公开(公告)号：US07952084B2

公开(公告)日：2011-05-31

申请号：US12431367

申请日：2009-04-28

Applicant: Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Martin Jacobus Johan Jak

Inventor： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Martin Jacobus Johan Jak

IPC: G01N21/33 ,  G21K5/04 ,  G21F1/12 ,  H05G2/00

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  G03F7/70058

Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site.

Abstract translation: 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料被辐射束接触以形成等离子体的位置处的等离子体形成位置，构造和布置成收集在等离子体形成部位处形成的极紫外辐射并形成极紫外辐射的收集器 光束和污染屏障。 污染屏障包括至少部分地位于等离子体形成位置和集电器之间的多个箔，以及可操作地连接到多个箔的可旋转底座。 可旋转底座构造成允许辐射束通过污染屏障到等离子体形成部位。

公开(公告)号：US20110117504A1

公开(公告)日：2011-05-19

申请号：US12997149

申请日：2009-06-09

Applicant: Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

Inventor： Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

IPC: G03F7/20 ,  C23G1/00 ,  H01J29/02

CPC classification number: G03F7/70925

Abstract: A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H2, D2 and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.

Abstract translation: 一种用于去除装置的无盖多层反射镜上的沉积的方法。 该方法包括在装置的至少一部分中提供包括H2，D2和DH中的一种或多种的气体，以及选自烃化合物和/或硅烷化合物的一种或多种另外的化合物; 从气体产生氢和/或氘自由基和一种或多种另外的化合物的基团; 并且使具有沉积的未封盖的多层反射镜与至少部分氢和/或氘基和一种或多种另外的化合物的基团接触以除去至少部分沉积物。

公开(公告)号：US07696492B2

公开(公告)日：2010-04-13

申请号：US11637936

申请日：2006-12-13

Applicant: Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailovitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer

Inventor： Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailovitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer

IPC: A61N5/00 ,  G21G5/00

CPC classification number: G03F7/70933 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract translation: 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。

公开(公告)号：US20090025750A1

公开(公告)日：2009-01-29

申请号：US11878436

申请日：2007-07-24

Applicant: Maarten Marinus Wilhelmus Van Herpen ,  Antonius Theodorus Kempen ,  Wouter Anthon Soer

Inventor： Maarten Marinus Wilhelmus Van Herpen ,  Antonius Theodorus Kempen ,  Wouter Anthon Soer

IPC: B08B5/00 ,  B08B6/00 ,  G03B21/26

CPC classification number: G03F7/70925 ,  B08B7/00 ,  G03F7/70916

Abstract: A method of removing a deposition from an optical element of an apparatus. The method includes providing a hydrogen comprising gas in at least a part of the apparatus, providing nitrogen radicals in the part of the apparatus for generating hydrogen radicals from the hydrogen comprising gas, and contacting the optical element with at least part of the hydrogen radicals to removal the deposition.

Abstract translation: 一种从装置的光学元件去除沉积物的方法。 该方法包括在装置的至少一部分中提供包含气体的氢气，在装置的部分中提供氮自由基，用于从含氢气体产生氢自由基，并将光学元件与至少部分氢原子接触， 去除沉积物。

公开(公告)号：US20090021705A1

公开(公告)日：2009-01-22

申请号：US11826525

申请日：2007-07-16

Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Kurt Gielissen

Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Kurt Gielissen

IPC: G03B27/52

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70883 ,  G03F7/70983

Abstract: A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.

