公开(公告)号：WO1990012294A1

公开(公告)日：1990-10-18

申请号：PCT/US1990001813

申请日：1990-04-04

Applicant: WISCONSIN ALUMNI RESEARCH FOUNDATION

Inventor： WISCONSIN ALUMNI RESEARCH FOUNDATION ,  ROESLER, Fred, L. ,  HARLANDER, John

IPC: G01J03/45

CPC classification number: G01J3/453 ,  G01J2003/451 ,  G01J2009/0219

Abstract: A spatial heterodyne spectrometer has a two beam dispersive interferometer (25) which includes a diffraction grating (45) as a beam splitter/combiner. An incoming beam is collimated and passed to the grating (45) in the interferometer (25) where it is split into two beams (47, 50) which are recombined such that the angle between the wavefronts in the recombined beam at a particular wavelength is directly related to the deviation of that wavelength from a null wavelength at which the wavefronts are parallel. The recombined output beam is focused and imaged to produce Fizeau fringes across the output aperture (31), with these fringes being recorded on an imaging detector (34). The spatially varying intensity output of the imaging detector (34) is Fourier transformed to yield an output indicative of the spectral frequency content of the image which is related to the wavelength content of the incoming beam from the source.

公开(公告)号：US20180146851A1

公开(公告)日：2018-05-31

申请号：US15881809

申请日：2018-01-29

Applicant: Cylite Pty Ltd

Inventor： Steven James Frisken ,  Grant Andrew Frisken

IPC: A61B3/10 ,  G01B9/02 ,  A61B3/107 ,  A61B3/117 ,  A61B3/14 ,  G02B27/28 ,  G02B27/10 ,  G01J9/02 ,  A61B3/00 ,  G02C7/02

CPC classification number: A61B3/1015 ,  A61B3/0025 ,  A61B3/1025 ,  A61B3/107 ,  A61B3/117 ,  A61B3/14 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02041 ,  G01B9/02044 ,  G01B9/02091 ,  G01B2290/70 ,  G01J9/02 ,  G01J2009/0219 ,  G01J2009/0238 ,  G02B27/1013 ,  G02B27/283 ,  G02C7/027 ,  G02C2202/24

Abstract: Method and systems are presented for analysing a wavefront using a spectral wavefront analyser to extract optical phase and spectral information at a two dimensional array of sampling points across the wavefront, wherein the relative phase information between the sampling points is maintained. Methods and systems are also presented for measuring an eye by reflecting a wavefront of an eye and measuring the wavefront at a plurality of angles to provide a map of the off-axis relative wavefront curvature and aberration of the eye. The phase accuracy between wavelengths and sample points over a beam aperture offered by these methods and systems have a number of ocular applications including corneal and anterior eye tomography, high resolution retinal imaging, and wavefront analysis as a function of probe beam incident angle for determining myopia progression and for designing and testing lenses for correcting myopia.

公开(公告)号：US09719859B2

公开(公告)日：2017-08-01

申请号：US14565703

申请日：2014-12-10

Applicant: Lasertec Corporation

Inventor： Haruhiko Kusunose ,  Kiwamu Takehisa

IPC: G01B9/02 ,  G01J9/02 ,  G01N21/45 ,  G03F1/26 ,  G03F1/84

CPC classification number: G01J9/02 ,  G01B9/02041 ,  G01B9/02049 ,  G01B9/02098 ,  G01B2290/30 ,  G01J9/0215 ,  G01J2009/0219 ,  G01N21/45 ,  G03F1/26 ,  G03F1/84

Abstract: The present invention is directed to the provision of an interferometer and a phase shift amount measuring apparatus that can precisely operate in the EUV region. The interferometer according to the invention comprises an illumination source for generating an illumination beam, an illumination system for projecting the illumination beam emitted from the illumination source onto a sample, and an imaging system for directing the reflected beam by the sample onto a detector. The illumination system includes a first diffraction grating for producing a first and second diffraction beams which respectively illuminate two areas on the sample where are shifted from each other by a given distance, and the imaging system includes a second grating for diffracting the first and second diffraction beams reflected by the sample to produce a third and fourth diffraction beams which are shifted from each other by a given distance.

公开(公告)号：US20160135680A1

公开(公告)日：2016-05-19

申请号：US14899563

申请日：2014-06-20

Applicant: Cylite Pty Ltd

Inventor： Trevor Bruce Anderson ,  Steven James Frisken ,  Grant Andrew Frisken ,  Armin Georg Segref

IPC: A61B3/10 ,  G02B27/10 ,  G02B27/28 ,  G01B9/02 ,  A61B3/14

CPC classification number: A61B3/1015 ,  A61B3/0025 ,  A61B3/1025 ,  A61B3/107 ,  A61B3/117 ,  A61B3/14 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02041 ,  G01B9/02044 ,  G01B9/02091 ,  G01B2290/70 ,  G01J9/02 ,  G01J2009/0219 ,  G01J2009/0238 ,  G02B27/1013 ,  G02B27/283 ,  G02C7/027 ,  G02C2202/24

Abstract: Interferometry-based methods and apparatus are presented for analysing one or more wavefronts from a sample, in which the sample wavefronts are interfered with two or more reference wavefronts to produce two or more interferograms in a sufficiently short time period for the interferograms to be captured in a single exposure of an image capture device such as a CCD array. Each interferogram has a unique carrier frequency dependent on the angle between a respective pair of sample and reference wavefronts. In certain embodiments multiple sample and/or reference wavefronts are generated using scanning mirrors, while in other embodiments utilising multi-wavelength beams multiple sample and/or reference wavefronts are generated with wavelength dispersive elements. The methods and apparatus are suitable for measuring aberrations at one or more positions on the retina of an eye.

