公开(公告)号：JPH0239104A

公开(公告)日：1990-02-08

申请号：JP19117788

申请日：1988-07-29

Applicant: NISSHA PRINTING

Inventor： ISODA NORIMICHI

IPC: G02B5/20 ,  G02F1/1335

Abstract: PURPOSE:To efficiently and economically produce the color filters which have high surface strength and smoothness and excellent accuracy by dyeing the high-polymer material of an inorg. active film layer provided in fine pores on a transparent substrate by a photolithography method to desired pattern shapes. CONSTITUTION:The transparent inorg. active film layer 2 having the many fine pores consisting of an inorg. metal oxide is formed on the transparent substrate 1. The high-polymer material 3 having the excellent dyeability is impregnated in the fine pores and a photoresist is coated over the entire surface on the inorg. active film layer 2 and is dried; thereafter, the photoresist is patterned by using the original plate for working to form resist images. The resist images are first subjected to dyeing of a 1st color by a direct due or oil soluble dye and thereafter, the resist images serving as the mask are stripped and removed. The color filters consisting of multiple colors such as red, green and blue are formed if the stages of patterning, dyeing and removing the photoresist are carried out a required number of times for the 2nd and subsequent colors. The color filters which have the excellent smoothness and high strength, are simplified in stages as well and are free from unequal dyeing and insufficient densities are obtd. in this way.