Abstract translation: 防碎系统被构造和布置成防止从辐射源发出的碎屑通过来自辐射源的辐射传播到光刻设备内或在光刻设备内。 碎片防止系统包括限定来自辐射源的辐射的最大发射角的孔，以及具有辐射透射率的第一碎片屏障。 第一个碎片障碍物包括一个可旋转的箔片陷阱。 碎片防止系统还包括具有辐射透射率的第二碎片屏障。 第一碎片屏障配置成覆盖发射角的一部分，并且第二碎片屏障构造为覆盖发射角的另一部分。

公开(公告)号：US20090001288A1

公开(公告)日：2009-01-01

申请号：US11819707

申请日：2007-06-28

Applicant: Edwin Johan Buis ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

Inventor： Edwin Johan Buis ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

IPC: G03F7/20

CPC classification number: G03F7/70916

Abstract: A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

公开(公告)号：US20080291406A1

公开(公告)日：2008-11-27

申请号：US11802258

申请日：2007-05-21

Applicant: Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen

Inventor： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC: G03B27/42

CPC classification number: G03B27/42 ,  G03F7/70175 ,  G03F7/70916

Abstract: An assembly including a radiation reflector and a contaminant barrier is disclosed. The contaminant barrier is arranged to receive radiation from a radiation source and to reflect that radiation towards the radiation reflector, and the radiation reflector is arranged to reflect the radiation, received from the contaminant barrier, back towards the contaminant barrier.

Abstract translation: 公开了一种包括辐射反射器和污染物屏障的组件。 污染物屏障布置成接收来自辐射源的辐射并将该辐射反射到辐射反射器，并且辐射反射器布置成将从污染物屏障接收的辐射反射回污染物屏障。

公开(公告)号：US20080157006A1

公开(公告)日：2008-07-03

申请号：US11645809

申请日：2006-12-27

Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Kurt Gielissen

Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Kurt Gielissen

IPC: G21G5/00

CPC classification number: G03F7/70916 ,  G03F7/70858 ,  H05G2/003 ,  H05G2/005

Abstract: A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.

Abstract translation: 用于捕集来自碎屑产生辐射源的污染物质的碎片缓解系统。 该系统包括构造和布置成围绕轴线旋转的污染屏障，以及构造和布置成提供用于使来自辐射源的带电碎片偏转的磁场的磁体结构。 磁体结构被构造和布置成通过污染屏障提供磁场。 当通过污染屏障时，磁场沿着通常与污染屏障旋转轴线重合的平面定向。

公开(公告)号：US20080151215A1

公开(公告)日：2008-06-26

申请号：US11643953

申请日：2006-12-22

Applicant: Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen

Inventor： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC: G03F1/00

CPC classification number: G03F7/70283 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/34 ,  G21K1/062 ,  G21K2201/067

Abstract: A patterning device for a photolithographic apparatus is used to form a patterned radiation beam, by imparting a cross-sectional pattern to the radiation beam during reflection from the patterning device. The patterning device comprises a layer of phase-change material that is capable of locally undergoing an induced structural phase change into respective ones of a plurality of stable and/or metastable states. Furthermore, the patterning device comprises a radiation reflective structure with periodically arranged layers adjacent to the layer of phase-change material. The radiation reflective structures do not partake in the phase changes. By locally changing the phase of the phase-change material, the reflectivity of the whole structure is modified, for example due to thickness changes in the layer of phase-change material that lead to destructive interference of different components of the reflected light or due to changes in surface roughness of the radiation reflective structure.

Abstract translation: 用于光刻设备的图案形成装置用于通过在从图案形成装置反射期间将辐射束赋予横截面图案来形成图案化的辐射束。 图案形成装置包括相变材料层，其能够局部地经历诱导的结构相变为多个稳定和/或亚稳态中的相应的相变。 此外，图案形成装置包括具有与相变材料层相邻的周期性排列的层的辐射反射结构。 辐射反射结构不参与相位变化。 通过局部改变相变材料的相位，整个结构的反射率被改变，例如由于相变材料层中的厚度变化导致反射光的不同分量的破坏性干扰或由于 辐射反射结构的表面粗糙度变化。

公开(公告)号：US09726989B2

公开(公告)日：2017-08-08

申请号：US13643265

申请日：2011-02-22

Applicant: Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

Inventor： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC: G02B5/20 ,  G03F7/20

CPC classification number: G03F7/70891 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.