Abstract translation: 介绍基于干涉测量的方法和装置，用于分析来自样本的一个或多个波前，其中样本波前被干扰两个或更多个参考波前，以在足够短的时间周期内产生两个或更多个干涉图，以便将干涉图捕获在 诸如CCD阵列的图像捕获装置的单次曝光。 每个干涉图具有取决于相应的一对样本和参考波前之间的角度的唯一载波频率。 在某些实施例中，使用扫描反射镜产生多个采样和/或参考波阵面，而在其他实施例中利用多波长光束，使用波长色散元件产生多个采样和/或参考波前。 所述方法和装置适于测量眼睛视网膜上的一个或多个位置处的像差。

公开(公告)号：US20100141959A1

公开(公告)日：2010-06-10

申请号：US12633639

申请日：2009-12-08

Applicant: Michael Küchel

Inventor： Michael Küchel

IPC: G01B9/02

CPC classification number: G01J9/0215 ,  G01J2009/0219

Abstract: Methods include simultaneously diffracting a beam in a first direction and a second direction orthogonal to the first direction to form a once-diffracted beam, where the beam comprises a wavefront shaped by a test object, simultaneously diffracting the once-diffracted beam in orthogonal directions to form a twice-diffracted beam, overlapping at least two orders of the twice-diffracted beam in each direction to form an interference pattern at a detector, the interference pattern being formed by multiple copies of the wavefront laterally sheared in the first direction and multiple copies of the wavefront laterally sheared in the second direction; and determining information about the wavefront based on the interference pattern.

Abstract translation: 方法包括同时沿与第一方向正交的第一方向和第二方向衍射光束以形成一次衍射光束，其中光束包括由测试对象形成的波前，同时将一次衍射光束沿正交方向衍射到 形成两次衍射的光束，在每个方向上重叠两次衍射光束的至少两个阶，以在检测器处形成干涉图案，干涉图案由沿第一方向横向剪切的波阵面的多个拷贝形成，多个拷贝 的波前横向剪切在第二个方向; 以及基于干涉图案确定关于波前的信息。

公开(公告)号：US07268891B2

公开(公告)日：2007-09-11

申请号：US10750986

申请日：2004-01-05

Applicant: Sherman K. Poultney

Inventor： Sherman K. Poultney

IPC: G01B9/02

CPC classification number: G01J9/0215 ,  G01J2009/0219 ,  G02B5/1838 ,  G03F7/70591 ,  G03F7/706 ,  G03F7/7085

Abstract: A wavefront measurement system includes a source of electromagnetic radiation. An imaging system directs the electromagnetic radiation at an object plane that it uniformly illuminates. A first grating is positioned in the object plane to condition the radiation entering the input of a projection optic. A projection optical system projects an image of the first grating onto the focal plane. A second grating is positioned at the focal plane that receives a diffracted image of the object plane to form a shearing interferometer. A CCD detector receives the image of the pupil of the projection optical system through the projection optical system and the second grating that forms a fringe pattern if there are aberrations in the projection optical system. Phaseshift readout of fringe pattern can be accomplished by stepping the first grating in a lateral direction and reading each frame with the CCD detector.

Abstract translation: 波前测量系统包括电磁辐射源。 成像系统将电磁辐射引导到均匀照明的物平面。 第一光栅定位在物平面中，以调节进入投影光学器件输入的辐射。 投影光学系统将第一光栅的图像投影到焦平面上。 第二光栅位于焦平面处，接收物平面的衍射图像以形成剪切干涉仪。 如果投影光学系统中存在像差，则CCD检测器通过投影光学系统和形成条纹图案的第二光栅接收投影光学系统的光瞳的图像。 条纹图案的移相读数可以通过沿横向方向步进第一光栅并用CCD检测器读取每个帧来实现。

公开(公告)号：US20040169866A1

公开(公告)日：2004-09-02

申请号：US10750986

申请日：2004-01-05

Applicant: ASML Holding, N.V.

