitive composition for the color filter contains a coloring agent (A), an alkali soluble resin with a specified structure (B), a polyfunctional monomer (C) and a photo-polymerization initiator (D). The color filter is formed of the composition. The liquid crystal display element is provided with the color filter.

    Abstract translation: 要解决的问题:为了提供即使在低曝光下也不产生芯片或不产生间隙的彩色滤光片的辐射敏感组合物,进一步产生具有优异的与基材和遮光层的粘合性能以及耐热性优异的像素, 应用和显影性能优异,并且提供由其形成的滤色器和设置有滤色器的液晶显示元件。 解决方案:用于滤色器的辐射敏感组合物含有着色剂(A),具有特定结构的碱溶性树脂(B),多官能单体(C)和光聚合引发剂(D)。 滤色片由该组合物形成。 液晶显示元件设置有滤色器。

    RADIATION SENSITIVE COMPOSITION FOR COLOR FILTER

    公开(公告)号:JPH10293397A

    公开(公告)日:1998-11-04

    申请号:JP10405997

    申请日:1997-04-22

    Applicant: JSR CORP

    Abstract: PROBLEM TO BE SOLVED: To form an image forming material having high resolution and surface smoothness, and restrain the occurrence of projections from the surface of the image forming material by specifying the angle of contact of methylene iodide for a hardened film cured under exposure to a radiation. SOLUTION: This radiation sensitive composition used for a color filter is prepared so as to contain a coloring agent A, a binder polymer B, a multifunctional monomer C, a photochemical polymerization initiator D, a solvent E and a surface active agent F, and to have an angle equal to or less than 55 degrees as the angle of contact of methylene iodide for a hardened film cured under exposure to a radiation. In other words, the angle of contact of methylene iodide for the hardened film cured under exposure to a radiation is equal to or less than 55 degrees and in particular, when a red coloring agent is used as an A-component, the angle of contact of methylene iodide for the obtained hardened film is preferably taken at 45 degrees or less. Also, when a green or blue coloring agent is used as the A-component, the angle of contact of methylene iodide for the obtained hardened film is preferably taken at 50 degrees or less.

    RADIATION-SENSITIVE COMPOSITION FOR COLOR FILTER

    公开(公告)号:JPH11258415A

    公开(公告)日:1999-09-24

    申请号:JP7646098

    申请日:1998-03-11

    Applicant: JSR CORP

    Abstract: PROBLEM TO BE SOLVED: To provide an innovative radiation-sensitive composition for a color filter which can provide excellent developing property even in the case pigments are mixed in high concentration and excellent pixels with high adhesion strength to a substrate and a light shielding layer and causes no residue and surface contamination on non-radiated parts of the substrate and the light shielding layer at the time of development. SOLUTION: This radiation-sensitive composition for a color filter consists of (A) coloring agents, (B) an alkali-soluble resin containing copolymer of a monomer having a defined formula and another copolymerizable monomer, (C) a multi-functional monomer, and (D) a photo polymerization initiator. In the formula, R stands for hydrogen atom or methyl group; m for an integer from 1 to 10; and n for an integer from 1 to 4.

    ALKALINE DEVELOPER FOR RADIATION SENSITIVE COMPOSITION

    公开(公告)号:JPH11249322A

    公开(公告)日:1999-09-17

    申请号:JP6928298

    申请日:1998-03-05

    Applicant: JSR CORP

    Abstract: PROBLEM TO BE SOLVED: To provide an alkaline developer for a radiation sensitive compsn. which leaves no undissolved material even when the concn. of a pigment contained in the compsn. is high, does not cause problems such as the occurrence of scum, incomplete development and resticking and can form a pixel having sharp pattern edges. SOLUTION: This alkaline developer comprises an aq. soln. contg. at least one inorg. alkaline compd. and at least one org. alkaline compd. selected from the group consisting of alkanolamines and alkylamines or further contains at least one nonionic surfactant selected from the group consisting of etherified polyoxyethylenes and etherified polyoxyethylene-polyoxypropylene block copolymers.

    RADIATION SENSITIVE COMPOSITION FOR COLOR FILTER

    公开(公告)号:JPH11174224A

    公开(公告)日:1999-07-02

    申请号:JP36324397

    申请日:1997-12-16

    Applicant: JSR CORP

    Abstract: PROBLEM TO BE SOLVED: To prevent the residue of an unexposed part on a substrate or on a light-shielding layer and contamination of a base during development and to obtain pixels excellent in adhesion property to the substrate and the light- shielding layer by using a specified alkali-soluble resin containing a copolymer. SOLUTION: This radiation-sensitive compsn. for a color filter contains a coloring agent, an alkali-soluble resin containing a copolymer of a monomer expressed by the formula and another copolymerizable monomer, polyfunctional monomers, and a photopolymn. initlator. In the formula, R is a hydrogen atom or methyl group. As for another copolymerizable monomer, it is not specified as far as it copolymerizes with the monomer expressed by the formula and that the produced polymer is soluble with alkali. Especially, a monomer mixture comprising an ethylenic unsatd. monomer having one or more carboxyl groups and other copolymerizable ethylenic unsatd. monomer is preferably used. The polymn. proportion of the monomer in the copolymer is usually 5 to 35 wt.%, preferably 10 to 25 wt.%.

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