PRESSURE TANK
    34.
    发明申请
    PRESSURE TANK 审中-公开
    压力罐

    公开(公告)号:US20150184803A1

    公开(公告)日:2015-07-02

    申请号:US14404504

    申请日:2012-05-31

    Abstract: A pressure tank, particularly an elongated toroidal tank, with various lengths in X, Y, Z axes, includes bottoms connected with more than one connector, equipped with fixture connector pipes, holders for installation of the tank and cover, fixture cover, internal bottoms, internal casings, partitions. The external upper bottom and the external lower bottom form an external shell of the tank, with cross-sections having the shape of a rectangle with rounded vertices, whereas the internal casings are connected with the internal bottomw and/or with the external bottoms, preferably connected by the internal bottomw with middle tubes forming internal central connectors of the tank, separated by partition, and connector pipes are welded to tank walls so that the thickness of the external pipe wall is between 0.4 to 1.8 of the thickness of the walls of the tank elements.

    Abstract translation: 在X,Y,Z轴上具有各种长度的压力罐,特别是细长的环形槽,包括与多于一个连接器连接的底部,其具有夹具连接管,用于安装罐和盖的保持器,固定盖,内部底部 ,内壳,隔板。 外部上部底部和外部下部底部形成罐的外部壳体,横截面具有圆形顶点的矩形形状,而内部壳体与内部底部和/或外部底部连接,优选地 通过内部底部连接,中间管形成罐的内部中心连接器,由隔板分隔开,并且连接管被焊接到罐壁,使得外管壁的厚度在壁的厚度的0.4至1.8之间 坦克元素。

    Vacuum-insulating system and method for generating a high-level vacuum
    38.
    发明申请
    Vacuum-insulating system and method for generating a high-level vacuum 失效
    真空绝热系统和产生高级真空的方法

    公开(公告)号:US20050204752A1

    公开(公告)日:2005-09-22

    申请号:US10802064

    申请日:2004-03-16

    Abstract: A method of generating a high-level vacuum comprises evacuating a chamber having a substantially-pure gas therein to a medium-level vacuum, and freezing the residual gas to generate the high-level vacuum within the chamber. Impurities, such as atmospheric air, may be purged from the chamber by evacuating the chamber to a medium level vacuum (e.g., around 10−2 Torr) and subsequently filling the chamber with the gas. This purging process may be repeated multiple times to decrease the level of impurities in the gas filling the chamber. The substantially-pure gas may have an impurity-level of less than approximately 100 PPM and may comprise carbon-dioxide, although the scope of the invention is not limited in this respect. The medium level vacuum may range between approximately 1×10−2 Torr and 5×10−2 Torr allowing the use of a roughing pump, and the high-level vacuum may range between approximately 1×10−5 and 1×10−8 Torr.

    Abstract translation: 产生高级真空的方法包括将其中具有基本上纯净的气体的室抽真空至中等水平的真空,并冷凝残余气体以在室内产生高级真空。 可以通过将室抽真空至中等水平的真空(例如约10 -2乇)并随后用气体填充室来将杂质(例如大气)排出室。 该吹扫过程可以重复多次以降低填充室的气体中的杂质水平。 基本纯净的气体可以具有小于约100PPM的杂质含量,并且可以包含二氧化碳,尽管本发明的范围不限于此。 介质级真空可以在约1×10 -2 Torr和5×10 -2 Torr之间的范围内,允许使用粗抽泵,并且高级真空可以在约1×10 3 -5和1×10 -8乇。

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