Inventor： Sherman K. Poultney

IPC: G01B009/02

CPC classification number: G01J9/0215 ,  G01J2009/0219 ,  G02B5/1838 ,  G03F7/70591 ,  G03F7/706 ,  G03F7/7085

Abstract: A wavefront measurement system includes a source of electromagnetic radiation. An imaging system directs the electromagnetic radiation at an object plane that it uniformly illuminates. A first grating is positioned in the object plane to condition the radiation entering the input of a projection optic. A projection optical system projects an image of the first grating onto the focal plane. A second grating is positioned at the focal plane that receives a diffracted image of the object plane to form a shearing interferometer. A CCD detector receives the image of the pupil of the projection optical system through the projection optical system and the second grating that forms a fringe pattern if there are aberrations in the projection optical system. Phaseshift readout of fringe pattern can be accomplished by stepping the first grating in a lateral direction and reading each frame with the CCD detector.

Abstract translation: 波前测量系统包括电磁辐射源。 成像系统将电磁辐射引导到均匀照明的物平面。 第一光栅定位在物平面中，以调节进入投影光学器件输入的辐射。 投影光学系统将第一光栅的图像投影到焦平面上。 第二光栅位于焦平面处，接收物平面的衍射图像以形成剪切干涉仪。 如果投影光学系统中存在像差，则CCD检测器通过投影光学系统和形成条纹图案的第二光栅接收投影光学系统的光瞳的图像。 条纹图案的移相读数可以通过沿横向方向步进第一光栅并用CCD检测器读取每个帧来实现。

公开(公告)号：US5074666A

公开(公告)日：1991-12-24

申请号：US475391

申请日：1990-02-05

Applicant: Thomas H. Barnes ,  Kiyofumi Matsuda ,  Naotake Ooyama

Inventor： Thomas H. Barnes ,  Kiyofumi Matsuda ,  Naotake Ooyama

IPC: G01J9/02 ,  G01N21/45

CPC classification number: G01N21/45 ,  G01J2009/0219

Abstract: A high stability interferometer is capable of continuous measurement of small changes in the refractive index of a sample. The interferometer has a diffraction grating placed to be movable sideways or radially, and diffract laser light into beams which include +1, -1 and zero order beams. The diffraction grating is in the input plane of a Fourier Transform lens. The beams are brought to a focus in the output plane of the lens and are reflected back towards the lens by a mirror placed in the transform plane of the lens. The sample whose refractive index is to be measured is placed in the path of the +1 or -1 order beam, between the diffraction grating and the mirror.

Abstract translation: 高稳定性干涉仪能够连续测量样品的折射率的小变化。 该干涉仪具有放置成侧向或径向移动的衍射光栅，并将激光衍射成包括+1，-1和零级光束的光束。 衍射光栅位于傅里叶变换透镜的输入平面内。 光束在透镜的输出平面中被聚焦，并且通过放置在透镜的变换平面中的反射镜朝向透镜反射回。 折射率要被测量的样品放置在衍射光栅和反射镜之间的+1或-1级光束的路径中。

公开(公告)号：EP2180301A3

公开(公告)日：2012-08-22

申请号：EP09173968.0

申请日：2009-10-23

Applicant: Canon Kabushiki Kaisha

Inventor： Ishizuka, Ko

IPC: G01J9/02

CPC classification number: G01J9/0246 ,  G01J2009/0219 ,  G01J2009/0261 ,  G03F7/70775

Abstract: A wavelength shift measuring apparatus of the present invention is a wavelength shift detector (WLCD1) which measures a shift of a wavelength of a light beam emitted from a light source, and includes a beam splitter (BS2) splitting the light beam emitted from the light source into a plurality of light beams and to synthesize two light beams among the plurality of light beams to generate an interference light, a spacer member (SP) provided so that an optical path length difference of the two light beams split by the beam splitter (PBS2) is constant, and a plurality of photoelectric sensors (PD) detecting the interference light generated by the beam splitter (BS2). The plurality of photoelectric sensors (PD) output a plurality of interference signals having phases shifted from one another based on the interference light to measure a wavelength shift using the plurality of interference signals.

公开(公告)号：EP1439427A3

公开(公告)日：2006-08-30

申请号：EP04000525.8

申请日：2004-01-13

Applicant: ASML Holding N.V.

Inventor： Poultney, Sherman K.

IPC: G03F7/20 ,  G01M11/02 ,  G02B5/18

CPC classification number: G01J9/0215 ,  G01J2009/0219 ,  G02B5/1838 ,  G03F7/70591 ,  G03F7/706 ,  G03F7/7085

Abstract: A wavefront measurement system includes a source of electromagnetic radiation. An imaging system directs the electromagnetic radiation at an object plane that it uniformly illuminates. A first grating is positioned in the object plane (reticle/source module plane) to condition the radiation entering the input of a projection optic (104). A projection optical system projects an image of the first grating onto the focal plane (wafer plane). A second grating is positioned at the focal plane that receives a diffracted image of the object plane to form a shearing interferometer. A CCD detector receives the image of the pupil of the projection optical system through the projection optical system and the second grating that forms a fringe pattern if there are aberrations in the projection optical system. Phaseshift readout of fringe pattern can be accomplished by stepping the first grating in a lateral direction and reading each frame with the CCD detector.