公开(公告)号：SG144127A1

公开(公告)日：2008-07-29

申请号：SG2007191141

申请日：2007-12-28

Applicant: JSR CORP

Inventor： MINOWA TAKAKI ,  IIJIMA TAKAHIRO ,  NARUSE HIDENORI ,  HAYASHI TOSHIHIRO

Abstract: RADIATION SENSITIVE COMPOSITION, COLOR FILTER, BLACK MATRIX AND LIQUID CRYSTAL DISPLAY DEVICE

公开(公告)号：SG139651A1

公开(公告)日：2008-02-29

申请号：SG2007050909

申请日：2007-07-09

Applicant: JSR CORP

Inventor： SHIRATO KAORI ,  HIRAI TSUYOSHI ,  IIJIMA TAKAHIRO

Abstract: RADIATION SENSITIVE COMPOSITION FOR FORMING A COLORED LAYER, COLOR FILTER AND COLOR LIQUID CRYSTAL DISPLAY DEVICE A radiation sensitive composition for forming a colored layer, comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photoradical generator, wherein the alkali-soluble resin (B) comprises a polyester having an alicyclic hydrocarbon skeleton in the main chain and a polymerizable unsaturated bond in the side chain.The radiation sensitive composition for forming a colored layer does not produce the residual undissolved product or scum on the pattern edge at the time of development and provides a colored layer without a missing part of the pattern edge or an undercut even when the amount of exposure is small.

公开(公告)号：JP2009300835A

公开(公告)日：2009-12-24

申请号：JP2008156481

申请日：2008-06-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NARUSE HIDENORI ,  MINOWA TAKAKI ,  MATOBA TAKUMI ,  IIJIMA TAKAHIRO

IPC: G03F7/038 ,  C08F8/14 ,  C08F290/12 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation-sensitive composition which forms a fine pattern without causing chipping and undercut of a pattern edge even with a small amount of light exposure or generating undissolved residues and scum on a pattern edge in development. SOLUTION: The radiation-sensitive composition comprises (A) an alkali-soluble resin, (B) a polymerizable unsaturated compound containing a polymer having in a side chain a group obtained by addition reaction of a carboxylic acid having an unsaturated bond to a specific oxiranyl group, and (C) a photopolymerization initiator. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种新的辐射敏感性组合物，其即使在少量的曝光下也会形成图案边缘的切屑和底切，从而形成精细图案，或者在显影图案边缘上产生未溶解的残留物和浮渣 。 解决方案：辐射敏感性组合物包含（A）碱溶性树脂，（B）含有侧链的聚合物的可聚合不饱和化合物是通过具有不饱和键的羧酸的加成反应获得的基团与 特定的环氧乙烷基，（C）光聚合引发剂。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009229567A

公开(公告)日：2009-10-08

申请号：JP2008072063

申请日：2008-03-19

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HAMADA KENICHI ,  NAGAYA MASAYA ,  ONUMA YUUKI ,  HANAMURA MASAAKI ,  IIJIMA TAKAHIRO

IPC: G03F7/023 ,  C08F2/44 ,  C08F265/00 ,  G02B1/04 ,  G02B3/00 ,  G03F7/004 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition with which an interlayer dielectric having high surface hardness, excellent heat resistance and solvent resistance, and further having low dielectric constant can be formed, and with which a microlens with an excellent melted shape can be formed. SOLUTION: The radiation sensitive resin composition includes: a copolymer of a mixture of unsaturated compounds containing at least one selected from a group comprising an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and an unsaturated compound having an oxetanyl group; a 1,2-quinonediazide compound; and a carboxylic acid with a molecular weight of ≤1,000. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有高表面硬度，优异的耐热性和耐溶剂性并且还具有低介电常数的层间电介质的辐射敏感性树脂组合物，并且可以形成具有优异的微透镜 可以形成熔化的形状。 解决方案：辐射敏感性树脂组合物包括：含有选自不饱和羧酸和不饱和羧酸酐的基团中的至少一种的不饱和化合物的混合物和具有氧杂环丁烷基的不饱和化合物的共聚物; 1,2-醌二叠氮化合物; 和分子量≤1,000的羧酸。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009053667A

公开(公告)日：2009-03-12

申请号：JP2008159870

申请日：2008-06-19

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： UCHIIKE KAZUHIRO ,  HANAMURA MASAAKI ,  HAMADA KENICHI ,  IIJIMA TAKAHIRO

IPC: G03F7/023 ,  C08F2/38 ,  C08F220/02 ,  C08F222/00 ,  G02B1/04 ,  G02B3/00 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high radiation sensitivity and enabling a patterned thin film excellent in heat resistance to be easily formed. SOLUTION: The radiation-sensitive resin composition includes [A] a polymer having at least one group selected from the group consisting of a carboxyl group and a carboxylic acid anhydride group, at least one group selected from the group consisting of an oxiranyl group and an oxetanyl group, and an n-valent group represented by formula (1) (wherein R 1 is a methylene group or a 2-10C alkylene group or alkylmethylene group; Y is a single bond, -CO-, -O-CO- * (provided that a bonding radical with "*" bonds to R 1 ) or -NHCO- * (provided that a bonding radical with "*" bonds to R 1 ); n is an integer of 2-10; X is a 2-70C n-valent hydrocarbon group which may have one or more ether bonds; and "+" is a bonding radical), and [B] a 1,2-quinonediazide compound. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供具有高辐射灵敏度的辐射敏感性树脂组合物，并且能够容易地形成耐热性优异的图案化薄膜。 解决方案：辐射敏感性树脂组合物包括[A]具有至少一个选自羧基和羧酸酐基团的基团的聚合物，至少一种选自环氧乙烷基 （1）表示的n价基团（式中，R“SP”是亚甲基或2-10C亚烷基或烷基亚甲基; Y是单键， -CO-，-O-CO- * （条件是具有“*”键与R 1键的键合基团）或-NHCO- （条件是具有“*”的键合基团与R 1键合）; n是2-10的整数; X是2-70C n价烃基，其可以具有一个或多个 醚键;“+”是键合基团），[B]是1,2-醌二叠氮化合物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008158021A

公开(公告)日：2008-07-10

申请号：JP2006343828

申请日：2006-12-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HAMADA KENICHI ,  HANAMURA MASAAKI ,  UCHIIKE KAZUHIRO ,  IIJIMA TAKAHIRO

IPC: G02B5/02 ,  C08F220/26 ,  G02B5/08 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/023 ,  G03F7/027 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a composition having a sufficient process margin and proper storage stability, that is superior in adhesion to a substrate, heat resistance and solvent resistance and property of controlling an irregular shape, and capable of easily forming a film for use as a light diffusion reflecting film of a reflecting or semi-transmissive liquid crystal display element. SOLUTION: The composition for forming a light diffusion reflecting film contains [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) a specific oxetanyl group-containing (meth)acrylate and (a3) another olefinically unsaturated compound, and [B] a 1,2-quinonediazide compound. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 待解决的问题：提供具有足够的加工余量和适当的储存稳定性的组合物，其对基材的粘附性优异，耐热性和耐溶剂性以及控制不规则形状的性质，并且能够容易地形成 用作反射或半透射型液晶显示元件的光扩散反射膜的膜。 解决方案：用于形成光扩散反射膜的组合物含有（A）不饱和羧酸和/或不饱和羧酸酐的共聚物，（a2）特定的含氧杂环丁烷基的（甲基）丙烯酸酯 和（a3）另一种烯属不饱和化合物，和[B] 1,2-醌二叠氮化合物。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2005300994A

公开(公告)日：2005-10-27

申请号：JP2004118245

申请日：2004-04-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAMII HIDEYUKI ,  IIJIMA TAKAHIRO ,  KOYAMA TAKAYOSHI ,  NAGATSUKA TOMIO

IPC: G03F7/028 ,  G02B5/20 ,  G02B5/23 ,  G02F1/13 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition for forming a colored layer which gives pixels and a black matrix that produce neither undissolved matter nor scum on a pattern edge in development, cause neither chipping of a pattern edge nor undercut even under low exposure energy. SOLUTION: The radiation sensitive resin composition for forming a colored layer contains (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photo-radical generator containing a compound represented by formula (1) or (2) as an essential component, wherein R 1 denotes a 1-12C (cyclo)alkyl or phenyl; R 2 denotes H, a 1-12C (cyclo)alkyl or phenyl; R 3 denotes H or a 1-12C (cyclo)alkyl; and R 4 -R 6 each denotes H or a 1-6C (cyclo)alkyl. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种用于形成着色层的辐射敏感组合物，其给出像素和黑色矩阵，其在显影中在图案边缘上既不会形成未溶解的物质也不产生浮渣，也不会导致图案边缘的切割或均匀的下切 低曝光能量。 解决方案：用于形成着色层的辐射敏感性树脂组合物含有（A）着色剂，（B）碱溶性树脂，（C）多官能单体和（D）含有表示的化合物的光激发生成剂 （1）或（2）作为必需组分，其中R 1表示1-12C（环）烷基或苯基; R 2 表示H，1-12C（环）烷基或苯基; R 3表示H或1-12C（环）烷基; 且R 4各自表示H或1-6C（环）烷基。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2001108817A

公开(公告)日：2001-04-20

申请号：JP28883299

申请日：1999-10-08

Applicant: JSR CORP

Inventor： NAGATSUKA TOMIO ,  AOYAMA SATOKO ,  IIJIMA TAKAHIRO ,  TAMAIZUMI YOSHIKI

IPC: G03F7/004 ,  G02B5/20 ,  G03F7/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for color filter having excellent developing property and surface smoothness of pixels and having excellent adhesion property of pixels with a substrate and a light-shielding layer even when the composition contains a pigment in a high concentration, and to provide a color filter formed from that radiation-sensitive composition. SOLUTION: The radiation-sensitive composition for color filter contains (A) a pigment, (B) an alkali-soluble resin (C) a polyfunctional monomer and (D) a photopolymerization initiator, and has the following feature. The pigment (A) is preliminarily kneaded with a vehicle resin consisting of the alkali-soluble resin (B) and/or another resin. The color filter has the pixels formed from the radiation-sensitive composition for color filter.

公开(公告)号：JP2000098124A

公开(公告)日：2000-04-07

申请号：JP26911598

申请日：1998-09-24

Applicant: JSR CORP

Inventor： IIJIMA TAKAHIRO ,  ITOU YUKIKO ,  SAKURAI KOICHI ,  NEMOTO HIROAKI

IPC: G03F7/004 ,  C08F2/48 ,  C08F291/00 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive compsn. for a color filter having superior developability even if a pigment is contained at a high concn., making the unexposed part of the surface of the substrate and the surface of the light shielding layer of the filter free from residues and surface stains after development and giving pixels excellent in adhesion to the substrate and to the light shielding layer. SOLUTION: The radiation sensitive compsn. contains (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, (D) a photopolymn. initiator and (E) an org. amino compd. having one or more amino groups in a single molecule and having a mol.wt. of

公开(公告)号：JP2010084126A

公开(公告)日：2010-04-15

申请号：JP2009172002

申请日：2009-07-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： IIJIMA TAKAHIRO ,  UEDA JIRO ,  FUJIOKA MASAYASU ,  TANIMOTO KANAKO

IPC: C08L33/14 ,  C08F220/26 ,  C08K5/5435 ,  C08L83/06 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a curable resin composition capable of forming cured films having high flatness and being preferably used to form protective films for optical devices having high transparency and surface hardness, excellent in heat and pressure resistance, acid resistance, alkali resistance and spattering resistance and having good patterning characteristics of wired electrodes, and excellent in preservation stability.
SOLUTION: The curable resin composition comprises [A] a polymer having repeating units derived from a polymerizable unsaturated compound having an oxyranyl group or oxetanyl group, and [B] a specific polyorganosiloxane having oxetanyl groups.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 解决问题的方案：提供能够形成平坦度高的固化膜的固化性树脂组合物，优选用于形成透明性，表面硬度高，耐热性，耐酸性优异的光学元件用保护膜， 耐碱性和耐飞溅性，并且具有良好的布线电极图案化特性，保存稳定性优异。 解决方案：可固化树脂组合物包含[A]具有衍生自具有氧基乙酰基或氧杂环丁烷基的可聚合不饱和化合物的重复单元的聚合物，和[B]具有氧杂环丁烷基的特定聚有机硅氧烷。 版权所有（C）2010，JPO＆INPIT